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    Sanitary ware and process for producing the same
    1.
    发明授权
    Sanitary ware and process for producing the same 失效
    卫生洁具和生产过程

    公开(公告)号：US06548162B1

    公开(公告)日：2003-04-15

    申请号：US09490894

    申请日：2000-01-27

    申请人： Mitsuyoshi Machida ,  Koichi Hayashi ,  Hirotaka Ishibashi ,  Tomoyasu Ichiki ,  Masaaki Ito ,  Masami Ando ,  Atsushi Kitamura ,  Toshihiro Aoshima ,  Katsuhiro Kawakami ,  Satoshi Horiuchi ,  Makoto Hayakawa

    发明人： Mitsuyoshi Machida ,  Koichi Hayashi ,  Hirotaka Ishibashi ,  Tomoyasu Ichiki ,  Masaaki Ito ,  Masami Ando ,  Atsushi Kitamura ,  Toshihiro Aoshima ,  Katsuhiro Kawakami ,  Satoshi Horiuchi ,  Makoto Hayakawa

    IPC分类号： B32B516

    CPC分类号： C04B41/009 ,  C04B41/5022 ,  C04B41/86 ,  C04B2111/00336 ,  Y10T428/24926 ,  Y10T428/265 ,  Y10T428/2982 ,  Y10T428/31 ,  C04B33/00

    摘要： Sanitary wares having a controlled surface are disclosed which are less likely to be stained or soiled and/or possess excellent gloss. The first sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface glaze layer has a center line average roughness Ra of less than 0.07 &mgr;m. This sanitary ware is advantageous in that stains or soils are much less likely to be adhered to the surface thereof and, even when adhered to the surface thereof, can be removed by a weak water stream. The second sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface glaze layer has a kurtosis Rku of less than 2.70. This sanitary ware advantageously possesses excellent surface gloss. The third sanitary ware comprises a sanitary ware body and a surface glaze layer provided on the sanitary ware body, wherein the surface of the surface glaze layer consists essentially of a vitreous component and is free from silica particles having a particle diameter of not less than 10 &mgr;m. This sanitary ware is advantageous in that stains or soils are less likely to be adhered to the surface thereof.

    摘要翻译： 公开了具有受控表面的卫生用品，其不太可能被染色或污染和/或具有优异的光泽。 第一卫生洁具包括卫生洁具主体和设置在卫生洁具主体上的表面釉层，其中表面釉层的中心线平均粗糙度Ra小于0.07μm。 这种卫生洁具的优点在于，污渍或土壤不太可能附着在其表面上，并且即使当粘附到其表面时也可以通过弱水流除去。 第二卫生洁具包括卫生洁具主体和设置在卫生洁具主体上的表面釉层，其中表面釉层的峭度Rku小于2.70。 这种卫生洁具有利地具有优异的表面光泽度。 第三卫生洁具包括卫生洁具主体和设置在卫生洁具主体上的表面釉层，其中表面釉层的表面主要由玻璃质成分组成，不含粒径不小于10的二氧化硅颗粒 妈妈 这种卫生洁具的优点在于，污渍或污垢不太可能附着在其表面上。

    ELECTROSTATIC CHUCK
    2.
    发明申请
    ELECTROSTATIC CHUCK 有权
    静电卡

    公开(公告)号：US20130201597A1

    公开(公告)日：2013-08-08

    申请号：US13816037

    申请日：2011-08-11

    申请人： Kaduko Ishikawa ,  Junji Yonezawa ,  Toshihiro Aoshima ,  Yoshihide Hayashida

    发明人： Kaduko Ishikawa ,  Junji Yonezawa ,  Toshihiro Aoshima ,  Yoshihide Hayashida

    IPC分类号： H01L21/683

    CPC分类号： H01L21/6833 ,  B23Q3/15 ,  B32B3/30 ,  B32B5/14 ,  B32B5/142 ,  B32B5/147 ,  H01L21/6875 ,  H02N13/00 ,  Y10T279/23 ,  Y10T428/24182 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/24942 ,  Y10T428/26

    摘要： An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and can easily recover a clean state of the electrostatic chuck surface.

    摘要翻译： 静电卡盘包括：具有突起和平坦表面部分的电介质基板。 突起形成在电介质基板的主表面上。 吸附目标材料安装在主表面上。 平面部分形成在突起的周边。 电介质基板由多晶陶瓷烧结体形成。 突起的顶面是弯曲表面，并且在顶面形成第一凹部以对应于出现在表面上的晶粒。 平面部分具有平坦部分，并且在平坦部分中形成第二凹部。 第一凹部的深度尺寸大于第二凹部的深度尺寸。 静电卡盘可以抑制颗粒的产生，并且可以容易地恢复静电卡盘表面的清洁状态。

    ELECTROSTATIC CHUCK AND METHOD OF MANUFACTURING ELECTROSTATIC CHUCK
    4.
    发明申请
    ELECTROSTATIC CHUCK AND METHOD OF MANUFACTURING ELECTROSTATIC CHUCK 有权
    静电切割机及其制造方法

    公开(公告)号：US20130201598A1

    公开(公告)日：2013-08-08

    申请号：US13816050

    申请日：2011-08-11

    申请人： Kaduko Ishikawa ,  Junji Yonezawa ,  Toshihiro Aoshima

    发明人： Kaduko Ishikawa ,  Junji Yonezawa ,  Toshihiro Aoshima

    IPC分类号： H02N13/00

    CPC分类号： H02N13/00 ,  B23Q3/152 ,  H01L21/6833

    摘要： An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and a method for manufacturing the electrostatic chuck is provided.

    摘要翻译： 静电卡盘包括：具有突起和平坦表面部分的电介质基板。 突起形成在电介质基板的主表面上。 吸附目标材料安装在主表面上。 平面部分形成在突起的周边。 电介质基板由多晶陶瓷烧结体形成。 突起的顶面是弯曲表面，并且在顶面形成第一凹部以对应于出现在表面上的晶粒。 平面部分具有平坦部分，并且在平坦部分中形成第二凹部。 第一凹部的深度尺寸大于第二凹部的深度尺寸。 静电卡盘可以抑制颗粒的产生，并且提供了制造静电卡盘的方法。

    Electrostatic chuck
    5.
    发明授权
    Electrostatic chuck 有权
    静电吸盘

    公开(公告)号：US09030798B2

    公开(公告)日：2015-05-12

    申请号：US13816037

    申请日：2011-08-11

    申请人： Kaduko Ishikawa ,  Junji Yonezawa ,  Toshihiro Aoshima ,  Yoshihide Hayashida

    发明人： Kaduko Ishikawa ,  Junji Yonezawa ,  Toshihiro Aoshima ,  Yoshihide Hayashida

    IPC分类号： H01L21/683 ,  B32B3/30 ,  B32B5/14 ,  H01L21/687 ,  H02N13/00 ,  B23Q3/15

    CPC分类号： H01L21/6833 ,  B23Q3/15 ,  B32B3/30 ,  B32B5/14 ,  B32B5/142 ,  B32B5/147 ,  H01L21/6875 ,  H02N13/00 ,  Y10T279/23 ,  Y10T428/24182 ,  Y10T428/24355 ,  Y10T428/24479 ,  Y10T428/24942 ,  Y10T428/26

    摘要： An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and can easily recover a clean state of the electrostatic chuck surface.

    摘要翻译： 静电卡盘包括：具有突起和平坦表面部分的电介质基板。 突起形成在电介质基板的主表面上。 吸附目标材料安装在主表面上。 平面部分形成在突起的周边。 电介质基板由多晶陶瓷烧结体形成。 突起的顶面是弯曲表面，并且在顶面形成第一凹部以对应于出现在表面上的晶粒。 平面部分具有平坦部分，并且在平坦部分中形成第二凹部。 第一凹部的深度尺寸大于第二凹部的深度尺寸。 静电卡盘可以抑制颗粒的产生，并且可以容易地恢复静电卡盘表面的清洁状态。

    Electrostatic chuck and method of manufacturing electrostatic chuck
    6.
    发明授权
    Electrostatic chuck and method of manufacturing electrostatic chuck 有权
    静电吸盘及制造静电吸盘的方法

    公开(公告)号：US08971010B2

    公开(公告)日：2015-03-03

    申请号：US13816050

    申请日：2011-08-11

    申请人： Kaduko Ishikawa ,  Junji Yonezawa ,  Toshihiro Aoshima

    发明人： Kaduko Ishikawa ,  Junji Yonezawa ,  Toshihiro Aoshima

    IPC分类号： H01T23/00 ,  H02N13/00 ,  B23Q3/152 ,  H01L21/683

    CPC分类号： H02N13/00 ,  B23Q3/152 ,  H01L21/6833

    摘要： An electrostatic chuck comprises: a dielectric substrate having a protrusion and a planar surface part. The protrusion is formed on a major surface of the dielectric substrate. An adsorption target material is mounted on the major surface. The planar surface part is formed in a periphery of the protrusion. The dielectric substrate is formed from a polycrystalline ceramics sintered body. A top face of the protrusion is a curved surface, and a first recess is formed in the top face to correspond to crystal grains that appear on the surface. The planar surface part has a flat part, and a second recess is formed in the flat part. A depth dimension of the first recess is greater than a depth dimension of the second recess. The electrostatic chuck can suppress the generation of particles and a method for manufacturing the electrostatic chuck is provided.

    摘要翻译： 静电卡盘包括：具有突起和平坦表面部分的电介质基板。 突起形成在电介质基板的主表面上。 吸附目标材料安装在主表面上。 平面部分形成在突起的周边。 电介质基板由多晶陶瓷烧结体形成。 突起的顶面是弯曲表面，并且在顶面形成第一凹部以对应于出现在表面上的晶粒。 平面部分具有平坦部分，并且在平坦部分中形成第二凹部。 第一凹部的深度尺寸大于第二凹部的深度尺寸。 静电卡盘可以抑制颗粒的产生，并且提供了制造静电卡盘的方法。