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公开(公告)号：US20100203447A1
公开(公告)日：2010-08-12
申请号：US12701592
申请日：2010-02-07
CPC分类号： C08F220/12 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
摘要翻译： 辐射敏感性树脂组合物包括（A）通过酸的作用变成碱溶性的酸不稳定基团的树脂，（B）辐射敏感性酸产生剂和（C）溶剂。 树脂（A）包括由式（1）和（2）表示的重复单元，其中R 1和R 2表示氢原子或取代或未取代的具有1至4个碳原子的烷基，R 3表示取代或未取代的烷基， 1至4个碳原子，X表示氢原子，羟基或酰基，m表示1至18的整数，n表示4至8的整数。
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公开(公告)号：US20110143279A1
公开(公告)日：2011-06-16
申请号：US13005539
申请日：2011-01-13
申请人： Tsutomu SHIMOKAWA , Takuma Ebata , Kaori Sakai , Yoshifumi Oizumi , Akimasa Soyano , Noboru Otsuka
发明人： Tsutomu SHIMOKAWA , Takuma Ebata , Kaori Sakai , Yoshifumi Oizumi , Akimasa Soyano , Noboru Otsuka
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： A radiation-sensitive resin composition includes a sulfonate or sulfonic acid group-containing photoacid generator and a resin. The sulfonate or sulfonic acid group-containing photoacid generator includes a partial structure shown by a following formula (1), wherein R1 represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted cyclic or partially cyclic monovalent hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted cyclic monovalent organic group having 4 to 30 carbon atoms that include a hetero atom.
摘要翻译： 辐射敏感性树脂组合物包含含磺酸酯基或含磺酸基的光酸产生剂和树脂。 含有磺酸基或含磺酸基的光酸产生剂包括由下式（1）表示的部分结构，其中R 1表示取代或未取代的具有1至30个碳原子的直链或支链一价烃基，取代或未取代的环状或部分 具有3〜30个碳原子的环状一价烃基，取代或未取代的碳原子数为6〜30的芳基，或取代或未取代的包含杂原子的碳原子数为4〜30的环状一价有机基团。
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公开(公告)号：US20120065291A1
公开(公告)日：2012-03-15
申请号：US13272523
申请日：2011-10-13
申请人： Nobuji Matsumura , Yukio Nishimura , Akimasa Soyano , Ryuichi Serizawa , Noboru Otsuka , Hiroshi Tomioka
发明人： Nobuji Matsumura , Yukio Nishimura , Akimasa Soyano , Ryuichi Serizawa , Noboru Otsuka , Hiroshi Tomioka
CPC分类号： G03F7/0045 , C08F220/36 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , C08F2220/382 , C08F2220/283
摘要： A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.
摘要翻译： 辐射敏感性树脂组合物包括含有由下式（I）表示的重复单元的第一聚合物。 X +是阳离子。 式（I）中的X +优选为由下式（1-1）表示的鎓阳离子，由下式（1-2）表示的鎓阳离子或其组合。
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公开(公告)号：US20100068647A1
公开(公告)日：2010-03-18
申请号：US12557529
申请日：2009-09-11
申请人： Noboru Otsuka , Takanori Kawakami
发明人： Noboru Otsuka , Takanori Kawakami
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.
摘要翻译： 辐射敏感性树脂组合物包含含酸解离基团的树脂，辐射敏感性酸产生剂和溶剂。 含酸解离基的树脂包括含有重复单元的共聚物。 修饰单元包括含量大于共聚物中重复单元总量的约55摩尔％的酸解离基团的重复单元。 含酸解离基的树脂中的共聚物的含量为含酸解离基的树脂的总量的约90质量％以上。
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公开(公告)号：US08802348B2
公开(公告)日：2014-08-12
申请号：US12701592
申请日：2010-02-07
CPC分类号： C08F220/12 , G03F7/0397 , G03F7/2041
摘要： A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
摘要翻译： 辐射敏感性树脂组合物包括（A）通过酸的作用变成碱溶性的酸不稳定基团的树脂，（B）辐射敏感性酸产生剂和（C）溶剂。 树脂（A）包括由式（1）和（2）表示的重复单元，其中R 1和R 2表示氢原子或取代或未取代的具有1至4个碳原子的烷基，R 3表示取代或未取代的烷基， 1至4个碳原子，X表示氢原子，羟基或酰基，m表示1至18的整数，n表示4至8的整数。
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公开(公告)号：US08507575B2
公开(公告)日：2013-08-13
申请号：US13272523
申请日：2011-10-13
申请人： Nobuji Matsumura , Yukio Nishimura , Akimasa Soyano , Ryuichi Serizawa , Noboru Otsuka , Hiroshi Tomioka
发明人： Nobuji Matsumura , Yukio Nishimura , Akimasa Soyano , Ryuichi Serizawa , Noboru Otsuka , Hiroshi Tomioka
CPC分类号： G03F7/0045 , C08F220/36 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , C08F2220/382 , C08F2220/283
摘要： A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.
摘要翻译： 辐射敏感性树脂组合物包括含有由下式（I）表示的重复单元的第一聚合物。 X +是阳离子。 式（I）中的X +优选为由下式（1-1）表示的鎓阳离子，由下式（1-2）表示的鎓阳离子或其组合。
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公开(公告)号：US08084188B2
公开(公告)日：2011-12-27
申请号：US12557529
申请日：2009-09-11
申请人： Noboru Otsuka , Takanori Kawakami
发明人： Noboru Otsuka , Takanori Kawakami
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin.
摘要翻译： 辐射敏感性树脂组合物包括含酸解离基团的树脂，辐射敏感性酸产生剂和溶剂。 含酸解离基的树脂包括含有重复单元的共聚物。 修饰单元包括含量大于共聚物中重复单元总量的约55摩尔％的酸解离基团的重复单元。 含酸解离基的树脂中的共聚物的含量为含酸解离基的树脂的总量的约90质量％以上。
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公开(公告)号：US4656135A
公开(公告)日：1987-04-07
申请号：US750289
申请日：1985-07-01
申请人： Takayasu Tsuchida , Noboru Otsuka , Hiroshi Sonoda
发明人： Takayasu Tsuchida , Noboru Otsuka , Hiroshi Sonoda
IPC分类号： C12P13/06
CPC分类号： C12P13/06 , Y10S435/84
摘要： A process for producing L-isoleucine, which comprises culturing a microorganism belonging to the genus Brevibacterium or the genus Corynebacterium which has a methyllysine resistance or .alpha.-ketomalonic acid resistance and which is capable of producing L-isoleucine in a liquid medium, and obtaining the accumulated L-isoleucine from said medium.
摘要翻译： 一种L-异亮氨酸的制造方法，其特征在于，在液体培养基中培养属于短杆菌属或棒状杆菌属的微生物，所述微生物具有甲基赖氨酸抗性或α-酮酸耐性，并且能够在液体培养基中产生L-异亮氨酸， 从所述介质累积L-异亮氨酸。
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