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    Method of forming a polishing pad having reduced striations
    7.
    发明授权
    Method of forming a polishing pad having reduced striations 有权
    形成具有减小的条纹的抛光垫的方法

    公开(公告)号：US07396497B2

    公开(公告)日：2008-07-08

    申请号：US10956847

    申请日：2004-09-30

    申请人： Joseph P. Koetas ,  Alan E. Leviton ,  Kari-Ell Norton ,  Samuel J. November ,  Malcolm W. Robertson ,  Alan H. Saikin

    发明人： Joseph P. Koetas ,  Alan E. Leviton ,  Kari-Ell Norton ,  Samuel J. November ,  Malcolm W. Robertson ,  Alan H. Saikin

    IPC分类号： B28B11/18

    CPC分类号： B29C39/006 ,  B24B37/205 ,  B24D18/00 ,  B29B7/726 ,  B29B7/748

    摘要： The present invention provides a method of forming a chemical mechanical polishing pad, comprising providing a tank with polymeric materials and providing a storage hopper with microspheres having an initial bulk density, wherein the storage hopper further comprises a porous membrane provided over a plenum. The method further provides the steps of connecting a fluidizing gas source to the plenum through a gas inlet line and fluidizing the microspheres and reducing the initial bulk density by feeding gas into the plenum. In addition, the method further provides the steps of providing a delivery system for delivering the polymeric materials and the microspheres to a mixer, forming a mixture of the polymeric materials and the microspheres, pouring the mixture into a mold to form a molded product and cutting the molded product into the polishing pad.

    摘要翻译： 本发明提供一种形成化学机械抛光垫的方法，包括向罐提供聚合材料，并为储存料斗提供具有初始堆积密度的微球，其中储存料斗还包括设置在增压室上的多孔膜。 该方法还提供了通过气体入口管线将流化气体源连接到增压室并使微球流化并通过将气体进入气室而降低初始堆积密度的步骤。 此外，该方法还提供了提供用于将聚合物材料和微球体输送到混合器，形成聚合材料和微球体的混合物的输送系统的步骤，将混合物倒入模具中以形成模制产品并切割 模制产品进入抛光垫。

    Apparatus for forming a polishing pad having a reduced striations
    8.
    发明授权
    Apparatus for forming a polishing pad having a reduced striations 有权
    用于形成具有减小的条纹的抛光垫的装置

    公开(公告)号：US07275856B2

    公开(公告)日：2007-10-02

    申请号：US10956844

    申请日：2004-09-30

    申请人： Joseph P. Koetas ,  Alan E. Leviton ,  Kari-Ell Norton ,  Samuel J. November ,  Malcolm W. Robertson ,  Alan H. Saikin

    发明人： Joseph P. Koetas ,  Alan E. Leviton ,  Kari-Ell Norton ,  Samuel J. November ,  Malcolm W. Robertson ,  Alan H. Saikin

    IPC分类号： B01F13/02

    CPC分类号： B24D18/009 ,  B01F13/02 ,  B29B7/726 ,  B29B7/748

    摘要： The present invention provides an apparatus 20 for forming a striation-reduced chemical mechanical polishing pad 4. The polishing pad 4 comprises a first delivery line 66 for delivering a polymeric material 52 into a mixer 68 and a second delivery line 44 for delivering microspheres 48 into the mixer 68 with the polymeric material 52. The second delivery line 44 is connected to a bulk density control unit 21. The bulk density control unit 21 comprises a storage hopper 22 for storing the microspheres 48. The storage hopper 22 further comprises a porous membrane 24 provided over a plenum 26. A fluidizing gas source 23 is connected to the plenum 26 through a gas inlet line 27. Gas 28 fed into the plenum 26 from the fluidizing gas source 23 permeates through the porous membrane 24 and reduces the initial bulk density of the microspheres 48 in the storage hopper 22.

    摘要翻译： 本发明提供一种用于形成条纹化学机械抛光垫4的装置20。 抛光垫4包括用于将聚合物材料52输送到混合器68中的第一输送管线66和用聚合物材料52将微球48输送到混合器68中的第二输送管线44。 第二输送管线44连接到体积密度控制单元21。 体积密度控制单元21包括用于储存微球48的储存料斗22。 存储料斗22还包括设置在增压室26上方的多孔膜24。 流化气体源23通过气体入口管线27连接到集气室26。 从流化气体源23供给到增压室26中的气体28渗入多孔膜24并降低储存料斗22中的微球48的初始堆积密度。