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1.发明申请Fluorine-Containing Sulfonate Resin, Fluorine-Containing N-Sulfonyloxyimide Resin, Resist Composition and Pattern Formation Method 有权含氟磺酸酯树脂，含氟的N-磺酰氧基酰亚胺树脂，抗蚀剂组合物和图案形成方法公开(公告)号：US20120328985A1
公开(公告)日：2012-12-27
申请号：US13524627
申请日：2012-06-15
Applicant: Misugi KATO , Yoshimi Isono , Satoru Narizuka , Ryozo Takihana , Kazunori Mori
Inventor： Misugi KATO , Yoshimi Isono , Satoru Narizuka , Ryozo Takihana , Kazunori Mori
IPC: C08F228/04 , G03F7/20 , C08F228/02 , C07D209/48 , C07C381/12 , C07D333/76 , C07D333/08 , C07D207/46 , G03F7/004 , C07C309/12
CPC classification number: C08F20/38 , C07C25/18 , C07C309/12 , C07C381/12 , C07D207/46 , C07D209/48 , C07D333/08 , C07D333/76 , C08F22/24 , C08F28/02 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397
Abstract: According to the present invention, there are provided a fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). It is possible obtain a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.
Abstract translation: 根据本发明，提供具有以下通式（A）的结构的含氟磺酸盐树脂或含氟磺酸酯树脂和具有一般重复单元的含氟N-磺酰氧基酰亚胺树脂 式（17）。 可以使用上述树脂获得抗蚀剂组合物，使得抗蚀剂组合物可以获得高分辨率，宽DOF，小LER和高灵敏度并形成良好的图案形状。
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2.发明授权Fluorine-containing sulfonate resin, fluorine-containing N-sulfonyloxyimide resin, resist composition and pattern formation method 有权含氟磺酸树脂，含氟N-磺酰氧基酰亚胺树脂，抗蚀剂组合物和图案形成方法公开(公告)号：US09221928B2
公开(公告)日：2015-12-29
申请号：US13524627
申请日：2012-06-15
Applicant: Misugi Kato , Yoshimi Isono , Satoru Narizuka , Ryozo Takihana , Kazunori Mori
Inventor： Misugi Kato , Yoshimi Isono , Satoru Narizuka , Ryozo Takihana , Kazunori Mori
IPC: C08F20/38 , C08F22/24 , C08F28/02 , C07C309/12 , G03F7/028 , G03F7/004 , G03F7/038 , G03F7/039 , C07C381/12 , C07C25/18 , C07D333/08 , C07D333/76 , C07D207/46 , C07D209/48
CPC classification number: C08F20/38 , C07C25/18 , C07C309/12 , C07C381/12 , C07D207/46 , C07D209/48 , C07D333/08 , C07D333/76 , C08F22/24 , C08F28/02 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397
Abstract: A fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). And a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.
Abstract translation: 具有以下通式（A）的结构的含氟磺酸盐树脂或含氟磺酸酯树脂和具有通式（17）的重复单元的含氟N-磺酰氧基酰亚胺树脂。 以及使用上述树脂的抗蚀剂组合物，使得抗蚀剂组合物可以获得高分辨率，宽DOF，小LER和高灵敏度并形成良好的图案形状。
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公开(公告)号：US08846966B2
公开(公告)日：2014-09-30
申请号：US13126078
申请日：2009-10-21
Applicant: Yuji Hagiwara , Ryozo Takihana , Masanori Fushimi , Yoshimi Isono , Satoru Narizuka
Inventor： Yuji Hagiwara , Ryozo Takihana , Masanori Fushimi , Yoshimi Isono , Satoru Narizuka
IPC: C07C211/05 , C07C211/07 , C07C211/63 , C07C303/02 , C07C303/22 , C07C303/44 , C07C313/04
CPC classification number: C07C313/04 , C07C211/05 , C07C211/07 , C07C211/63 , C07C303/02 , C07C303/22 , C07C303/44 , C07C309/17
Abstract: In the present invention, a target alkoxycarbonylfluoroalkanesulfonic acid salt is obtained by using a halofluoroalkanoic acid ester as a starting raw material, sulfinating the halofluoroalkanoic acid ester in the presence of an amine (as a first step), and then, oxidizing the resulting sulfination product (as a second step). Further, an alkoxycarbonylfluoroalkanesulfinic acid onium salt, which is useful as a photoacid generator, is obtained by salt exchange reaction of the alkoxycarbonylfluoroalkanesulfonic acid salt.
Abstract translation: 在本发明中，通过使用卤代氟烷基酸酯作为起始原料，在胺的存在下硫化卤代氟烷基酯（作为第一工序），得到目标烷氧基羰基氟烷基磺酸盐，然后氧化得到的硫酸化物 （作为第二步）。 此外，通过烷氧基羰基氟烷基磺酸盐的盐交换反应获得可用作光酸产生剂的烷氧基羰基氟烷基亚磺酸鎓盐。
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Patent Agency Ranking
4.发明申请公开(公告)号：US20130209938A1
公开(公告)日：2013-08-15
申请号：US13879989
申请日：2011-10-14
Applicant: Ryozo Takihana , Satoru Narizuka
Inventor： Ryozo Takihana , Satoru Narizuka
IPC: G03F7/027
CPC classification number: G03F7/027 , C07C303/32 , C07C309/06 , C07C309/10 , C07C309/12 , C07C309/16 , C07C309/19 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041 , Y10S430/111 , Y10S430/122 , Y10S430/123
Abstract: A resist composition according to the present invention includes at least a base resin, a photoacid generator and a solvent, wherein the photoacid generator comprises a fluorine-containing sulfonic acid salt of the following general formula (4). In the formula, X independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 6; R1 represents a hydrogen atom, or an alkyl, alkenyl, oxoalkyl, aryl or aralkyl group; any of hydrogen atoms on carbons in R1 may be substituted with a substituent; R2 represents RAO or RBRCN; and A represents a divalent group. This fluorine-containing sulfonic acid salt can serve as a photoacid generator having high solubility in a resist solvent and thus can suitably be used for a resist composition such that the resist composition shows high resolution, wide DOF, small LER and high sensitivity to form a good pattern shape in lithographic processes.
Abstract translation: 根据本发明的抗蚀剂组合物至少包括基础树脂，光致酸产生剂和溶剂，其中光酸产生剂包含以下通式（4）的含氟磺酸盐。 在该式中，X独立地表示氢原子或氟原子; n表示1〜6的整数， R1表示氢原子，或烷基，烯基，氧代烷基，芳基或芳烷基; R1中碳上的任何氢原子可以被取代基取代; R2代表RAO或RBRCN; A表示二价基团。 该含氟磺酸盐可以用作在抗蚀剂溶剂中具有高溶解度的光致酸产生剂，因此可以适当地用于抗蚀剂组合物，使得抗蚀剂组合物显示出高分辨率，宽DOF，小LER和高灵敏度以形成 光刻工艺中的良好图案形状。
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5.发明授权Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same 有权可聚合的含氟磺酸盐，含氟磺酸盐树脂，抗蚀剂组合物和使用它们的图案形成方法公开(公告)号：US09182664B2
公开(公告)日：2015-11-10
申请号：US13878597
申请日：2011-10-05
Applicant: Ryozo Takihana , Satoru Narizuka
Inventor： Ryozo Takihana , Satoru Narizuka
IPC: G03F7/004 , C07C309/10 , C07C381/12 , C08F20/38 , C08F220/26 , C08F232/04 , C08F28/02 , G03F7/00 , G03F7/20 , G03F7/038 , G03F7/039
CPC classification number: C08F28/02 , C07C309/10 , C07C381/12 , C07C2601/14 , C08F20/38 , C08F220/26 , C08F232/04 , G03F7/00 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/20 , G03F7/2039 , G03F7/2041
Abstract: A sulfonate resin having a repeating unit of the following general formula (3): where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R1 represents a hydrogen atom, a halogen atom, a C1-C3 alkyl group or a C1-C3 fluorine-containing alkyl group; R2 represents either RAO or RBRCN; and M+ represents a monovalent cation. The sulfonate resin has an onium sulfonate incorporated in a side chain thereof with an anion moiety of the sulfonate salt fixed to the resin and can suitably be used as a resist resin having a high solubility in propylene glycol monomethyl ether acetate.
Abstract translation: 具有以下通式（3）的重复单元的磺酸树脂：其中X各自独立地表示氢原子或氟原子; n表示1〜10的整数， R1表示氢原子，卤素原子，C1-C3烷基或C1-C3含氟烷基; R2代表RAO或RBRCN; M +表示一价阳离子。 磺酸酯树脂在其侧链中具有磺酸盐，其中磺酸盐的阴离子部分固定在树脂上，并且可以适当地用作在丙二醇单甲醚乙酸酯中具有高溶解度的抗蚀剂树脂。
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6.发明授权公开(公告)号：US08993212B2
公开(公告)日：2015-03-31
申请号：US13879989
申请日：2011-10-14
Applicant: Ryozo Takihana , Satoru Narizuka
Inventor： Ryozo Takihana , Satoru Narizuka
IPC: G03F7/004 , G03F7/38 , C07C303/32 , C07C309/06 , C07C309/16 , C07C309/19 , G03F7/027 , C07C309/12 , C07C309/10 , C07C381/12 , G03F7/038 , G03F7/039 , G03F7/20
CPC classification number: G03F7/027 , C07C303/32 , C07C309/06 , C07C309/10 , C07C309/12 , C07C309/16 , C07C309/19 , C07C381/12 , C07C2601/14 , C07C2603/74 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/2041 , Y10S430/111 , Y10S430/122 , Y10S430/123
Abstract: A resist composition according to the present invention includes at least a base resin, a photoacid generator and a solvent, wherein the photoacid generator comprises a fluorine-containing sulfonic acid salt of the following general formula (4). In the formula, X independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 6; R1 represents a hydrogen atom, or an alkyl, alkenyl, oxoalkyl, aryl or aralkyl group; any of hydrogen atoms on carbons in R1 may be substituted with a substituent; R2 represents RAO or RBRCN; and A represents a divalent group. This fluorine-containing sulfonic acid salt can serve as a photoacid generator having high solubility in a resist solvent and thus can suitably be used for a resist composition such that the resist composition shows high resolution, wide DOF, small LER and high sensitivity to form a good pattern shape in lithographic processes.
Abstract translation: 根据本发明的抗蚀剂组合物至少包括基础树脂，光致酸产生剂和溶剂，其中光酸产生剂包含以下通式（4）的含氟磺酸盐。 在该式中，X独立地表示氢原子或氟原子; n表示1〜6的整数， R1表示氢原子，或烷基，烯基，氧代烷基，芳基或芳烷基; R1中碳上的任何氢原子可以被取代基取代; R2代表RAO或RBRCN; A表示二价基团。 该含氟磺酸盐可以用作在抗蚀剂溶剂中具有高溶解度的光致酸产生剂，因此可以适当地用于抗蚀剂组合物，使得抗蚀剂组合物显示出高分辨率，宽DOF，小LER和高灵敏度以形成 光刻工艺中的良好图案形状。
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7.发明申请Polymerizable Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition And Pattern-Forming Method Using Same 有权含可聚合氟的磺酸酯，含氟的磺酸酯树脂，抗蚀剂组合物和使用相同的图案形成方法公开(公告)号：US20130209937A1
公开(公告)日：2013-08-15
申请号：US13878597
申请日：2011-10-05
Applicant: Ryozo Takihana , Satoru Narizuka
Inventor： Ryozo Takihana , Satoru Narizuka
CPC classification number: C08F28/02 , C07C309/10 , C07C381/12 , C07C2601/14 , C08F20/38 , C08F220/26 , C08F232/04 , G03F7/00 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/20 , G03F7/2039 , G03F7/2041
Abstract: According to the present invention, there is provided a sulfonate resin having a repeating unit of the following general formula (3): where X each independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 10; R1 represents a hydrogen atom, a halogen atom, a C1-C3 alkyl group or a C1-C3 fluorine-containing alkyl group; R2 represents either RAO or RBRCN; and M+ represents a monovalent cation.The sulfonate resin has an onium sulfonate incorporated in a side chain thereof with an anion moiety of the sulfonate salt fixed to the resin and can suitably be used as a resist resin having a high solubility in propylene glycol monomethyl ether acetate.
Abstract translation: 根据本发明，提供具有以下通式（3）的重复单元的磺酸树脂：其中X各自独立地表示氢原子或氟原子; n表示1〜10的整数， R1表示氢原子，卤素原子，C1-C3烷基或C1-C3含氟烷基; R2代表RAO或RBRCN; M +表示一价阳离子。 磺酸酯树脂在其侧链中具有磺酸盐，其中磺酸盐的阴离子部分固定在树脂上，并且可以适当地用作在丙二醇单甲醚乙酸酯中具有高溶解度的抗蚀剂树脂。
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公开(公告)号：US20110207954A1
公开(公告)日：2011-08-25
申请号：US13126078
申请日：2009-10-21
Applicant: Yuji Hagiwara , Ryozo Takihana , Masanori Fushimi , Yoshimi Isono , Satoru Narizuka
Inventor： Yuji Hagiwara , Ryozo Takihana , Masanori Fushimi , Yoshimi Isono , Satoru Narizuka
IPC: C07C303/38 , C07C307/00
CPC classification number: C07C313/04 , C07C211/05 , C07C211/07 , C07C211/63 , C07C303/02 , C07C303/22 , C07C303/44 , C07C309/17
Abstract: In the present invention, a target alkoxycarbonylfluoroalkanesulfonic acid salt is obtained by using a halofluoroalkanoic acid ester as a starting raw material, sulfinating the halofluoroalkanoic acid ester in the presence of an amine (as a first step), and then, oxidizing the resulting sulfination product (as a second step). Further, an alkoxycarbonylfluoroalkanesulfinic acid onium salt, which is useful as a photoacid generator, is obtained by salt exchange reaction of the alkoxycarbonylfluoroalkanesulfonic acid salt.
Abstract translation: 在本发明中，通过使用卤代氟烷基酸酯作为起始原料，在胺的存在下硫化卤代氟烷基酯（作为第一工序），得到目标烷氧基羰基氟烷基磺酸盐，然后氧化得到的硫酸化物 （作为第二步）。 此外，通过烷氧基羰基氟烷基磺酸盐的盐交换反应获得可用作光酸产生剂的烷氧基羰基氟烷基亚磺酸鎓盐。
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