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    PHOTORESISTS CONTAINING POLYMER-TETHERED NANOPARTICLES
    3.
    发明申请
    PHOTORESISTS CONTAINING POLYMER-TETHERED NANOPARTICLES 有权
    含有聚合物纳米粒子的光催化剂

    公开(公告)号：US20140080061A1

    公开(公告)日：2014-03-20

    申请号：US14007270

    申请日：2012-05-23

    申请人： David H. Redinger ,  Robert J. DeVoe ,  Belma Erdogan-Haug

    发明人： David H. Redinger ,  Robert J. DeVoe ,  Belma Erdogan-Haug

    IPC分类号： G03F7/004 ,  G03F7/20

    CPC分类号： G03F7/004 ,  A61M37/0015 ,  A61M2037/003 ,  A61M2037/0053 ,  F04C2270/0421 ,  G03F7/0047 ,  G03F7/027 ,  G03F7/20 ,  G03F7/70375

    摘要： Compositions such as photoresists and microfabrication processes are provided that can produce high-fidelity microfabricated structures. The provided photoresists can have reduced swelling during the development phase and can give tight tolerances for products, such as microneedles, that can be used, for example, in the medical field. The provided compositions include a photoresist, a photoinitiator system dispersed in the photoresist, and a polymer-tethered nanoparticle dispersed in the photoresist. The photoresist can be a negative photoresist and the photoinitiator system can include a two-photoinitiator system. The polymer-tethered nanoparticle can include an acrylic polymer and, in some embodiments, can include poly(methyl methacrylate). The nanoparticles can include silica.

    摘要翻译： 提供了诸如光致抗蚀剂和微细加工方法的组合物，其可以产生高保真的微制造结构。 所提供的光致抗蚀剂在显影阶段可以减少溶胀，并且可以为可用于例如医疗领域的产品（例如微针）提供严格的公差。 所提供的组合物包括光致抗蚀剂，分散在光致抗蚀剂中的光引发剂体系和分散在光致抗蚀剂中的聚合物 - 束缚的纳米颗粒。 光致抗蚀剂可以是负性光致抗蚀剂，并且光引发剂体系可以包括双光引发剂体系。 聚合物束缚的纳米颗粒可以包括丙烯酸聚合物，并且在一些实施方案中可以包括聚（甲基丙烯酸甲酯）。 纳米颗粒可以包括二氧化硅。

    Enhanced Multi-Photon Imaging Resolution Method
    4.
    发明申请
    Enhanced Multi-Photon Imaging Resolution Method 审中-公开
    增强型多光子成像分辨率方法

    公开(公告)号：US20140030655A1

    公开(公告)日：2014-01-30

    申请号：US14002493

    申请日：2012-04-17

    申请人： Robert J. DeVoe

    发明人： Robert J. DeVoe

    IPC分类号： G03F7/00 ,  G03F7/031

    CPC分类号： G03F7/0037 ,  B33Y70/00 ,  G03F7/029 ,  G03F7/031 ,  G03F7/038 ,  G03F7/2055

    摘要： A method and a multi-photon photocurable composition are provided that allow for the formation of a three-dimensional microstructure having enhanced imaging resolution. The method involves providing a multi-photon photocurable composition system having an acrylic prepolymer and a multiphotohn photoinitiator system that comprises at least one distyrylbenzene dye or a benzothiazolyl fluorine derivative. The method includes imagewise exposing at least one voxel of the photocurable composition to a dose of electromagnetic energy under conditions effective to photodefinably form at least one solid voxel of a three-dimensional microstructure having a volume, wherein the solid voxel volume varies inversely with the dose.

    摘要翻译： 提供一种方法和多光子可光固化组合物，其允许形成具有增强的成像分辨率的三维微结构。 该方法包括提供具有丙烯酸类预聚物和多光照光引发剂体系的多光子可光固化组合物体系，其包含至少一种二苯乙烯基苯染料或苯并噻唑基氟衍生物。 该方法包括将可光固化组合物的至少一个体素成像曝光至一定剂量的电磁能量，该条件有效地可光化地形成具有体积的三维微结构体的至少一个固体体素，其中固体体素体积与剂量成反比变化 。

    NOZZLE AND METHOD OF MAKING SAME
    5.
    发明申请
    NOZZLE AND METHOD OF MAKING SAME 审中-公开
    喷嘴及其制作方法

    公开(公告)号：US20130313339A1

    公开(公告)日：2013-11-28

    申请号：US13982866

    申请日：2012-02-02

    申请人： Barry S. Carpenter ,  Ryan C. Shirk ,  Robert J. DeVoe ,  James C. Novack

    发明人： Barry S. Carpenter ,  Ryan C. Shirk ,  Robert J. DeVoe ,  James C. Novack

    IPC分类号： F02M61/16 ,  F02M61/18

    CPC分类号： F02M61/168 ,  B29C33/424 ,  C25D1/10 ,  F02M43/04 ,  F02M61/1833 ,  F02M61/184 ,  F02M61/1846 ,  F02M61/1853 ,  F02M2200/8046 ,  F02M2200/8069 ,  F02M2200/9092 ,  Y10T29/49405 ,  Y10T29/4998 ,  Y10T428/24273

    摘要： Nozzle and a method of making the same are disclosed. The method includes (a) providing a microstructured mold pattern defining at least a portion of a mold and comprising a plurality of replica nozzle holes and replica planar control cavities; (b) molding a first material into a nozzle forming microstructured pattern using the microstructured mold pattern, with the nozzle forming microstructured pattern comprising a plurality of nozzle hole forming features and planar control cavity forming features; (c) forming a second material into a nozzle pre-form using the nozzle forming microstructured pattern, with the nozzle pre-form comprising a plurality of nozzle pre-form holes and sacrificial planar control cavities; and (d) forming a nozzle from the nozzle pre-form, said forming the nozzle comprising removing enough of the second material to remove the sacrificial planar control cavities so as to form a top surface of the nozzle pre-form into a planar top surface of the nozzle, and to form each of the nozzle pre-form holes into a nozzle through hole.

    摘要翻译： 公开了喷嘴及其制造方法。 该方法包括（a）提供限定模具的至少一部分并且包括多个复制喷嘴孔和复制平面控制腔的微结构模具图案; （b）使用微结构化模具将第一材料模制成形成微结构图案的喷嘴，喷嘴形成微结构图案包括多个喷嘴孔形成特征和平面控制腔形成特征; （c）使用所述喷嘴形成微结构图案将喷嘴预成型形成第二材料，所述喷嘴预成型件包括多个喷嘴预成型孔和牺牲平面控制腔; 并且（d）从喷嘴预成型件形成喷嘴，所述形成喷嘴包括去除足够的第二材料以去除牺牲平面控制腔，以便将喷嘴预成型件的顶表面形成为平面顶表面 并且将每个喷嘴预成形孔形成为喷嘴通孔。

    Process for making microlens arrays and masterforms
    8.
    发明授权
    Process for making microlens arrays and masterforms 有权
    制备微透镜阵列和原型的方法

    公开(公告)号：US07583444B1

    公开(公告)日：2009-09-01

    申请号：US11313482

    申请日：2005-12-21

    申请人： Robert J. DeVoe ,  Dora M. Paolucci ,  Craig R. Sykora ,  Todd A. Ballen ,  Douglas S. Dunn ,  Jeffrey M. Florczak ,  Catherine A. Leatherdale

    发明人： Robert J. DeVoe ,  Dora M. Paolucci ,  Craig R. Sykora ,  Todd A. Ballen ,  Douglas S. Dunn ,  Jeffrey M. Florczak ,  Catherine A. Leatherdale

    IPC分类号： G02B27/18

    CPC分类号： G02B3/0031 ,  B29D11/00153 ,  B29D11/00365 ,  G02B3/04

    摘要： A process for making a microlens array or a microlens array masterform comprises (a) providing a photoreactive composition, the photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) at least one multiphoton photoinitiator system; and (b) imagewise exposing at least a portion of the composition to light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light, the imagewise exposing being carried out in a pattern that is effective to define at least the surface of a plurality of microlenses, each of the microlenses having a principal axis and a focal length, and at least one of the microlenses being an aspherical microlens.

    摘要翻译： 制备微透镜阵列或微透镜阵列原型的方法包括（a）提供光反应性组合物，所述光反应性组合物包含（1）能够经历酸或自由基引发的化学反应的至少一种反应性物质，和 2）至少一种多光子光引发剂体系; 和（b）将组合物的至少一部分成像曝光至足以引起同时吸收至少两个光子的光，从而诱导至少一种酸或自由基引发的化学反应，其中组合物暴露于光，成像 曝光以有效地限定多个微透镜的表面的图案进行，每个微透镜具有主轴和焦距，并且至少一个微透镜是非球面微透镜。

    Multipass multiphoton absorption method and apparatus
    9.
    发明授权
    Multipass multiphoton absorption method and apparatus 有权
    多光子多光子吸收法和装置

    公开(公告)号：US07166409B2

    公开(公告)日：2007-01-23

    申请号：US10297968

    申请日：2001-06-14

    申请人： Patrick R. Fleming ,  Robert J. DeVoe ,  Catherine A. Leatherdale ,  Todd A. Ballen ,  Jeffrey M. Florczak

    发明人： Patrick R. Fleming ,  Robert J. DeVoe ,  Catherine A. Leatherdale ,  Todd A. Ballen ,  Jeffrey M. Florczak

    IPC分类号： G03F7/038

    CPC分类号： G03F7/038 ,  B33Y30/00 ,  G03F7/2053

    摘要： A method of increasing the efficiency of a multiphoton absorption process and apparatus. The method includes: providing a photoreactive composition; providing a source of sufficient light for simultaneous absorption of at least two photons; exposing the photoreactive composition to at least one transit of light from the light source; and directing at least a portion of the first transit of the light back into the photoreactive composition using at least one optical element, wherein a plurality of photons not absorbed in at least one transit are used to expose the photoreactive composition in a subsequent transit.

    摘要翻译： 提高多光子吸收过程和设备效率的方法。 该方法包括：提供光反应性组合物; 提供足够的光源以同时吸收至少两个光子; 将光反应性组合物暴露于来自光源的光的至少一个转运; 以及使用至少一个光学元件将所述光的第一转运的至少一部分引导回到所述光反应性组合物中，其中使用在至少一个转运中未被吸收的多个光子在随后的转运中暴露所述光反应性组合物。