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    CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORRECTION METHOD THEREOF
    2.
    发明申请
    CHARGED PARTICLE BEAM DRAWING APPARATUS AND PROXIMITY EFFECT CORRECTION METHOD THEREOF 有权
    充电粒子束绘图装置及其近似效应校正方法

    公开(公告)号：US20110068281A1

    公开(公告)日：2011-03-24

    申请号：US12882713

    申请日：2010-09-15

    申请人： Shigehiro HARA ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Hitoshi Higurashi ,  Shinji Sakamoto ,  Yusuke Sakai ,  Yoshihiro Okamoto ,  Akihito Anpo

    发明人： Shigehiro HARA ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Hitoshi Higurashi ,  Shinji Sakamoto ,  Yusuke Sakai ,  Yoshihiro Okamoto ,  Akihito Anpo

    IPC分类号： G21K5/10 ,  G03F7/20

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J2237/31769 ,  H01J2237/31776

    摘要： A charged particle beam drawing apparatus forms a map having meshes, forms representative figures, area of each representative figure in each mesh being equal to gross area of figures in each mesh, and calculates a proximity effect correction dose of the charged particle beam in each mesh on the basis of area of each representative figure in each mesh. If it is necessary to change the proximity effect correction dose of the charged particle beam for drawing at least one pattern corresponding to at least one figure, the charged particle beam drawing apparatus changes area of the at least one figure before the representative figures are formed by a representative figure forming portion, and changes the proximity effect correction dose of the charged particle beam for drawing the at least one pattern corresponding to the at least one figure, calculated by a proximity effect correction dose calculating portion.

    摘要翻译： 带电粒子束描绘装置形成具有网格的图，形成代表性图，每个网格中每个代表图的面积等于每个网格中的图形的总面积，并计算每个网格中的带电粒子束的邻近效应校正剂量 在每个网格中每个代表人物的面积的基础上。 如果需要改变带电粒子束的接近效应校正剂量以绘制与至少一个图形相对应的至少一个图案，则带电粒子束描绘装置在代表性图形形成之前改变至少一个图形的面积， 代表图形形成部分，并且改变用于绘制由邻近效应校正剂量计算部分计算的与至少一个图形相对应的至少一个图案的带电粒子束的邻近效应校正剂量。

    Lithography method of electron beam
    3.
    发明申请
    Lithography method of electron beam 审中-公开
    电子束光刻法

    公开(公告)号：US20100178611A1

    公开(公告)日：2010-07-15

    申请号：US12659774

    申请日：2010-03-22

    申请人： Hirohito Anze ,  Takehiko Katsumata ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Rieko Nishimura ,  Makoto Hiramoto ,  Tomoo Motosugi ,  Takazuki Ohnishi

    发明人： Hirohito Anze ,  Takehiko Katsumata ,  Shuichi Tamamushi ,  Takashi Kamikubo ,  Rieko Nishimura ,  Makoto Hiramoto ,  Tomoo Motosugi ,  Takazuki Ohnishi

    IPC分类号： G03F7/20

    CPC分类号： B82Y40/00 ,  B82Y10/00 ,  G03F1/78 ,  G03F7/0382 ,  G03F7/0392 ,  H01J37/3174

    摘要： A charged particle beam writing method on a chemical amplification type resist, comprising: coating said chemical amplification type resist which contains an acid diffusion inhibitor, on a surface of a mask substrate, exposing charged particle beams to said chemical amplification type resist layer on said surface of the mask substrate, baking said chemical amplification type resist layer which said charged particle beams were exposed, and developing said chemical amplification type resist after the baking, wherein an exposure current density of said electron beams exposing ranges of 50˜5000 A/cm2, said photo acid generator is in an amount ranging from 0.1 to 30 weight percent (wt %) relative to all solid content of said chemical amplification type resist, and said acid diffusion inhibitor is composed of at least one material selected from the group consisting of tertiary amine class, benzyl-carbamate class, benzoin-carbamate class, o-carbamoyl-hydroxy-amine class, o-carbamoyl-oxime class, and dithio-calbamate-quaternary ammonium salt.

    摘要翻译： 一种化学放大型抗蚀剂的带电粒子束写入方法，包括：在掩模基板的表面上涂覆含有酸扩散抑制剂的所述化学放大型抗蚀剂，将带电粒子束暴露于所述表面上的所述化学放大型抗蚀剂层 对所述带电粒子束进行曝光的所述化学放大型抗蚀剂层进行烘烤，烘烤后显影所述化学放大型抗蚀剂，其中所述电子束的曝光电流密度为50〜5000A / cm 2， 所述光酸产生剂的量相对于所述化学增幅型抗蚀剂的全部固体含量为0.1〜30重量％（重量％），所述酸扩散抑制剂由选自三级 胺类，氨基甲酸苄酯类，苯偶姻 - 氨基甲酸酯类，邻氨基甲酰基 - 羟基 - 胺类，邻氨基甲酰基肟 屁股和二硫代氨基甲酸铵 - 季铵盐。

    BICYCLIC HETEROCYCLIC COMPOUND
    4.
    发明申请
    BICYCLIC HETEROCYCLIC COMPOUND 审中-公开
    双相杂环化合物

    公开(公告)号：US20100113391A1

    公开(公告)日：2010-05-06

    申请号：US12596643

    申请日：2008-04-17

    申请人： Yuji Koga ,  Takao Okuda ,  Takashi Kamikubo ,  Michihito Kageyama ,  Hiroyuki Moritomo

    发明人： Yuji Koga ,  Takao Okuda ,  Takashi Kamikubo ,  Michihito Kageyama ,  Hiroyuki Moritomo

    IPC分类号： A61K31/695 ,  C07D215/22 ,  C07D239/80 ,  C07F7/02 ,  C07D243/14 ,  A61K31/47 ,  A61K31/517 ,  A61K31/5513 ,  A61P7/02

    CPC分类号： C07D217/24 ,  C07D239/96 ,  C07D243/14 ,  C07D401/06 ,  C07D403/12 ,  C07D405/04 ,  C07D405/06 ,  C07D413/06 ,  C07D417/06

    摘要： [Problem]Provided is a compound, which exhibits a P2Y12 inhibitory action and is useful as a medical drug, particularly, as a platelet aggregation inhibitor.[Means for Solution]The inventors have eagerly investigated P2Y12 inhibitors. As a result, the inventors have found that a bicyclic heterocyclic compound such as quinazolinedione, isoquinolone, and the like having an amino group substituted with lower alkyl, cycloalkyl, or lower alkylene-cycloalkyl at the specific position exhibits an excellent platelet aggregation inhibitory action, thereby completing the present invention. Since the compound of the invention exhibits excellent P2Y12 inhibitory action and platelet aggregation inhibitory action, it is useful as a platelet aggregation inhibitor.

    摘要翻译： [问题]提供了表现出P2Y12抑制作用的化合物，可用作医药，特别是作为血小板聚集抑制剂。 解决方法本发明人急切地研究P2Y12抑制剂。 结果发现，在具体位置具有被低级烷基，环烷基或低级亚烷基 - 环烷基取代的氨基的喹唑啉二酮，异喹诺酮等双环杂环化合物显示优异的血小板聚集抑制作用， 从而完成了本发明。 由于本发明化合物表现出优异的P2Y12抑制作用和血小板聚集抑制作用，因此作为血小板聚集抑制剂是有用的。

    CHARGED-PARTICLE BEAM WRITING METHOD
    5.
    发明申请
    CHARGED-PARTICLE BEAM WRITING METHOD 有权
    充电粒子束写法

    公开(公告)号：US20090014663A1

    公开(公告)日：2009-01-15

    申请号：US12170874

    申请日：2008-07-10

    申请人： Rieko NISHIMURA ,  Takashi KAMIKUBO

    发明人： Rieko NISHIMURA ,  Takashi KAMIKUBO

    IPC分类号： H01J3/26

    CPC分类号： H01J37/3045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/2817 ,  H01J2237/30455 ,  H01J2237/30461 ,  H01J2237/30483

    摘要： The present invention provides an electron beam writing method capable of suppressing a variation in position to be irradiated with an electron beam due to its drift and writing a predetermined pattern.A positional displacement amount near the center of each main deflection area of the charged-particle beam is determined. Correction values are determined from a plurality of the positional displacement amounts. A position irradiated with the charged-particle beam is corrected from the correction values. The neighborhood of the center of the main deflection area can be a sub deflection area including the center of the main deflection area. In this case, the positional displacement amount can be one for one arbitrary point in the sub deflection area. Alternatively, the Positional displacement amount can also be the average of positional displacement amounts at a plurality of arbitrary points in the sub deflection area.

    摘要翻译： 本发明提供一种电子束写入方法，其能够抑制由于其漂移并写入预定图案而被电子束照射的位置的变化。 确定带电粒子束的每个主偏转区域的中心附近的位置偏移量。 从多个位置偏移量确定校正值。 从校正值校正用带电粒子束照射的位置。 主偏转区域的中心附近可以是包括主偏转区域的中心的副偏转区域。 在这种情况下，位移位移量可以是副偏转区域中的一个任意点的位移量。 或者，位移位移量也可以是副偏转区域中的多个任意点处的位置偏移量的平均值。

    Coating composition
    6.
    发明授权
    Coating composition 失效
    涂料组成

    公开(公告)号：US5698618A

    公开(公告)日：1997-12-16

    申请号：US683213

    申请日：1996-07-18

    申请人： Takashi Kamikubo ,  Tadashi Itabashi ,  Masami Kuwahara

    发明人： Takashi Kamikubo ,  Tadashi Itabashi ,  Masami Kuwahara

    IPC分类号： C09D7/45 ,  C09D167/08 ,  C09D201/06 ,  C08K5/42

    CPC分类号： C09D167/08 ,  C09D201/06 ,  C09D7/02

    摘要： A coating composition is formed from an acid-set coating varnish and a pigment composition. The pigment composition includes a specific organic dyestuff derivative and a specific basic-group-containing resin-type pigment dispersant. The coating composition excels in pigment dispersibility, nonflocculation properties, noncrystallizability and fluidity. When used as a coating, the coating composition has excellent color tone, gloss, hardness, weather resistance, and solvent resistance.

    摘要翻译： PCT No.PCT / JP95 / 02355 Sec。 371日期：1996年7月18日 102（e）日期1996年7月18日PCT提交1995年11月17日PCT公布。 出版物WO96 / 16130 日期：1996年5月30日涂料组合物由酸性涂料清漆和颜料组合物形成。 颜料组合物包括特定的有机染料衍生物和特定的含碱性基团的树脂型颜料分散剂。 涂料组合物的颜料分散性，非絮凝性，非结晶性和流动性优异。 当用作涂层时，涂料组合物具有优异的色调，光泽度，硬度，耐候性和耐溶剂性。

    Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium
    9.
    发明授权
    Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium 有权
    带电粒子束的写入方法，带电粒子束写入装置的支持装置，写入数据生成方法和程序记录的可读记录介质

    公开(公告)号：US07495243B2

    公开(公告)日：2009-02-24

    申请号：US11682494

    申请日：2007-03-06

    申请人： Takashi Kamikubo

    发明人： Takashi Kamikubo

    IPC分类号： G03F7/20 ,  H01J3/14 ,  H01J37/302

    CPC分类号： H01J37/3026 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

    摘要： A charged particle beam writing method includes inputting design pattern data, virtually dividing a writing area to be written with the design pattern data into a plurality of small areas in a mesh-like manner, calculating a pattern density in each of the plurality of small areas based on the design pattern data, calculating a resizing amount for each pattern density in a case of irradiating a charged particle beam at an isofocal dose, resizing a dimension of the design pattern data in each of the plurality of small areas, based on the resizing amount in each of the plurality of small areas, and writing a resized design pattern on a target workpiece with the isofocal dose corresponding to the pattern density which was calculated before the resizing in each of the plurality of small areas.

    摘要翻译： 带电粒子束写入方法包括输入设计图案数据，将以设计图案数据写入的写入区域虚拟地分成多个小区域，以网格状方式计算多个小区域中的图案密度 基于设计图案数据，在以异焦点剂量照射带电粒子束的情况下，计算每个图案密度的调整量，基于调整尺寸来调整多个小区域中的每一个中的设计图案数据的尺寸 在多个小区域的每一个区域中的量，并且将具有对应于在多个小区域中的每个小区域中调整大小之前计算的图案密度的等效剂量的目标工件上的调整尺寸的设计图案写入。

    CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD
    10.
    发明申请
    CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD 审中-公开
    充电颗粒光束书写装置和方法

    公开(公告)号：US20080265174A1

    公开(公告)日：2008-10-30

    申请号：US12103321

    申请日：2008-04-15

    申请人： Makoto HIRAMOTO ,  Takashi Kamikubo ,  Shuichi Tamamushi

    发明人： Makoto HIRAMOTO ,  Takashi Kamikubo ,  Shuichi Tamamushi

    IPC分类号： H01J3/26

    CPC分类号： H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3174 ,  H01J2237/0209 ,  H01J2237/3045 ,  H01J2237/30461

    摘要： A charged particle beam writing apparatus includes an unit configured to irradiate a beam, a deflector configured to deflect the beam, a stage, on which a target is placed, configured to perform moving continuously, an lens configured to focus the beam onto the target, an unit configured to calculate a correction amount for correcting positional displacement of the beam on a surface of the target resulting from a first magnetic field caused by the lens and a second magnetic field caused by an eddy current generated by the first magnetic field and the moving of the stage, an unit configured to calculate a correction position where the positional displacement on the surface of the target has been corrected using the correction amount, and an unit configured to control the deflector so that the beam may be deflected onto the correction position.

    摘要翻译： 带电粒子束写入装置包括被配置为照射光束的单元，被配置为使光束偏转的偏转器，配置有目标的台阶，其被配置为连续地进行移动;配置成将光束聚焦到目标上的透镜， 被配置为计算校正量，用于校正由由透镜引起的第一磁场产生的目标表面上的光束的位置偏移和由由第一磁场和移动的所产生的涡流引起的第二磁场 所述单元被配置为使用所述校正量来计算已经校正了所述目标的表面上的位置偏移的校正位置，以及被配置为控制所述偏转器使得所述光束可能偏转到所述校正位置的单元。