Multi-phase switching regulator and droop circuit therefor
    1.
    发明授权
    Multi-phase switching regulator and droop circuit therefor 有权
    多相开关调节器及其下垂电路

    公开(公告)号:US08917077B2

    公开(公告)日:2014-12-23

    申请号:US13938154

    申请日:2013-07-09

    IPC分类号: G05F1/00 G05F1/10

    摘要: The present invention provides a multi-phase switching regulator and a droop circuit for use in the multi-phase switching regulator. The multi-phase switching regulator generates pulse width modulation (PWM) signals according to an output voltage and a droop signal, to drive a plurality of switching sets to convert an input voltage to the output voltage. The droop circuit detects the sum of the currents generated by the plurality of switching sets and provides the droop signal which is related to the sum of the currents to the multi-phase switching regulator. The droop signal can be used for over current protection (OCP) or for the droop control.

    摘要翻译: 本发明提供一种用于多相开关调节器的多相开关调节器和下垂电路。 多相开关调节器根据输出电压和下降信号产生脉冲宽度调制(PWM)信号,以驱动多个开关组以将输入电压转换为输出电压。 下垂电路检测由多个开关组产生的电流的和,并提供与多相开关调节器的电流之和相关的下降信号。 下垂信号可用于过流保护(OCP)或下垂控制。

    DEPOSITION NOZZLE AND APPARATUS FOR THIN FILM DEPOSITION PROCESS
    3.
    发明申请
    DEPOSITION NOZZLE AND APPARATUS FOR THIN FILM DEPOSITION PROCESS 有权
    沉积喷嘴和薄膜沉积工艺的装置

    公开(公告)号:US20130001330A1

    公开(公告)日:2013-01-03

    申请号:US13495889

    申请日:2012-06-13

    申请人: Jen-Rong HUANG

    发明人: Jen-Rong HUANG

    IPC分类号: C23C16/455 B05B1/00 C23C16/52

    摘要: A deposition nozzle and a deposition apparatus include a nozzle body, a precursor passageway formed at a central region of the nozzle body for a precursor gas to be sprayed on the substrate such that the precursor gas reacts with a surface of the substrate, an extraction passageway formed in the nozzle body and located at a peripheral side of the precursor passageway, and extracting residues after the precursor gas reacts with the surface of the substrate, and an air curtain passageway formed in the nozzle body and located at a peripheral side of the extraction passageway for isolating gas to be sprayed on the substrate so as to form a closed gas flow field enclosing a process reaction region between a substrate carrier and the deposition nozzle such that the residues after the precursor gas reacts with the surface of the substrate do not leak.

    摘要翻译: 沉积喷嘴和沉积设备包括喷嘴体,前体通道,形成在喷嘴体的中心区域,用于待喷涂在基板上的前体气体,使得前体气体与基板的表面反应,提取通道 形成在喷嘴体中并且位于前体通路的周边,并且在前体气体与基板的表面反应之后提取残留物,以及形成在喷嘴体中并位于提取物的外围侧的气幕通道 用于将待喷雾的气体隔离在基板上,以形成封闭的气体流场,其包围基板载体和沉积喷嘴之间的工艺反应区域,使得前体气体与基板表面反应的残留物不会泄漏 。

    Output buffer and source driver using the same
    5.
    发明授权
    Output buffer and source driver using the same 有权
    输出缓冲器和源驱动器使用相同

    公开(公告)号:US08164278B2

    公开(公告)日:2012-04-24

    申请号:US12354591

    申请日:2009-01-15

    申请人: Da-Rong Huang

    发明人: Da-Rong Huang

    IPC分类号: H05B41/36

    CPC分类号: G09G3/3688 G09G2330/021

    摘要: An output buffer and a source driver using the same are provided. The output buffer includes an input stage module, a first output stage module, a second output stage module, and a first control module. The input stage module generates a first bias signal via a first connection terminal according to a driving signal and a output signal. The first output stage module generates the output signal in response to the first bias signal via an output terminal of the output buffer. The second output stage module generates a second bias signal in response to the first bias signal via a second connection terminal, and controls a first switch in the second output stage module. The first control module selectively connects a first current source to the output terminal of the output buffer or to the second connection terminal of the second output stage module according to an indication signal.

    摘要翻译: 提供了一个输出缓冲器和使用它的源驱动器。 输出缓冲器包括输入级模块,第一输出级模块,第二输出级模块和第一控制模块。 输入级模块根据驱动信号和输出信号经由第一连接端产生第一偏置信号。 第一输出级模块经由输出缓冲器的输出端产生响应于第一偏置信号的输出信号。 第二输出级模块经由第二连接端子响应于第一偏置信号产生第二偏置信号,并控制第二输出级模块中的第一开关。 第一控制模块根据指示信号选择性地将第一电流源连接到输出缓冲器的输出端或第二输出级模块的第二连接端。

    Device for separating out radioisotope thallium-201
    6.
    发明授权
    Device for separating out radioisotope thallium-201 有权
    用于分离放射性同位素铊-201的装置

    公开(公告)号:US08157998B2

    公开(公告)日:2012-04-17

    申请号:US12621979

    申请日:2009-11-19

    IPC分类号: B01D59/26

    摘要: Disclosed is a device for separating radioisotope thallium-201. The device includes an evaporation unit for a solution vial, a first glass vial connected to a first valve and a second valve, an ion exchange column connected to a third valve, a second glass vial connected to a fourth valve and a fifth valve, a collection vial for receiving solution from the fifth valve, a product vial with a membrane filter and a vacuum unit connected to the first valve, the fourth valve and a sixth valve. This device can separate out high-concentration thallium-201 solution from which radioisotope thallium-201 can be obtained.

    摘要翻译: 公开了一种用于分离放射性同位素铊-201的装置。 该装置包括用于溶液小瓶的蒸发单元,连接到第一阀和第二阀的第一玻璃小瓶,连接到第三阀的离子交换柱,连接到第四阀和第五阀的第二玻璃小瓶, 用于从第五阀接收溶液的收集瓶,具有膜过滤器的产品小瓶和连接到第一阀,第四阀和第六阀的真空单元。 该装置可以分离出可从其获得放射性同位素铊-201的高浓度铊-201溶液。

    PLASMA ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND THE CONTROLLING METHOD THEREOF
    7.
    发明申请
    PLASMA ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND THE CONTROLLING METHOD THEREOF 审中-公开
    等离子体增强原子层沉积装置及其控制方法

    公开(公告)号:US20120070590A1

    公开(公告)日:2012-03-22

    申请号:US12970403

    申请日:2010-12-16

    IPC分类号: C23C16/448 C23C16/02

    CPC分类号: C23C16/45536 C23C16/45551

    摘要: This prevent disclosure provides a plasma enhanced atomic layer deposition apparatus and the controlling method thereof. The plasma enhanced atomic layer deposition apparatus includes: a plurality of reaction chambers, each of the reaction chambers having a first reaction space and a second reaction space; an adjustable partition unit controlled to separate or communicate the first and the second reaction spaces; and a plurality of heating carriers respectively disposed in the plurality of reaction chambers. The method manipulates the movement of the partition plate, leading to separation or communication between the first and second reaction spaces, so as to avoid the interference or inter-reaction between process gases and the resultant particles contaminating the substrates.

    摘要翻译: 这种防止公开提供等离子体增强原子层沉积装置及其控制方法。 等离子体增强原子层沉积装置包括:多个反应室,每个反应室具有第一反应空间和第二反应空间; 被调节以分离或通信第一和第二反应空间的可调分隔单元; 以及分别设置在多个反应室中的多个加热载体。 该方法操纵分隔板的运动,导致第一和第二反应空间之间的分离或连通,以避免处理气体和所得颗粒污染基板之间的干扰或相互作用。

    VOLTAGE REGULATOR HAVING AN OUTPUT VOLTAGE AUTOMATICALLY ADJUSTED ACCORDING TO A LOAD CURRENT
    8.
    发明申请
    VOLTAGE REGULATOR HAVING AN OUTPUT VOLTAGE AUTOMATICALLY ADJUSTED ACCORDING TO A LOAD CURRENT 失效
    具有根据负载电流自动调整的输出电压的电压调节器

    公开(公告)号:US20120038334A1

    公开(公告)日:2012-02-16

    申请号:US12857800

    申请日:2010-08-17

    IPC分类号: G05F1/10

    摘要: A voltage regulator includes an adjuster to provide an adjust signal according to its load current to adjust at least one of the feedback signal, the reference signal, the error signal, and the ripple signal of the voltage regulator, to automatically adjust the output voltage. The output voltage increases when the load current increases, and decreases when the load current decreases. Preferably, a CCR voltage regulator according to the present invention will have its PWM frequency varying with its output voltage and thus have better transient performance.

    摘要翻译: 电压调节器包括调节器,以根据其负载电流提供调节信号,以调整电压调节器的反馈信号,参考信号,误差信号和纹波信号中的至少一个,以自动调节输出电压。 当负载电流增加时,输出电压增加,负载电流下降时输出电压降低。 优选地,根据本发明的CCR电压调节器将其PWM频率随其输出电压变化并因此具有更好的瞬态性能。

    Voltage Regulator and Control Circuit and Method Therefor
    9.
    发明申请
    Voltage Regulator and Control Circuit and Method Therefor 有权
    电压调节器及其控制电路及其方法

    公开(公告)号:US20110316518A1

    公开(公告)日:2011-12-29

    申请号:US13160308

    申请日:2011-06-14

    IPC分类号: G05F1/46

    摘要: The present invention discloses a voltage regulator, and a control circuit and a control method therefor. The method for controlling a voltage regulator comprises: receiving a dynamic voltage identification signal which instructs the voltage regulator to change its output voltage to a target voltage, and generating a compensation signal to shorten an interval for the output voltage of the voltage regulator to reach the target voltage.

    摘要翻译: 本发明公开了一种电压调节器及其控制电路及其控制方法。 用于控制电压调节器的方法包括:接收动态电压识别信号,其指示电压调节器将其输出电压改变到目标电压,并产生补偿信号以缩短电压调节器的输出电压的间隔以达到 目标电压。

    Method for producing silicon substrate for solar cells
    10.
    发明授权
    Method for producing silicon substrate for solar cells 有权
    太阳能电池用硅基板的制造方法

    公开(公告)号:US08053270B2

    公开(公告)日:2011-11-08

    申请号:US12214183

    申请日:2008-06-16

    IPC分类号: H01L31/0236

    摘要: A method for producing a silicon substrate for solar cells is provided. The method includes performing a saw damage removal (SDR) and surface macro-texturing on a silicon substrate with acids solution, so that a surface of the silicon substrate becomes an irregular surface. Thereafter, a metal-activated selective oxidation is performed on the irregular surface with an aqueous solution containing an oxidant and a metal salt, in which the oxidant is one selected from persulfate ion, permanganate ion, bichromate ion, and a mixture thereof. Afterwards, the irregular surface is etched with an aqueous solution containing HF and H2O2 so as to form a nano-texturized silicon substrate.

    摘要翻译: 提供一种太阳能电池用硅基板的制造方法。 该方法包括用酸溶液在硅衬底上进行锯损坏去除(SDR)和表面宏纹理,使得硅衬底的表面变成不规则表面。 此后,用含有氧化剂和金属盐的水溶液对不规则表面进行金属活化选择性氧化,其中氧化剂选自过硫酸根离子,高锰酸根离子,重铬酸根离子及其混合物。 然后,用含有HF和H 2 O 2的水溶液蚀刻不规则表面,以形成纳米组织化的硅衬底。