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1.发明授权Source-collector module with GIC mirror and xenon liquid EUV LPP target system 有权源收集器模块采用GIC镜和氙液EUV LPP目标系统公开(公告)号：US08258485B2
公开(公告)日：2012-09-04
申请号：US12807165
申请日：2010-08-30
IPC分类号： H01J37/20
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G21K2201/06 , G21K2201/064 , G21K2201/065 , G21K2201/067 , H05G2/003 , H05G2/006 , H05G2/008
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Xenon liquid in the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device having at least one funnel element may be used to increase the amount of EUV radiation provided to the intermediate focus and/or directed to a downstream illuminator. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译： 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部分和目标部分的LPP靶系统形成LPP，其中来自光源部分的脉冲激光束照射目标部分中的氙液体。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 具有至少一个漏斗元件的辐射收集增强装置可以用于增加提供给中间焦点和/或被引导到下游照明器的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。
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公开(公告)号：US06770862B1
公开(公告)日：2004-08-03
申请号：US10628627
申请日：2003-07-28
申请人： Dragos Maciuca , Natale M. Ceglio
发明人： Dragos Maciuca , Natale M. Ceglio
IPC分类号： H01L2700
CPC分类号： G01N21/956 , G01N21/9501
摘要： An imaging system for detecting defects on a substrate. Sensor module ports are disposed on an imaging platform. Sensor modules are removably connected to the sensor module ports, and are adapted to sense swaths on the surface of the substrate. Each of the sensor modules includes a time domain integration sensor, optics, an analog controller, and a digital controller. The time domain integration sensor optically senses the swath. The optics focus light from the swath on the time domain integration sensor. The analog controller receives signals from the time domain integration sensor and provides data signals. The digital controller receives the data signals, integrates the data signals into an image of the swath, and provides the image as digital signals to the sensor module port. A master controller receives the digital signals, composites them into a single image of a desired portion of the surface of the substrate, and detects defects within the image. A stage moves the substrate under the sensor modules under the control of the master controller, until the desired portion of the surface of the substrate has been imaged.
摘要翻译： 一种用于检测衬底上的缺陷的成像系统。 传感器模块端口设置在成像平台上。 传感器模块可拆卸地连接到传感器模块端口，并且适于感测衬底表面上的条纹。 每个传感器模块包括时域积分传感器，光学器件，模拟控制器和数字控制器。 时域积分传感器光学感测条纹。 光学器件将来自条纹的光线聚焦在时域集成传感器上。 模拟控制器从时域积分传感器接收信号并提供数据信号。 数字控制器接收数据信号，将数据信号整合成幅的图像，并将图像作为数字信号提供给传感器模块端口。 主控制器接收数字信号，将它们复合到衬底表面的所需部分的单个图像中，并且检测图像内的缺陷。 在主控制器的控制下，台架将传感器模块下方的基板移动，直到基片表面的所需部分成像。
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公开(公告)号：US5071207A
公开(公告)日：1991-12-10
申请号：US587699
申请日：1990-09-25
IPC分类号： G02B5/18
CPC分类号： G02B5/1876 , G02B5/188
摘要： A broadband diffractive lens or imaging element produces a sharp focus and/or a high resolution image with broad bandwidth illuminating radiation. The diffractive lens is sectored or segmented into regions, each of which focuses or images a distinct narrowband of radiation but all of which have a common focal length. Alternatively, a serial stack of minus filters, each with a diffraction pattern which focuses or images a distinct narrowband of radiation but all of which have a common focal length, is used. The two approaches can be combined. Multifocal broadband diffractive elements can also be formed.
摘要翻译： 宽带衍射透镜或成像元件产生具有宽带宽照明辐射的清晰焦点和/或高分辨率图像。 衍射透镜被分割或分割成各个区域，每个区域聚焦或成像不同的辐射窄带，但都具有共同的焦距。 或者，使用负滤波器的串联堆叠，每个具有聚焦或图像不同的辐射窄带的衍射图案，但都具有共同的焦距。 这两种方法可以组合。 也可以形成多焦点宽带衍射元件。
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公开(公告)号：US08330131B2
公开(公告)日：2012-12-11
申请号：US12803075
申请日：2010-06-18
CPC分类号： G03F7/70941 , B82Y10/00 , G02B5/0891 , G02B5/10 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G21K2201/061 , H05G2/005
摘要： A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
摘要翻译： 一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和 输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。
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公开(公告)号：US6002553A
公开(公告)日：1999-12-14
申请号：US202991
申请日：1994-02-28
CPC分类号： B82Y25/00 , B82Y10/00 , G01R33/093 , G11B5/3903 , H01F10/325 , H01F10/3281 , G11B2005/3996 , G11B5/09
摘要： A magnetoresistive sensor element with a three-dimensional micro-architecture is capable of significantly improved sensitivity and highly localized measurement of magnetic fields. The sensor is formed of a multilayer film of alternately magnetic and nonmagnetic materials. The sensor is optimally operated in a current perpendicular to plane mode. The sensor is useful in magnetic read/write heads, for high density magnetic information storage and retrieval.
摘要翻译： 具有三维微架构的磁阻传感器元件能够显着改善磁场的灵敏度和高度局部化的测量。 传感器由交替磁性和非磁性材料的多层膜形成。 传感器在垂直于平面模式的电流中最佳运行。 该传感器可用于磁读/写磁头，用于高密度磁信息存储和检索。
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公开(公告)号：US5257132A
公开(公告)日：1993-10-26
申请号：US683592
申请日：1991-04-09
IPC分类号： G02B5/18
CPC分类号： G02B5/1876 , G02B5/188
摘要： A broadband diffractive lens or imaging element produces a sharp focus and/or a high resolution image with broad bandwidth illuminating radiation. The diffractive lens is sectored or segmented into regions, each of which focuses or images a distinct narrowband of radiation but all of which have a common focal length. Alternatively, a serial stack of minus filters, each with a diffraction pattern which focuses or images a distinct narrowband of radiation but all of which have a common focal length, is used. The two approaches can be combined. Multifocal broadband diffractive elements can also be formed. Thin film embodiments are described.
摘要翻译： 宽带衍射透镜或成像元件产生具有宽带宽照明辐射的清晰焦点和/或高分辨率图像。 衍射透镜被分割或分割成各个区域，每个区域聚焦或成像不同的辐射窄带，但都具有共同的焦距。 或者，使用负滤波器的串联堆叠，每个具有聚焦或图像不同的辐射窄带的衍射图案，但都具有共同的焦距。 这两种方法可以组合。 也可以形成多焦点宽带衍射元件。 描述薄膜实施例。
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公开(公告)号：US09057962B2
公开(公告)日：2015-06-16
申请号：US13691804
申请日：2012-12-02
CPC分类号： G03F7/70033 , G03F7/2004 , G21K1/067 , G21K2201/064
摘要： A source-collector module for an extreme ultraviolet (EUV) lithography system, the module including a laser-produced plasma (LPP) that generates EUV radiation and a grazing-incidence collector (GIC) mirror arranged relative thereto and having an input end and an output end. The LPP is formed using an LPP target system wherein a pulsed laser beam travels on-axis through the GIC and is incident upon solid, moveable LPP target. The GIC mirror is arranged relative to the LPP to receive the EUV radiation therefrom at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. An example GIC mirror design is presented that includes a polynomial surface-figure correction to compensate for GIC shell thickness effects, thereby improve far-field imaging performance.
摘要翻译： 一种用于极紫外（EUV）光刻系统的源极收集器模块，该模块包括产生EUV辐射的激光产生等离子体（LPP）和相对于其放置的放射入射收集器（GIC）反射镜，并且具有输入端和 输出端。 LPP使用LPP目标系统形成，其中脉冲激光束在轴上行进通过GIC并入射到固体，可移动的LPP靶上。 GIC反射镜相对于LPP布置，以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 提出了一个示例GIC镜面设计，其中包括一个多项式曲面图校正，以补偿GIC外壳厚度效应，从而提高远场成像性能。
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8.发明授权公开(公告)号：US08686381B2
公开(公告)日：2014-04-01
申请号：US12803461
申请日：2010-06-28
IPC分类号： H05G2/00
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G03F7/70175 , H05G2/005
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译： 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束从目标部的Sn蒸气源照射Sn蒸气。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 可以使用辐射收集增强装置来增加提供给中间聚焦的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。
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公开(公告)号：US08587768B2
公开(公告)日：2013-11-19
申请号：US13065008
申请日：2011-03-11
申请人： Natale M. Ceglio , Gopal Vasudevan
发明人： Natale M. Ceglio , Gopal Vasudevan
CPC分类号： G03F7/70008 , G02B5/0891 , G02B5/10 , G02B5/208 , G02B27/0927 , G02B27/0983 , G03F7/70033 , G03F7/70166 , G03F7/70175
摘要： A collector system for extreme ultraviolet (EUV) radiation includes a collector mirror and a radiation-collection enhancement device (RCED) arranged adjacent an aperture member of an illuminator. The collector mirror directs EUV radiation from an EUV radiation source towards the aperture member. The RCED redirects a portion of the EUV radiation that would not otherwise pass through the aperture of the aperture member or that would not have an optimum angular distribution, to pass through the aperture and to have an improved angular distribution better suited to input specifications of an illuminator. This provides the illuminator with greater amount of useable EUV radiation than would otherwise be available from the collector mirror alone, thereby enhancing the performing of an EUV lithography system that uses such a collector system with a RCED.
摘要翻译： 用于极紫外（EUV）辐射的收集器系统包括与照明器的孔径构件相邻布置的收集器反射镜和辐射收集增强装置（RCED）。 收集器镜将EUV辐射源的EUV辐射引导到孔径构件。 RCED将EUV辐射的一部分重新定向，否则这些辐射将不会通过孔径构件的孔径或不具有最佳角度分布，以通过孔径并且具有更好地适于输入规格的角度分布 照明器 这为照明器提供了比单独从收集器镜可能获得的更大量的可用的EUV辐射，从而增强了使用具有RCED的这种收集器系统的EUV光刻系统的执行。
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10.发明申请公开(公告)号：US20110318694A1
公开(公告)日：2011-12-29
申请号：US12803461
申请日：2010-06-28
CPC分类号： G21K1/067 , G03F7/70033 , G03F7/70166 , G03F7/70175 , H05G2/005
摘要： A source-collector module (SOCOMO) for generating a laser-produced plasma (LPP) that emits EUV radiation, and a grazing-incidence collector (GIC) mirror arranged relative to the LPP and having an input end and an output end. The LPP is formed using an LPP target system having a light source portion and a target portion, wherein a pulsed laser beam from the light source portion irradiates Sn vapor from a Sn vapor source of the target portion. The GIC mirror is arranged relative to the LPP to receive the EUV radiation at its input end and focus the received EUV radiation at an intermediate focus adjacent the output end. A radiation collection enhancement device may be used to increase the amount of EUV radiation provided to the intermediate focus. An EUV lithography system that utilizes the SOCOMO is also disclosed.
摘要翻译： 用于产生发射EUV辐射的激光产生等离子体（LPP）的源极集电极模块（SOCOMO）以及相对于LPP布置并具有输入端和输出端的掠入射收集器（GIC）反射镜。 使用具有光源部和目标部的LPP靶系统形成LPP，其中来自光源部的脉冲激光束从目标部的Sn蒸气源照射Sn蒸气。 GIC反射镜相对于LPP布置以在其输入端接收EUV辐射，并将接收的EUV辐射聚焦在邻近输出端的中间焦点。 可以使用辐射收集增强装置来增加提供给中间聚焦的EUV辐射的量。 还公开了利用SOCOMO的EUV光刻系统。
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