公开(公告)号：US20110143267A1

公开(公告)日：2011-06-16

申请号：US12964762

申请日：2010-12-10

Applicant: Daijitsu Harada ,  Mamoru Morikawa ,  Masaki Takeuchi ,  Yukio Shibano

Inventor： Daijitsu Harada ,  Mamoru Morikawa ,  Masaki Takeuchi ,  Yukio Shibano

IPC: G03F1/00

CPC classification number: G03F1/60 ,  G03F1/14 ,  Y10T428/24488

Abstract: A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 μm.

Abstract translation: 提供了具有正方形主表面的光掩模形成玻璃基板，其中在一对相对侧附近的主表面上限定两个条带区域，使得每个区域跨越侧面向内延伸2mm至10mm，并且不包括延伸2 从侧面的相对端向内mm，对于两个条带区域中的每一个计算最小二乘平面，包括在两个条带区域的最小二乘平面的法线之间的角度在10秒内，并且两个区域之间的高度差 条带区域高达0.5μm。

公开(公告)号：US07608542B2

公开(公告)日：2009-10-27

申请号：US11587902

申请日：2006-06-12

Applicant: Shuhei Ueda ,  Yukio Shibano ,  Atsushi Watabe ,  Daisuke Kusabiraki

Inventor： Shuhei Ueda ,  Yukio Shibano ,  Atsushi Watabe ,  Daisuke Kusabiraki

IPC: H01L21/302 ,  H01L21/461

CPC classification number: G11B7/261 ,  G03F1/60 ,  G03F7/70791

Abstract: A large-size glass substrate, from which a photomask substrate is formed, is prepared by processing a large-size glass substrate stock by (1) a flattening removal quantity based on height data of the substrate stock in the vertical attitude plus a deformation-corrective removal quantity. The deformation-corrective removal quantity is calculated from (2) a deflection of the substrate stock by its own weight in the horizontal attitude, (3) a deformation of the photomask substrate caused by chucking in an exposure apparatus, and (4) an accuracy distortion of a platen for supporting a mother glass.

Abstract translation: 通过（1）基于垂直姿态的基板的高度数据的平坦化去除量加上大尺寸玻璃基板原料，形成光掩模基板的大尺寸玻璃基板， 纠正清除量。 变形矫正去除量是根据（2）基板原料在水平姿态下的自重而产生的挠曲，（3）通过在曝光装置中夹持引起的光掩模基板的变形，（4）精度 用于支撑母玻璃的压板的变形。

公开(公告)号：US20080145770A1

公开(公告)日：2008-06-19

申请号：US12000542

申请日：2007-12-13

Applicant: Shuhei Ueda ,  Yukio Shibano

Inventor： Shuhei Ueda ,  Yukio Shibano

IPC: G03F1/00

CPC classification number: G03F1/68 ,  Y02P20/582

Abstract: A used large-size photomask substrate having a patterned light-shielding film is recycled by (i) removing the light-shielding film from the used substrate to provide a photomask-forming glass substrate stock, (ii) resurfacing the glass substrate stock by sand blasting, (iii) repolishing the resurfaced glass substrate stock to yield a regenerated glass substrate stock, (iv) applying a light-shielding film onto the regenerated glass substrate stock to yield a regenerated photomask-forming blank, and (v) processing the light-shielding film of the blank into a pattern corresponding to the desired exposure of a mother glass, yielding a regenerated photomask substrate.

Abstract translation: 通过（i）从使用的基板上除去遮光膜，提供形成光掩模的玻璃基板原料，（ii）通过砂覆盖玻璃基板原料，再循环使用具有图案化遮光膜的已使用的大尺寸光掩模基板 （iii）重新铺上重铺玻璃基板原料以产生再生的玻璃基板原料，（iv）将光屏蔽膜施加到再生的玻璃基板原料上以产生再生的光掩模形成坯料，（v）加工光 将该坯料的屏蔽膜变成对应于母玻璃所需曝光的图案，产生再生的光掩模基板。

公开(公告)号：US20070045232A1

公开(公告)日：2007-03-01

申请号：US11468570

申请日：2006-08-30

Applicant: Toshinari MURAI ,  Yukio Shibano

Inventor： Toshinari MURAI ,  Yukio Shibano

IPC: C23F1/00 ,  H01L21/302 ,  B44C1/22

CPC classification number: B24B37/28 ,  B24B37/30

Abstract: A wafer substrate is polished by disposing the wafer substrate between an abrasive cloth on a polishing platen and a plate, and relatively rotating the polishing platen and the plate for mirror polishing the surface of the wafer substrate with the abrasive cloth. A liquid is fed onto the plate side surface of the wafer substrate so that the wafer substrate is directly held to the plate by the adsorption force of the liquid, while performing the mirror polishing.

Abstract translation: 通过将晶片衬底设置在研磨台板上的研磨布与板之间，并相对旋转研磨台板和板，用研磨布对晶片基板的表面进行镜面抛光来研磨晶片基板。 将液体供给到晶片基板的板侧表面，从而通过液体的吸附力将晶片基板直接固定在板上，同时进行镜面抛光。

公开(公告)号：US20100243950A1

公开(公告)日：2010-09-30

申请号：US12678058

申请日：2009-05-27

Applicant: Daijitsu Harada ,  Masaki Takeuchi ,  Yukio Shibano ,  Shuhei Ueda ,  Atsushi Watabe

Inventor： Daijitsu Harada ,  Masaki Takeuchi ,  Yukio Shibano ,  Shuhei Ueda ,  Atsushi Watabe

IPC: C09K13/02 ,  C09K13/00

CPC classification number: C03C19/00 ,  B24B1/00 ,  B24B37/00 ,  B24B37/0056 ,  C03C15/02 ,  C09G1/02 ,  C09G1/04 ,  C09K3/1454 ,  C09K3/1463 ,  C09K13/02 ,  C09K13/06

Abstract: Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.

Abstract translation: 公开了一种合成石英玻璃基板用抛光剂，其特征在于，含有胶体二氧化硅等胶体溶液，胶体浓度为20〜50质量％，多元羧酸聚合物，酸性氨基酸， 苯酚或糖胺聚糖。

公开(公告)号：US20050181611A1

公开(公告)日：2005-08-18

申请号：US11059530

申请日：2005-02-17

Applicant: Yukio Shibano ,  Daisuke Kusabiraki ,  Shuhei Ueda ,  Atsushi Watabe

Inventor： Yukio Shibano ,  Daisuke Kusabiraki ,  Shuhei Ueda ,  Atsushi Watabe

IPC: B24C1/00 ,  B24C7/00 ,  H01L29/04

CPC classification number: B24C11/005 ,  B24C1/00 ,  B24C7/0038

Abstract: A large-size substrate having improved flatness is prepared by measuring the flatness of one surface or opposite surfaces of a large-size substrate having a diagonal length of at least 500 mm, and partially removing raised portions on the one surface or opposite surfaces of the substrate by means of a processing tool on the basis of the measured data. The processing tool is adapted to blast a slurry of microparticulates in water carried on compressed air against the substrate.

Abstract translation: 通过测量具有至少500mm的对角线长度的大尺寸基板的一个表面或相对表面的平坦度，并且在一个表面或相对的表面上部分地去除凸起部分来制备具有改善的平坦度的大尺寸基板 基于测量数据，通过加工工具进行基底处理。 该加工工具适于将承载在压缩空气中的水中的微粒的浆液喷射到衬底上。

公开(公告)号：US20050013972A1

公开(公告)日：2005-01-20

申请号：US10891028

申请日：2004-07-15

Applicant: Daisuke Kusabiraki ,  Yukio Shibano

Inventor： Daisuke Kusabiraki ,  Yukio Shibano

IPC: B24D13/10 ,  B32B1/00 ,  C03B20/00 ,  G02F1/13 ,  G02F1/136 ,  G03F1/60 ,  G03F7/20

CPC classification number: B24D13/10 ,  G03F1/60 ,  G03F7/70791 ,  Y10T428/10 ,  Y10T428/24355 ,  Y10T428/24777 ,  Y10T428/315

Abstract: A large-size substrate adapted for light exposure is of a plate shape having a diagonal length or diameter of 500-2,000 mm, a thickness of 1-20 mm, and a peripheral surface with a roughness Ra of 0.05-0.4 μm. The number of particles released from the substrate periphery during cleaning is minimized, leading to an improved yield in the cleaning step. The substrate can be manually handled, achieving an improvement in substrate quality without a need for a handling mechanism.

Abstract translation: 适用于曝光的大尺寸基板为对角线长度或直径为500〜2000mm，厚度为1-20mm的板状，粗糙度Ra为0.05〜0.4μm的圆周面。 在清洁期间从基板周边释放的颗粒的数量被最小化，导致在清洁步骤中提高的产量。 可以手动处理基板，在不需要处理机构的情况下实现基板质量的改善。

公开(公告)号：US06413682B1

公开(公告)日：2002-07-02

申请号：US09576006

申请日：2000-05-22

Applicant: Yukio Shibano ,  Hisatoshi Otsuka

Inventor： Yukio Shibano ,  Hisatoshi Otsuka

IPC: G03F900

CPC classification number: G03F1/60 ,  C03B19/12 ,  C03B19/1453 ,  C03B19/1469 ,  C03B32/00 ,  C03B2201/23 ,  C03C3/06 ,  C03C2201/23 ,  C03C2203/20 ,  C03C2203/40

Abstract: A synthetic quartz glass substrate is prepared by annealing a synthetic quartz glass member having a higher hydroxyl content in a peripheral portion than in a central portion, machining off the peripheral portion of the member, slicing the member into a plate shaped substrate, chamfering and etching the substrate. The synthetic quartz glass substrate has a minimized birefringence and is suited for use as a photomask in photolithography.

Abstract translation: 合成石英玻璃基板通过在周边部分比在中心部分退火具有较高羟基含量的合成石英玻璃构件来制备，将构件的周边部分切除，将构件切割成板状基板，倒角和蚀刻 底物。 合成石英玻璃基板具有最小的双折射，并且适合用作光刻中的光掩模。

公开(公告)号：US08551346B2

公开(公告)日：2013-10-08

申请号：US12964762

申请日：2010-12-10

Applicant: Daijitsu Harada ,  Mamoru Morikawa ,  Masaki Takeuchi ,  Yukio Shibano

Inventor： Daijitsu Harada ,  Mamoru Morikawa ,  Masaki Takeuchi ,  Yukio Shibano

IPC: G03F1/00 ,  G03F1/14 ,  C03C15/02

CPC classification number: G03F1/60 ,  G03F1/14 ,  Y10T428/24488

Abstract: A photomask-forming glass substrate having a square major surface is provided wherein two strip regions are defined on the major surface near a pair of opposed sides such that each region spans between 2 mm and 10 mm inward of the side and excludes end portions extending 2 mm inward from the opposed ends of the side, a least squares plane is computed for each of the two strip regions, the angle included between normal lines to the least squares planes of two strip regions is within 10 seconds, and the height difference between two strip regions is up to 0.5 μm.

Abstract translation: 提供了具有正方形主表面的光掩模形成玻璃基板，其中在一对相对侧附近的主表面上限定两个条带区域，使得每个区域跨越侧面向内延伸2mm至10mm，并且不包括延伸2 从侧面的相对端向内mm，对于两个条带区域中的每一个计算最小二乘平面，包括在两个条带区域的最小二乘平面的法线之间的角度在10秒内，并且两个区域之间的高度差 带状区域最多为0.5μm。

公开(公告)号：US07745071B2

公开(公告)日：2010-06-29

申请号：US11674049

申请日：2007-02-12

Applicant: Yukio Shibano ,  Satoru Miharada ,  Shuhei Ueda ,  Atsushi Watabe ,  Masaki Tabata

Inventor： Yukio Shibano ,  Satoru Miharada ,  Shuhei Ueda ,  Atsushi Watabe ,  Masaki Tabata

IPC: G03F1/00

CPC classification number: G03F1/60 ,  B24B7/00 ,  B24C1/00 ,  C03C19/00 ,  G02F2001/133302 ,  Y10T428/315

Abstract: A large-sized substrate having a diagonal length of not less than 500 mm and a ratio of flatness/diagonal length of not more than 6×10−6 is disclosed. By use of the large-sized substrate for exposure of the present invention, the exposure accuracy, particularly the register accuracy and resolution are enhanced, so that it is possible to achieve high-precision exposure of a large-sized panel. With the processing method according to the present invention, it is possible to stably obtain a large-sized photomask substrate with a high flatness, and since the CD accuracy (dimensional accuracy) at the time of exposure of the panel is enhanced, it is possible to perform exposure of a fine pattern, leading to a higher yield of the panel. Furthermore, by applying the processing method according to the present invention, it is also possible to create an arbitrary surface shape.

Abstract translation: 公开了具有对角线长度不小于500mm，平坦度/对角线长度不大于6×10-6的大尺寸基板。 通过使用本发明的大尺寸基板，能够提高曝光精度，特别是记录精度和分辨率，能够实现大尺寸面板的高精度曝光。 利用根据本发明的处理方法，可以稳定地获得具有高平坦度的大尺寸光掩模基板，并且由于提高了面板曝光时的CD精度（尺寸精度），所以可能 以进行精细图案的曝光，导致面板的更高的产量。 此外，通过应用根据本发明的处理方法，还可以产生任意的表面形状。