METHOD OF MANUFACTURING DISPERSION TYPE INORGANIC ELECTROLUMINESCENCE DEVICE AND DISPERSION TYPE INORGANIC ELECTROLUMINESCENCE DEVICE
    1.
    发明申请
    METHOD OF MANUFACTURING DISPERSION TYPE INORGANIC ELECTROLUMINESCENCE DEVICE AND DISPERSION TYPE INORGANIC ELECTROLUMINESCENCE DEVICE 审中-公开
    分散型无机电致发光器件和分散型无机电致发光器件的制造方法

    公开(公告)号:US20090110908A1

    公开(公告)日:2009-04-30

    申请号:US12114478

    申请日:2008-05-02

    IPC分类号: H05B33/14 B32B5/16 B05D5/12

    摘要: A method of manufacturing a dispersion type inorganic electroluminescence device and a dispersion type inorganic electroluminescence device including a light-emitting layer and a dielectric layer, which are integrated, are disclosed. The method is directed to the manufacture of a dispersion type inorganic electroluminescence device, in which phosphor particles are coated with a metal oxide precursor using ultrasonic waves, after which the phosphor particles coated with the metal oxide precursor are disposed between a transparent electrode and an upper electrode, forming a light-emitting layer and a dielectric layer, which are integrated. The dispersion type inorganic electroluminescence device includes a plurality of phosphor particles coated with a metal oxide precursor, disposed between a transparent electrode and an upper electrode, thereby providing a light-emitting layer and a dielectric layer, which are integrated.

    摘要翻译: 公开了一种制造分散型无机电致发光器件的方法和包括发光层和电介质层的分散型无机电致发光器件。 该方法涉及一种分散型无机电致发光器件的制造,其中使用超声波将荧光体颗粒涂覆在金属氧化物前体上,之后将涂覆有金属氧化物前体的荧光体颗粒设置在透明电极和上部 电极,形成发光层和电介质层。 分散型无机电致发光元件包括多个配置在透明电极和上部电极之间的金属氧化物前体的荧光体粒子,由此提供一体化的发光层和电介质层。

    METHODS OF REDUCING A REGISTRATION ERROR OF A PHOTOMASK, AND RELATED PHOTOMASKS AND METHODS OF MANUFACTURING AN INTEGRATED CIRCUIT
    2.
    发明申请
    METHODS OF REDUCING A REGISTRATION ERROR OF A PHOTOMASK, AND RELATED PHOTOMASKS AND METHODS OF MANUFACTURING AN INTEGRATED CIRCUIT 有权
    降低光电二极管的注册错误的方法,以及相关的光电子元件和制造集成电路的方法

    公开(公告)号:US20140363633A1

    公开(公告)日:2014-12-11

    申请号:US14176565

    申请日:2014-02-10

    IPC分类号: G03F1/72 H05K3/00 G03F1/74

    摘要: Methods of reducing a registration error of a photomask are provided. A method of reducing a registration error of a photomask may include identifying the registration error with respect to a pattern element in a pattern region of the photomask. Moreover, the method may include reducing a thickness of a portion of a non-pattern region of the photomask by irradiating an energy beam onto a location of the non-pattern region of the photomask that is spaced apart from the pattern element, to generate stress at the pattern element. Related photomasks and methods of manufacturing an integrated circuit are also provided.

    摘要翻译: 提供降低光掩模的配准误差的方法。 降低光掩模的配准误差的方法可以包括识别相对于光掩模的图案区域中的图案元素的配准误差。 此外,该方法可以包括通过将能量束照射到与图案元件间隔开的光掩模的非图案区域的位置上来减小光掩模的非图案区域的一部分的厚度,以产生应力 在图案元素。 还提供了相关的光掩模和制造集成电路的方法。

    Methods of reducing a registration error of a photomask, and related photomasks and methods of manufacturing an integrated circuit
    5.
    发明授权
    Methods of reducing a registration error of a photomask, and related photomasks and methods of manufacturing an integrated circuit 有权
    降低光掩模的配准误差的方法以及相关的光掩模和制造集成电路的方法

    公开(公告)号:US09176375B2

    公开(公告)日:2015-11-03

    申请号:US14176565

    申请日:2014-02-10

    IPC分类号: G03F1/72 G03F1/74

    摘要: Methods of reducing a registration error of a photomask are provided. A method of reducing a registration error of a photomask may include identifying the registration error with respect to a pattern element in a pattern region of the photomask. Moreover, the method may include reducing a thickness of a portion of a non-pattern region of the photomask by irradiating an energy beam onto a location of the non-pattern region of the photomask that is spaced apart from the pattern element, to generate stress at the pattern element. Related photomasks and methods of manufacturing an integrated circuit are also provided.

    摘要翻译: 提供降低光掩模的配准误差的方法。 降低光掩模的配准误差的方法可以包括识别相对于光掩模的图案区域中的图案元素的配准误差。 此外,该方法可以包括通过将能量束照射到与图案元件间隔开的光掩模的非图案区域的位置上来减小光掩模的非图案区域的一部分的厚度,以产生应力 在图案元素。 还提供了相关的光掩模和制造集成电路的方法。