公开(公告)号：US5851413A

公开(公告)日：1998-12-22

申请号：US667966

申请日：1996-06-19

Applicant: Robert A. Casella ,  Charles J. Libby ,  Gary P. Rathmell

Inventor： Robert A. Casella ,  Charles J. Libby ,  Gary P. Rathmell

IPC: H01J37/30 ,  H01J37/305 ,  H01J37/317 ,  H01L21/302 ,  C03C25/06

CPC classification number: H01J37/3178 ,  H01J37/3002 ,  H01J37/3056 ,  H01J2237/006 ,  H01J2237/31744

Abstract: Apparatus and method of an improved gas delivery system for delivering reactant material to a workpiece, such as a substrate, being operated on by a particle beam employs a shroud-type concentrator having an interior axial passage. Fluid reactant material is supplied to the axial passage for delivery to the workpiece. A particle beam can traverse the axial passage for impingement on the workpiece surface, concurrently if desired with the reactant delivery.

Abstract translation: 用于将反应物材料输送到由颗粒束操作的工件（例如基底）的改进的气体输送系统的装置和方法采用具有内部轴向通道的护罩型浓缩器。 将流体反应物材料供应到轴向通道以输送到工件。 粒子束可以横穿轴向通道以冲击在工件表面上，同时如果需要，反应物输送。

公开(公告)号：US4976843A

公开(公告)日：1990-12-11

申请号：US474348

申请日：1990-02-02

Applicant: Billy W. Ward ,  David Edwards, Jr. ,  Robert A. Casella

Inventor： Billy W. Ward ,  David Edwards, Jr. ,  Robert A. Casella

IPC: B23K15/06 ,  H01J37/02 ,  H01J37/09

CPC classification number: B23K15/06 ,  H01J37/026 ,  H01J37/09 ,  H01J2237/31749

Abstract: An apparatus is described for allowing an ion beam and an electron beam to travel toward a predetermined region of a substrate surface during the sputter etching and imaging of insulating and other targets while preventing deflection of the electron beam by sources of stray electrostatic fields on the substrate surface. A metal shield is provided having a funnel-shaped portion leading to an orifice. The incident finely focused ion beam, together with the electron beam, which is used to neutralize the charge created by the incident ion beam, pass to the target through the orifice. The shield also physically supports a gas injection needle that injects a gas through the orifice toward the predetermined region.

Abstract translation: 描述了一种装置，用于在溅射蚀刻和绝缘和其它目标的成像期间允许离子束和电子束朝向衬底表面的预定区域行进，同时防止电子束由衬底上的杂散静电场的源偏转 表面。 设置有通向孔的漏斗形部分的金属屏蔽。 与用于中和由入射离子束产生的电荷的电子束一起入射的精细聚焦离子束通过孔传递到靶。 护罩还物理地支撑气体注射针，其将气体通过孔朝向预定区域注入。