摘要:
A fluorine-containing sulfonate salt resin or fluorine-containing sulfonate ester resin having a structure of the following general formula (A) and a fluorine-containing N-sulfonyloxyimide resin having a repeating unit of the general formula (17). And a resist composition using the above resin such that the resist composition can attain high resolution, wide DOF, small LER and high sensitivity and form a good pattern shape.
摘要:
An α-trifluoromethyl-α,β-unsaturated ester can be produced by reacting an α-trifluoromethyl-α-hydroxy ester with sulfuryl fluoride (SO2F2) in the presence of an organic base. It is preferable that the raw substrate has a hydrogen atom as one β-position substituent group and either an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an aromatic ring group or a substituted aromatic ring group as the other β-position substituent group. It is more preferable that an ester moiety of the raw substrate is an alkyl ester. This raw substrate is readily available. Further, the desired reaction can proceed favorably with the use of this raw substrate. It is also preferable to use either 1,5-diazabicyclo[4.3.0]non-5-ene (DBN) or 1,8-diazabicyclo[5.4.0]undec-7-ene (DBU) as the organic base. The desired reaction can proceed more favorably with the use of this organic base.
摘要:
There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W1 represents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.
摘要:
A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.
摘要:
There are provided a storage apparatus and a computer-readable recording medium, on whose storage areas, servo frames are arranged at uniform intervals in a spoke-like pattern. Each of the servo frames has an index bit storing section storing, as an index bit, part of an index pattern, which is operable to identify a storage area. The apparatus and the recording medium have a storage area recognizing unit for recognizing the storage areas based on the index bits, which are obtained by an index bit obtaining unit. The index bits, stored one in each of the index bit storing sections of the servo frames, are adapted to form, when being sequentially arranged, an index bit string in which such an index pattern repeatedly appears.
摘要:
A disk device performs feedforward servo control for moving a head to a target track. The disk device includes a calibrating portion for updating feedforward information, for moving the head, into information dedicated to the specific disk device; and a feedforward information storing portion for storing the feedforward information.
摘要:
A disk storage device includes at least one disk, a head for scanning a principal surface of the disk in a generally radial direction thereof for reproducing a servo control signal in response to a servo pattern that is recorded on the principal surface, a rotary mechanism for moving the head along the principal surface of the disk generally in the radial direction, an amplifier supplied with the servo signal reproduced at the head for amplifying the same with a predetermined gain, a signal processing circuit for extracting first and second positional control signals each having a phase that is offset with respect to the phase of the other positional control signal by 90 degrees, from the servo control signal, a level detection circuit for detecting a head position at which the first and second positional control signals have simultaneously an identical level and further for detecting the level of the first and second positional control signals at the detected head position, a gain control circuit for controlling the gain of the amplifier such that an absolute value of the foregoing level is set to a predetermined value, and a head position control circuit for controlling a driving circuit in response to a combination of the first and second positional control signals, the head position control circuit locating the head on a predetermined recording track based upon a head position in which the first and second positional control signals have the same level simultaneously.
摘要:
A method of steering a vehicle having a set of steerable front wheels and a set of steerable rear wheels. The front and rear wheels are both secondarily steered in addition to a main steer of the front wheels caused by an operation of a front wheel steering gear in response to an operation of a steering wheel. The method comprises providing to the front wheels a secondary steer angle corresponding to at least a differentiated value of a steer angle of a steering wheel in such a way as to increase an overall steer angle of the front wheels and providing to the rear wheels a secondary steer angle proportional to the steer angle of the steering wheel and in the same direction as the steer angle of the front wheels.
摘要:
A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. In the formula, R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R8 represents a substituted or unsubstituted alkyl group or the like; and W1 represents a single bond, a substituted or unsubstituted methylene group or the like.
摘要:
According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C1-C6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C1-C6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C1-C3 alkyl or fluorine-containing alkyl group; and Q+ represents a sulfonium cation or an iodonium cation.