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公开(公告)号：US07978306B2
公开(公告)日：2011-07-12
申请号：US12216441
申请日：2008-07-03
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。
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公开(公告)号：US07106416B2
公开(公告)日：2006-09-12
申请号：US10731428
申请日：2003-12-10
CPC分类号： G03F7/70875
摘要： A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus further having a chuck for supporting an object and a frame which supports the chuck with respect to other parts of the lithographic apparatus. The chuck is thermally isolated from at least the frame.
摘要翻译： 一种光刻设备，包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 该装置还具有用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻设备还具有用于支撑物体的卡盘和相对于光刻设备的其它部分支撑卡盘的框架。 卡盘至少与框架隔离。
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3.发明授权Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate 有权光刻设备，器件制造方法以及将图案应用于衬底的方法公开(公告)号：US08570487B2
公开(公告)日：2013-10-29
申请号：US13207123
申请日：2011-08-10
CPC分类号： G02B27/40 , G03F9/7049
摘要： A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, in which a measuring subsystem includes one or (preferably) more alignment & level sensors (AS, LS) directed at the substrate near a patterning location of a patterning subsystem. The alignment sensor(s) is operable to recognize and measure alignment marks (P1) on the substrate passing by the sensor during relative motion of the substrate and patterning subsystem under control of the positioning subsystem. A processor combines measurements of relative locations of a plurality of said marks to provide measurement results with an accuracy sufficient for the positioning subsystem to position at least a first substrate portion at said patterning location relative to said alignment marks. A preliminary step obtains position relative to a known pattern (M1) on the patterning device. Measurements are taken and updated in real time during exposure of successive substrate portions.
摘要翻译： 光刻设备被布置成将图案从图案形成装置转移到基板上，其中测量子系统包括在图案化子系统的图案化位置附近指向基板的一个或（优选地）更多的对准和电平传感器（AS，LS） 。 对准传感器可操作以在基板和构图子系统在定位子系统的控制下的相对运动期间识别和测量在传感器上通过的基板上的对准标记（P1）。 处理器结合了多个所述标记的相对位置的测量结果，以提供具有足够的精度的测量结果，该精度足以使定位子系统相对于所述对准标记在所述图案化位置处至少定位第一衬底部分。 预备步骤相对于图案形成装置上的已知图案（M1）获得位置。 在连续的衬底部分的曝光期间实时地进行测量和更新。
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4.发明申请SUPPORT OR TABLE FOR LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING SUCH SUPPORT OR TABLE AND LITHOGRAPHIC APPARATUS COMPRISING SUCH SUPPORT OR TABLE 审中-公开平面设备的支持或表，制造此类支持的方法或包含该支持或表的表和平面设备公开(公告)号：US20110069298A1
公开(公告)日：2011-03-24
申请号：US12886965
申请日：2010-09-21
IPC分类号： G03B27/58
CPC分类号： G03F7/70716 , G03F7/7095
摘要： A substrate table or a patterning device support includes an aerogel. The aerogel may be very light weight, for example the aerogel may have a density between 0.5 and 500 mg/cm3, preferably between 1 and 100 mg/cm3 and most preferably between 1 and 10 mg/cm3. The aerogel may be made from a silica gel. The aerogel made from silica gel may have a density of 1.9 mg/cm3 and if the air out of the aerogel is evacuated even 1 mg/cm3.
摘要翻译： 衬底台或图案形成装置支架包括气凝胶。 气凝胶可以非常轻的重量，例如气凝胶的密度可以在0.5-500mg / cm3之间，优选在1-10mg / cm3之间，最优选在1-10mg / cm3之间。 气凝胶可以由硅胶制成。 由硅胶制成的气凝胶的密度可以为1.9mg / cm 3，如果气凝胶中的空气甚至排出1mg / cm3。
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公开(公告)号：US20090296056A1
公开(公告)日：2009-12-03
申请号：US12476089
申请日：2009-06-01
申请人： Eva Mondt , Noud Jan Gilissen , Hernes Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen
发明人： Eva Mondt , Noud Jan Gilissen , Hernes Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707
摘要： A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
摘要翻译： 公开了一种表格，其中采取措施来将工作台和使用中的物体的边缘密封在桌子上。 特别地，在桌子上的物体和桌子本身之间形成毛细管通道。 在毛细管通道的径向向内的弯液面钉扎特征和/或超压存在使通道中的液体保持在通道中并有助于防止其进一步向内径向前进。 执行该功能的特征可以与围绕对象的构件相关联或形成在其中。 该构件可以与桌子的一部分热分离。
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公开(公告)号：US07492440B2
公开(公告)日：2009-02-17
申请号：US10936712
申请日：2004-09-09
申请人： Koen Jacobus Johannes Maria Zaal , Edwin Johan Buis , Henrikus Herman Marie Cox , Noud Jan Gilissen , Harmen Klaas Van Der Schoot
发明人： Koen Jacobus Johannes Maria Zaal , Edwin Johan Buis , Henrikus Herman Marie Cox , Noud Jan Gilissen , Harmen Klaas Van Der Schoot
CPC分类号： G03F7/70716 , G03F7/709
摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.
摘要翻译： 在光刻设备中使用的基板或图案形成装置以及光刻装置的制造方法。 衬底和图案形成装置相对于图案化束对准并且由支撑件可移动地支撑。 然而，所述支撑件中的共振可能使制造的装置不可用和/或可能使控制系统复杂化。 因此，具有耦合到支撑件的柔性耦合装置的致动器组件框架设置有多个致动器，其构造成以多个自由度移动支撑件。 因此，谐振被柔性耦合装置阻尼，导致用于控制系统的较大带宽，从而使得支撑件具有更好的位置精度。
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公开(公告)号：US20080278697A1
公开(公告)日：2008-11-13
申请号：US12216441
申请日：2008-07-03
IPC分类号： G03B27/52
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。
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公开(公告)号：US07119884B2
公开(公告)日：2006-10-10
申请号：US10744088
申请日：2003-12-24
CPC分类号： G03F7/70783
摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to impart the beam with a pattern in its cross-section. The lithographic apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus has a chuck system for supporting an object, such as the substrate or the patterning device, in the lithographic apparatus. The chuck system includes a chuck for supporting the object, a frame for supporting the chuck, and a chuck support structure for supporting the chuck relative to the frame. The chuck support structure includes at least one flexure element, which flexure element is flexible in at least one degree of freedom and is coupled to the chuck and the frame.
摘要翻译： 光刻设备包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于在其横截面中赋予光束图案。 光刻设备包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 该装置具有用于在光刻设备中支撑诸如基板或图案形成装置的物体的卡盘系统。 卡盘系统包括用于支撑物体的卡盘，用于支撑卡盘的框架和用于相对于框架支撑卡盘的卡盘支撑结构。 卡盘支撑结构包括至少一个挠曲元件，该挠曲元件在至少一个自由度上是柔性的并且联接到卡盘和框架。
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公开(公告)号：US06956222B2
公开(公告)日：2005-10-18
申请号：US10743276
申请日：2003-12-23
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , A61N5/00
CPC分类号： G03F7/707
摘要： A lithographic projection apparatus includes a radiation system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to pattern the beam according to a desired pattern. The lithographic projection apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one holding structure includes at least one compliant member holding a pimple plate for holding a removable item for the apparatus.
摘要翻译： 光刻投影装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对束进行图案化。 光刻投影装置包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 至少一个保持结构包括至少一个柔性构件，其保持用于保持装置的可拆卸物品的丘疹板。
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公开(公告)号：US09366973B2
公开(公告)日：2016-06-14
申请号：US13983203
申请日：2011-12-20
IPC分类号： G03F7/20 , H01H13/83 , H01H13/704 , H01H13/7065 , H01H3/12 , H01H13/86
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70733 , H01H3/125 , H01H13/704 , H01H13/7065 , H01H13/83 , H01H13/86 , H01H2219/036 , H01H2219/064 , H01H2221/03 , H01H2223/036 , H01H2227/028 , H01L21/6831 , H01L21/6833 , H01L21/6875 , Y10T29/49826
摘要： A substrate support is provided for a lithographic apparatus. The support comprises a substrate table constructed to hold a substrate and a chuck for the substrate table. In operation, the substrate table is supported by the chuck and clamped thereto. The substrate support comprises a first set of burls on a surface of the support block for abutting against the substrate table during the clamping and a second set of burls on a surface of the substrate table for abutting against the support block during the clamping.
摘要翻译： 为光刻设备提供衬底支撑件。 支撑件包括被构造成保持衬底和用于衬底台的卡盘的衬底台。 在操作中，基板台被卡盘支撑并夹紧。 衬底支撑件包括在支撑块的表面上的第一组毛刺，用于在夹紧过程中抵靠衬底台，并且在衬底台的表面上具有第二组毛刺，用于在夹紧期间抵靠支撑块。
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