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公开(公告)号：US20090078883A1
公开(公告)日：2009-03-26
申请号：US11859219
申请日：2007-09-21
Applicant: Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
Inventor： Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
IPC: G21K1/00
CPC classification number: H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/2445 , H01J2237/24507 , H01J2237/24542 , H01J2237/2482 , H01J2237/30472
Abstract: Techniques for providing optical ion beam metrology are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for controlling beam density profile, the apparatus may include one or more camera systems to capture at least one image of an ion beam and a control system coupled to the one or more camera systems to control a beam density profile of the ion beam. The control system may further include a dose profiler to provide information to one or more ion implantation components in at least one of a feedback loop and a feedforward loop to improve dose and angle uniformity.
Abstract translation: 公开了提供光学离子束计量的技术。 在一个特定的示例性实施例中，技术可以被实现为用于控制光束密度分布的装置，该装置可以包括一个或多个相机系统以捕获离子束的至少一个图像和耦合到一个或多个相机的控制系统 用于控制离子束的束密度分布的系统。 控制系统还可以包括剂量分析器，以在反馈环路和前馈环路中的至少一个中向一个或多个离子注入组件提供信息，以改善剂量和角度均匀性。
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公开(公告)号：US07723697B2
公开(公告)日：2010-05-25
申请号：US11859219
申请日：2007-09-21
Applicant: Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
Inventor： Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
CPC classification number: H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/2445 , H01J2237/24507 , H01J2237/24542 , H01J2237/2482 , H01J2237/30472
Abstract: Techniques for providing optical ion beam metrology are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for controlling beam density profile, the apparatus may include one or more camera systems to capture at least one image of an ion beam and a control system coupled to the one or more camera systems to control a beam density profile of the ion beam. The control system may further include a dose profiler to provide information to one or more ion implantation components in at least one of a feedback loop and a feedforward loop to improve dose and angle uniformity.
Abstract translation: 公开了提供光学离子束计量的技术。 在一个特定的示例性实施例中，技术可以被实现为用于控制光束密度分布的装置，该装置可以包括一个或多个相机系统以捕获离子束的至少一个图像和耦合到一个或多个相机的控制系统 用于控制离子束的束密度分布的系统。 控制系统还可以包括剂量分析器，以在反馈环路和前馈环路中的至少一个中向一个或多个离子注入组件提供信息，以改善剂量和角度均匀性。
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Patent Agency Ranking
公开(公告)号：US20090309041A1
公开(公告)日：2009-12-17
申请号：US12137225
申请日：2008-06-11
Applicant: Peter Kurunczi , Rajesh Dorai , Costel Biloiu , Wilhelm Platow
Inventor： Peter Kurunczi , Rajesh Dorai , Costel Biloiu , Wilhelm Platow
CPC classification number: H01J37/08 , H01J27/08 , H01J27/16 , H01J37/3171 , H01J2237/061 , H01J2237/0817 , H01J2237/082 , H01J2237/0827 , H01J2237/304
Abstract: Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation comprising an ion source that operates in multiple modes such that a first mode is an arc-discharge mode and a second mode is an RF mode.
Abstract translation: 公开了提供多模离子源的技术。 在一个特定示例性实施例中，可以将技术实现为用于离子注入的装置，其包括以多种模式操作的离子源，使得第一模式是电弧放电模式，而第二模式是RF模式。
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公开(公告)号：US20070056316A1
公开(公告)日：2007-03-15
申请号：US10982561
申请日：2004-11-05
Applicant: Wilhelm Platow , John Cracchiolo , Stanislav Todorov , Jaime Reyes
Inventor： Wilhelm Platow , John Cracchiolo , Stanislav Todorov , Jaime Reyes
IPC: C02F1/22
CPC classification number: C02F1/22 , C02F1/20 , C02F2301/063 , H01J2237/022 , H01J2237/31705
Abstract: The present invention provides methods and apparatus for the production of liquids and vapors that are free of, or substantially free of, dissolved or trapped gases. In one embodiment, a liquid is placed in a sealed vessel and subjected to a temperature below the freezing point of the liquid for sufficient time to substantially, if not completely, turn the liquid into a solid. Concurrent with or subsequent to the cooling of the liquid, the interior of the vessel is subjected to a vacuum so as to evacuate all or substantially all of the gaseous atmosphere. Thereafter, the vessel is heated to a temperature above the melting point of the liquid, allowing the frozen material to return to its liquid form or sublimate to form a vapor.
Abstract translation: 本发明提供了用于生产不含或基本上不含溶解或捕获的气体的液体和蒸汽的方法和装置。 在一个实施方案中，将液体置于密封容器中并经受低于液体凝固点的温度足够的时间以基本上（如果不是完全）将液体转化为固体。 与液体冷却同时或之后，容器的内部经受真空，以排出所有或基本上全部的气体气氛。 此后，将容器加热到高于液体熔点的温度，使冷冻的材料返回其液体形式或升华以形成蒸气。
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5.发明授权公开(公告)号：US08466431B2
公开(公告)日：2013-06-18
申请号：US12370555
申请日：2009-02-12
Applicant: James S. Buff , Svetlana Radovanov , Bon-Woong Koo , Wilhelm Platow , Frank Sinclair , D. Jeffrey Lischer , Craig R. Chaney , Steven Borichevsky , Eric R. Cobb , Mayur Jagtap , Kenneth H. Purser , Victor Benveniste , Shardul S. Patel
Inventor： James S. Buff , Svetlana Radovanov , Bon-Woong Koo , Wilhelm Platow , Frank Sinclair , D. Jeffrey Lischer , Craig R. Chaney , Steven Borichevsky , Eric R. Cobb , Mayur Jagtap , Kenneth H. Purser , Victor Benveniste , Shardul S. Patel
CPC classification number: H01J37/3171 , H01J27/024 , H01J37/08 , H01J37/09 , H01J37/304 , H01J2237/0453 , H01J2237/0458 , H01J2237/083 , H01J2237/24542
Abstract: Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality.
Abstract translation: 公开了使用高透明电极提高离子束质量的技术。 在一个特定的示例性实施例中，技术可以被实现为用于离子注入的装置。 该装置可以包括用于产生离子束的离子源，其中离子源包括具有离子束穿过其中的孔的面板。 该装置还可以包括至少包括抑制电极和高透明度接地电极的一组提取电极，其中所述提取电极组可以经由面板从离子源提取离子束，并且其中高透明度接地 电极可以被配置为优化抑制电极和高透明度接地电极之间的气体传导，以改善提取的离子束质量。
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公开(公告)号：US07812321B2
公开(公告)日：2010-10-12
申请号：US12137225
申请日：2008-06-11
Applicant: Peter Kurunczi , Rajesh Dorai , Costel Biloiu , Wilhelm Platow
Inventor： Peter Kurunczi , Rajesh Dorai , Costel Biloiu , Wilhelm Platow
CPC classification number: H01J37/08 , H01J27/08 , H01J27/16 , H01J37/3171 , H01J2237/061 , H01J2237/0817 , H01J2237/082 , H01J2237/0827 , H01J2237/304
Abstract: Techniques for providing a multimode ion source are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation comprising an ion source that operates in multiple modes such that a first mode is an arc-discharge mode and a second mode is an RF mode.
Abstract translation: 公开了提供多模离子源的技术。 在一个特定示例性实施例中，可以将技术实现为用于离子注入的装置，其包括以多种模式操作的离子源，使得第一模式是电弧放电模式，而第二模式是RF模式。
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7.发明申请TECHNIQUES FOR IMPROVING EXTRACTED ION BEAM QUALITY USING HIGH-TRANSPARENCY ELECTRODES 有权使用高透明电极改善提取离子质量的技术公开(公告)号：US20100200768A1
公开(公告)日：2010-08-12
申请号：US12370555
申请日：2009-02-12
Applicant: JAMES BUFF , SVETLANA RADOVANOV , BON-WOONG KOO , WILHELM PLATOW , FRANK SINCLAIR , JEFFREY D. LISCHER , CRAIG CHANEY , STEVEN BORICHEVSKY , ERIC R. COBB , MAYUR JAGTAP , KENNETH PURSER , VICTOR M. BENVENISTE , SHARDUL S. PATEL
Inventor： JAMES BUFF , SVETLANA RADOVANOV , BON-WOONG KOO , WILHELM PLATOW , FRANK SINCLAIR , JEFFREY D. LISCHER , CRAIG CHANEY , STEVEN BORICHEVSKY , ERIC R. COBB , MAYUR JAGTAP , KENNETH PURSER , VICTOR M. BENVENISTE , SHARDUL S. PATEL
IPC: H01J27/00
CPC classification number: H01J37/3171 , H01J27/024 , H01J37/08 , H01J37/09 , H01J37/304 , H01J2237/0453 , H01J2237/0458 , H01J2237/083 , H01J2237/24542
Abstract: Techniques for improving extracted ion beam quality using high-transparency electrodes are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for ion implantation. The apparatus may comprise an ion source for generating an ion beam, wherein the ion source comprises a faceplate with an aperture for the ion beam to travel therethrough. The apparatus may also comprise a set of extraction electrodes comprising at least a suppression electrode and a high-transparency ground electrode, wherein the set of extraction electrodes may extract the ion beam from the ion source via the faceplate, and wherein the high-transparency ground electrode may be configured to optimize gas conductance between the suppression electrode and the high-transparency ground electrode for improved extracted ion beam quality.
Abstract translation: 公开了使用高透明电极提高离子束质量的技术。 在一个特定的示例性实施例中，技术可以被实现为用于离子注入的装置。 该装置可以包括用于产生离子束的离子源，其中离子源包括具有离子束穿过其中的孔的面板。 该装置还可以包括至少包括抑制电极和高透明度接地电极的一组提取电极，其中所述提取电极组可以经由面板从离子源提取离子束，并且其中高透明度接地 电极可以被配置为优化抑制电极和高透明度接地电极之间的气体传导，以改善提取的离子束质量。
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