发明申请
- 专利标题： DEPOSITION NOZZLE AND APPARATUS FOR THIN FILM DEPOSITION PROCESS
- 专利标题（中）： 沉积喷嘴和薄膜沉积工艺的装置
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申请号： US13495889申请日： 2012-06-13
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公开(公告)号： US20130001330A1公开(公告)日： 2013-01-03
- 发明人: Jen-Rong HUANG
- 申请人： Jen-Rong HUANG
- 申请人地址： TW Hsinchu
- 专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人： INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人地址： TW Hsinchu
- 优先权： TW100123273 20110701
- 主分类号： C23C16/455
- IPC分类号： C23C16/455 ; B05B1/00 ; C23C16/52
摘要：
A deposition nozzle and a deposition apparatus include a nozzle body, a precursor passageway formed at a central region of the nozzle body for a precursor gas to be sprayed on the substrate such that the precursor gas reacts with a surface of the substrate, an extraction passageway formed in the nozzle body and located at a peripheral side of the precursor passageway, and extracting residues after the precursor gas reacts with the surface of the substrate, and an air curtain passageway formed in the nozzle body and located at a peripheral side of the extraction passageway for isolating gas to be sprayed on the substrate so as to form a closed gas flow field enclosing a process reaction region between a substrate carrier and the deposition nozzle such that the residues after the precursor gas reacts with the surface of the substrate do not leak.
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