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1.
公开(公告)号:US09155181B2
公开(公告)日:2015-10-06
申请号:US12852352
申请日:2010-08-06
申请人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号: H01L21/306 , C23C16/00 , H05H1/46 , H01J37/32
CPC分类号: H05H1/46 , H01J37/321 , H01J37/3211 , H01J37/32357 , H01J37/32422 , H01J37/3244 , H01J37/32449 , H01J37/3266 , H01J37/32669 , H01J37/32816 , H01J2237/334 , H05H2001/4652 , H05H2001/4682
摘要: A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber and multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites. A system and method for generating a plasma are also described.
摘要翻译: 等离子体源包括环等离子体室,围绕环等离子体室的外部的初级绕组和多个铁氧体,其中环等离子体室穿过每个铁氧体。 还描述了用于产生等离子体的系统和方法。
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2.
公开(公告)号:US08999104B2
公开(公告)日:2015-04-07
申请号:US12852364
申请日:2010-08-06
申请人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
CPC分类号: H01J37/32449 , H01J37/32422 , H01J37/3266 , H01J37/32669 , H01J37/32816 , H01J2237/334
摘要: A plasma source includes multiple ring plasma chambers, multiple primary windings, multiple ferrites and a control system. Each one of the primary windings is wrapped around an exterior one of the ring plasma chambers. Each one of the plurality of the ring plasma chamber passes through a respective portion of the plurality of ferrites. The control system is coupled to each of the ring plasma chambers. A system and method for generating and using a plasma are also described.
摘要翻译: 等离子体源包括多个环等离子体室,多个初级绕组,多个铁氧体和一个控制系统。 每个初级绕组缠绕在环形等离子体室的外部一个周围。 多个环形等离子体室中的每一个穿过多个铁氧体的相应部分。 控制系统耦合到每个环形等离子体室。 还描述了用于产生和使用等离子体的系统和方法。
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公开(公告)号:US07829353B2
公开(公告)日:2010-11-09
申请号:US11586782
申请日:2006-10-26
申请人: Ali Shajii , Siddharth P. Nagarkatti , Matthew Mark Besen , William R. Clark , Daniel Alexander Smith , Bora Akgerman
发明人: Ali Shajii , Siddharth P. Nagarkatti , Matthew Mark Besen , William R. Clark , Daniel Alexander Smith , Bora Akgerman
IPC分类号: H01L21/00
CPC分类号: C23C16/45544 , C23C16/45527 , C23C16/45557 , C23C16/52 , Y10S438/935
摘要: A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.
摘要翻译: 一种用于输送期望质量的气体的系统,包括腔室,控制流入腔室的第一阀门,控制流出腔室的第二阀门,连接到腔室的压力传感器,用于提供期望质量的输入装置 以及连接到阀门,压力传感器和输入装置的控制器。 控制器被编程为从输入装置接收期望的质量,关闭第二阀并打开第一阀,从压力传感器接收室压力测量值,并且当腔室内的压力达到预定水平时关闭入口阀。 然后将控制器编程为等待预定的等待时间,以允许室内的气体达到平衡状态,然后在时间= t0时打开出口阀,并且当气体质量在时间= t *时关闭出口阀 放电等于所需质量。
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公开(公告)号:US07072743B2
公开(公告)日:2006-07-04
申请号:US10796693
申请日:2004-03-09
CPC分类号: G05D7/0664 , C23C16/45561 , C23C16/52 , Y10T137/0363 , Y10T137/2524
摘要: A system for dividing a single flow into two or more secondary flows of desired ratios, including an inlet adapted to receive the single flow, at least two secondary flow lines connected to the inlet, an input device adapted to receive at least one desired ratio of flow, at least one in-situ process monitor providing measurements of products produced by each of the flows lines, and a controller connected to the input device and the in-situ process monitor. The controller is programmed to receive the desired ratio of flow through the input device, receive the product measurements from the in-situ process monitor, and calculate a corrected ratio of flow based upon the desired ratio of flow and the product measurements. If the product measurements are not equal, then the corrected ratio of flow will be different than the desired ratio of flow.
摘要翻译: 一种用于将单个流分成两个或更多个期望比例的二次流的系统,包括适于接收单个流的入口,连接到入口的至少两个二次流线,适于接收至少一个期望比例的输入装置 至少一个原位过程监视器,其提供由每个流水线产生的产品的测量值,以及连接到输入设备和原位过程监控器的控制器。 控制器被编程为接收通过输入设备的期望流量比,从原位过程监控器接收产品测量值,并且基于所需的流量比和产品测量值来计算校正的流量比。 如果产品测量值不相等,则校正后的流量比将不同于所需的流量比。
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5.
公开(公告)号:US20140096908A1
公开(公告)日:2014-04-10
申请号:US13649103
申请日:2012-10-10
申请人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号: H01J37/32
CPC分类号: H01J37/32431 , H01J37/321 , H01J37/32669
摘要: A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.
摘要翻译: 处理室包括处理室顶部中的多个等离子体源。 每个等离子体源是包括初级绕组和多个铁氧体的环形等离子体源。 还描述了等离子体处理系统。 还描述了等离子体处理的方法。
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公开(公告)号:US07628860B2
公开(公告)日:2009-12-08
申请号:US10822358
申请日:2004-04-12
申请人: Ali Shajii , Siddharth P. Nagarkatti , Matthew Mark Besen , William R. Clark , Daniel Alexander Smith , Bora Akgerman
发明人: Ali Shajii , Siddharth P. Nagarkatti , Matthew Mark Besen , William R. Clark , Daniel Alexander Smith , Bora Akgerman
IPC分类号: C23C16/455 , C23C16/52 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22
CPC分类号: C23C16/45544 , C23C16/45527 , C23C16/45557 , C23C16/52 , Y10S438/935
摘要: A system for delivering a desired mass of gas, including a chamber, a first valve controlling flow into the chamber, a second valve controlling flow out of the chamber, a pressure transducer connected to the chamber, an input device for providing a desired mass to be delivered, and a controller connected to the valves, the pressure transducer and the input device. The controller is programmed to receive the desired mass from the input device, close the second valve and open the first valve, receive chamber pressure measurements from the pressure transducer, and close the inlet valve when pressure within the chamber reaches a predetermined level. The controller is then programmed to wait a predetermined waiting period to allow the gas inside the chamber to approach a state of equilibrium, then open the outlet valve at time=t0, and close the outlet valve at time=t* when the mass of gas discharged equals the desired mass.
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公开(公告)号:US08710926B2
公开(公告)日:2014-04-29
申请号:US13368920
申请日:2012-02-08
IPC分类号: H03F3/45
CPC分类号: H03F3/20 , H01J37/32082 , H01J37/32183 , H03F1/565 , H03F3/195 , H03F2200/321 , H03F2200/387 , H03F2200/391 , H03F2200/393 , H03F2200/451 , H03H7/40 , Y10T307/305
摘要: A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.
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8.
公开(公告)号:US20120035766A1
公开(公告)日:2012-02-09
申请号:US12852375
申请日:2010-08-06
申请人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
发明人: Ali Shajii , Richard Gottscho , Souheil Benzerrouk , Andrew Cowe , Siddharth P. Nagarkatti , William R. Entley
IPC分类号: H01L21/3065 , H05B31/26 , G05B13/02 , H01J61/28
CPC分类号: H01J37/32174 , H01J37/321 , H01J37/3244 , H01J37/32467 , H01J37/32642 , H01J37/3266 , H01J2237/334
摘要: A plasma source includes a ring plasma chamber, a primary winding around an exterior of the ring plasma chamber, multiple ferrites, wherein the ring plasma chamber passes through each of the ferrites and multiple plasma chamber outlets coupling the plasma chamber to a process chamber. Each one of the plasma chamber outlets having a respective plasma restriction. A system and method for generating a plasma are also described.
摘要翻译: 等离子体源包括环等离子体室,围绕环等离子体室的外部的初级绕组,多个铁氧体,其中环等离子体室穿过将等离子体室耦合到处理室的每个铁氧体和多个等离子体室出口。 每个等离子体室出口具有相应的等离子体限制。 还描述了用于产生等离子体的系统和方法。
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公开(公告)号:US08037896B2
公开(公告)日:2011-10-18
申请号:US11333142
申请日:2006-01-17
申请人: Ali Shajii , Siddharth P. Nagarkatti , Gordon Hill
发明人: Ali Shajii , Siddharth P. Nagarkatti , Gordon Hill
IPC分类号: F16K31/02
CPC分类号: G05D16/206 , H01L21/30625 , Y10T137/7761 , Y10T137/7838 , Y10T137/87209 , Y10T137/8733 , Y10T137/8741 , Y10T137/87507 , Y10T137/87772
摘要: A pressure control system remotely controls pressure within one or more remote zones, each respectively connected to an enclosure through a conduit, by controlling flow of a fluid into and out of each enclosure. The pressure of the fluid is measured within each enclosure. An estimated pressure within each zone is computed, as a function of the measured pressure in the enclosure and known characteristics of the conduit and the zone. For each zone, an inlet proportional valve and an outlet proportional valve of each enclosure is operated so as to control the input flow rate of the fluid into the respective enclosure and the output flow rate of the fluid out of the enclosure as a function of a pressure set point and the estimated pressure, thereby regulating pressure within the zone in accordance with the pressure set point.
摘要翻译: 压力控制系统通过控制流入每个外壳的流动来远程控制一个或多个远程区域内的压力,每个远程区域分别通过导管连接到外壳。 在每个外壳内测量流体的压力。 根据外壳中测量的压力和导管和区域的已知特性,计算每个区域内的估计压力。 对于每个区域,操作每个外壳的入口比例阀和出口比例阀,以便控制流体进入相应外壳的流体的输入流量和流出外壳的输出流量作为 压力设定点和估计压力,从而根据压力设定点调节区域内的压力。
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公开(公告)号:US20100231296A1
公开(公告)日:2010-09-16
申请号:US12786763
申请日:2010-05-25
申请人: Siddharth P. Nagarkatti , Michael Kishinevsky , Ali Shajii , Timothy E. Kalvaitis , William S. McKinney, JR. , Daniel Goodman , William M. Holber , John A. Smith
发明人: Siddharth P. Nagarkatti , Michael Kishinevsky , Ali Shajii , Timothy E. Kalvaitis , William S. McKinney, JR. , Daniel Goodman , William M. Holber , John A. Smith
IPC分类号: H03F1/08
摘要: A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system.
摘要翻译: 提供了一种将功率传递给动态负载的系统和方法。 该系统包括提供具有基本上恒定的功率开环响应的DC电力的电源,用于将DC功率转换为RF功率的功率放大器,用于测量与RF功率相关联的电压和电流矢量之间的电压,电流和相位角的传感器 ,电可控阻抗匹配系统,用于将功率放大器的阻抗修改为动态负载的至少基本匹配的阻抗;以及用于控制电可控阻抗匹配系统的控制器。 该系统还包括用于确定由功率放大器输出的功率的传感器校准测量模块,用于确定输送到动态负载的功率的电子匹配系统校准模块,以及用于计算在电气可控阻抗匹配系统中消耗的功率的功率耗散模块。
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