-
公开(公告)号：US08118897B2
公开(公告)日：2012-02-21
申请号：US13084159
申请日：2011-04-11
申请人： John Esbenshade , Andrew M Geiger , Paul Libbers , Samuel J November , Paul J Sacchetti , Jonathan Tracy , David Verbaro , Michael E Watkins
发明人： John Esbenshade , Andrew M Geiger , Paul Libbers , Samuel J November , Paul J Sacchetti , Jonathan Tracy , David Verbaro , Michael E Watkins
IPC分类号： C09K3/14
CPC分类号： B24D18/0009 , B01F7/00125 , B01F7/00141 , B01F7/00258 , B01F15/00681 , B01F15/00954 , B01F15/00993 , B01F2015/00103 , B01F2015/0011 , B24B37/20 , B29B7/7414 , B29B7/7428 , B29B7/7471 , B29C70/66
摘要： A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.
摘要翻译： 提供了一种用于制造化学机械抛光垫抛光层的混合头组件，其中夹杂的夹杂气体夹杂物缺陷被最小化。
-
公开(公告)号：US20110185967A1
公开(公告)日：2011-08-04
申请号：US13084159
申请日：2011-04-11
申请人： John Esbenshade , Andrew M. Geiger , Paul Libbers , Samuel J. November , Paul J. Sacchetti , Jonathan Tracy , David Verbaro , Michael E. Watkins
发明人： John Esbenshade , Andrew M. Geiger , Paul Libbers , Samuel J. November , Paul J. Sacchetti , Jonathan Tracy , David Verbaro , Michael E. Watkins
IPC分类号： B05C3/04
CPC分类号： B24D18/0009 , B01F7/00125 , B01F7/00141 , B01F7/00258 , B01F15/00681 , B01F15/00954 , B01F15/00993 , B01F2015/00103 , B01F2015/0011 , B24B37/20 , B29B7/7414 , B29B7/7428 , B29B7/7471 , B29C70/66
摘要： A mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers is provided, wherein inclusions of entrained gas inclusion defects are minimized.
摘要翻译： 提供了一种用于制造化学机械抛光垫抛光层的混合头组件，其中夹杂的夹杂气体夹杂物缺陷被最小化。
-
3.发明授权Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects 有权具有降低的气体夹杂物缺陷的化学机械抛光垫抛光层的制造方法公开(公告)号：US07947098B2
公开(公告)日：2011-05-24
申请号：US12490009
申请日：2009-06-23
申请人： John Esbenshade , Andrew M Geiger , Paul Libbers , Samuel J November , Paul J Sacchetti , Jonathan Tracy , David Verbaro , Michael E Watkins
发明人： John Esbenshade , Andrew M Geiger , Paul Libbers , Samuel J November , Paul J Sacchetti , Jonathan Tracy , David Verbaro , Michael E Watkins
IPC分类号： C09K3/14
CPC分类号： B24D18/0009 , B01F7/00125 , B01F7/00141 , B01F7/00258 , B01F15/00681 , B01F15/00954 , B01F15/00993 , B01F2015/00103 , B01F2015/0011 , B24B37/20 , B29B7/7414 , B29B7/7428 , B29B7/7471 , B29C70/66
摘要： A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized.
摘要翻译： 提供了一种使夹带的气体夹杂物缺陷最小化的化学机械抛光垫抛光层的制造方法。 还提供了用于制造化学机械抛光垫抛光层的混合头组件，其中夹带的气体包含缺陷的夹杂物最小化。
-
4.发明申请Method for manufacturing chemical mechanical polishing pad polishing layers having reduced gas inclusion defects 有权具有降低的气体夹杂物缺陷的化学机械抛光垫抛光层的制造方法公开(公告)号：US20100269416A1
公开(公告)日：2010-10-28
申请号：US12490009
申请日：2009-06-23
申请人： John Esbenshade , Andrew M. Geiger , Paul Libbers , Samuel J. November , Paul J. Sacchetti , Jonathan Tracy , David Verbaro , Michael E. Watkins
发明人： John Esbenshade , Andrew M. Geiger , Paul Libbers , Samuel J. November , Paul J. Sacchetti , Jonathan Tracy , David Verbaro , Michael E. Watkins
CPC分类号： B24D18/0009 , B01F7/00125 , B01F7/00141 , B01F7/00258 , B01F15/00681 , B01F15/00954 , B01F15/00993 , B01F2015/00103 , B01F2015/0011 , B24B37/20 , B29B7/7414 , B29B7/7428 , B29B7/7471 , B29C70/66
摘要： A method for manufacturing chemical mechanical polishing pad polishing layers that minimizes entrained gas inclusion defects is provided. Also provided is a mix head assembly for use in the manufacture of chemical mechanical polishing pad polishing layers, wherein inclusions of entrained gas inclusion defects are minimized.
摘要翻译： 提供了一种使夹带的气体夹杂物缺陷最小化的化学机械抛光垫抛光层的制造方法。 还提供了用于制造化学机械抛光垫抛光层的混合头组件，其中夹带的气体包含缺陷的夹杂物最小化。
-
-
-
搜索结果
4 条记录 (耗时 0.015 秒)
