公开(公告)号：US20120107506A1

公开(公告)日：2012-05-03

申请号：US13270551

申请日：2011-10-11

Applicant: Nobutaka Ukigaya ,  Masamichi Masuda ,  Yoshiyuki Nakagawa ,  Masanori Yoshida

Inventor： Nobutaka Ukigaya ,  Masamichi Masuda ,  Yoshiyuki Nakagawa ,  Masanori Yoshida

IPC: B05D1/32 ,  B05C13/02

CPC classification number: C23C14/042 ,  H01L51/56

Abstract: Provided is a film formation apparatus capable of causing a substrate and a mask to be in a substantially horizontal state and brought into intimate contact with each other without deforming mask apertures. A region inside a mask frame and outside aperture regions of a mask on a rear surface of a substrate is pressed by a pressing body in lines along two opposing sides of the substrate.

Abstract translation: 本发明提供一种成膜装置，其能够使基板和掩模处于大致水平状态，并且在不使掩模孔变形的情况下彼此紧密接触。 衬底框架内的区域和衬底后表面上的掩模的外部孔区域被基体的两个相对侧的线按压体按压。

公开(公告)号：US4654272A

公开(公告)日：1987-03-31

申请号：US686869

申请日：1984-12-27

Applicant: Masamichi Masuda ,  Shinichi Sawai ,  Naoto Ishii

Inventor： Masamichi Masuda ,  Shinichi Sawai ,  Naoto Ishii

IPC: C08K5/00 ,  C08J7/06 ,  C08K5/20 ,  C08L1/00 ,  C08L7/00 ,  C08L21/00 ,  C08L27/00 ,  C08L27/06 ,  C08L33/00 ,  C08L33/02 ,  C08L51/00 ,  C08L51/02 ,  C08L55/00 ,  C08L55/02 ,  B32B27/08 ,  B05D3/02 ,  C08J5/14

CPC classification number: C08J7/065 ,  C08K5/20 ,  Y10T428/31725 ,  Y10T428/31757 ,  Y10T428/31797 ,  Y10T428/31935 ,  Y10T428/8305

Abstract: Frictional sounds caused by molded articles, particularly molded parts for automobiles, of non-olefinic synthetic resins rubbing against one another are decreased by incorporating an amide stearate or derivative thereof in the molded article or by coating the surface of the molded article with the stearate.

Abstract translation: 通过在模制品中加入酰胺硬脂酸酯或其衍生物或通过用硬脂酸酯涂覆模制品的表面，减少了通过将摩尔彼此摩擦的非烯烃合成树脂的模塑制品，特别是汽车用模塑零件引起的摩擦声音。

公开(公告)号：US20110239941A1

公开(公告)日：2011-10-06

申请号：US13074124

申请日：2011-03-29

Applicant: Yoshiyuki Nakagawa ,  Masanori Yoshida ,  Masamichi Masuda ,  Junji Ohyama ,  Akio Koganei ,  Naotoshi Miyamachi ,  Hirohito Yamaguchi ,  Tetsuya Karaki ,  Nobutaka Ukigaya ,  Toshiaki Yoshikawa

Inventor： Yoshiyuki Nakagawa ,  Masanori Yoshida ,  Masamichi Masuda ,  Junji Ohyama ,  Akio Koganei ,  Naotoshi Miyamachi ,  Hirohito Yamaguchi ,  Tetsuya Karaki ,  Nobutaka Ukigaya ,  Toshiaki Yoshikawa

IPC: C23C16/448 ,  C23C14/34

CPC classification number: C23C14/042

Abstract: Provided is an evaporation apparatus which reduces deformation of a mask, improves adhesion between a substrate and an evaporation mask, and improves accuracy of dividing a region on which a film is to be formed and a region on which the film is not to be formed. The evaporation apparatus includes a pressing mechanism for pressing a film forming substrate disposed on an evaporation mask including a magnetic material against the evaporation mask. The pressing mechanism includes a magnet for attracting the mask toward at least a corner portion of the film forming substrate.

Abstract translation: 本发明提供一种降低掩模变形的蒸发装置，提高基板与蒸发掩模之间的粘附性，提高将要形成膜的区域的分割精度和不形成膜的区域。 蒸发装置包括用于将设置在包括磁性材料的蒸发掩模上的成膜基板压靠在蒸发掩模上的按压机构。 按压机构包括用于将掩模吸引至成膜基板的至少角部的磁体。

公开(公告)号：US20060001760A1

公开(公告)日：2006-01-05

申请号：US11155631

申请日：2005-06-20

Applicant: Koichi Matsumura ,  Masamichi Masuda

Inventor： Koichi Matsumura ,  Masamichi Masuda

IPC: H04N5/225

CPC classification number: H04N5/2256

Abstract: A light projecting device including a two-dimensional array of light projecting elements is used to project light towards an image capturing device. An arrangement for mounting an object to be modelled is provided between the light projecting device and the image capturing device. The light projecting elements are arranged to direct light towards said image capturing device, whereby a silhouette of the object is generated at the image capturing device. The silhouette is used for generating a three-dimensional model of the object.

Abstract translation: 使用包括光投射元件的二维阵列的投光装置将光投影到图像拍摄装置。 在投光装置和图像拍摄装置之间设置有用于安装待建模物体的装置。 光投射元件布置成将光引向所述图像捕获装置，由此在图像捕获装置处产生对象的轮廓。 剪影用于生成对象的三维模型。

公开(公告)号：US20100080915A1

公开(公告)日：2010-04-01

申请号：US12561602

申请日：2009-09-17

Applicant: Masamichi Masuda ,  Takehiko Soda ,  Masataka Eida ,  Kazushi Miyata

Inventor： Masamichi Masuda ,  Takehiko Soda ,  Masataka Eida ,  Kazushi Miyata

IPC: B05D1/32 ,  B05C11/00

CPC classification number: C23C14/042 ,  H01L51/56

Abstract: When a position of a film formation mask is recognized by irradiating the film formation mask with light, an image having a high contrast cannot be obtained, which unstabilizes reproducibility of measurement accuracy for an alignment mark position, leading to an alignment error between a substrate and a mask. Provided is a film formation mask including a mask sheet having a positioning opening and a mask frame, in which a reflective member having a reflectance higher than that of the mask sheet is provided to the positioning opening. When light is irradiated onto the positioning opening of the film formation mask, an intensity difference between light reflected by the mask sheet and light reflected by the reflective member becomes stable. Therefore, the position of the film formation mask may be determined with high reproducibility.

Abstract translation: 当通过用光照射成膜掩模来识别成膜掩模的位置时，不能获得具有高对比度的图像，这使对准标记位置的测量精度的再现性不稳定，导致基板和 一个面具 本发明提供一种成膜掩模，其包括具有定位开口和掩模框架的掩模片，其中具有高于掩模片的反射率的反射部件设置在定位开口上。 当光照射到成膜掩模的定位开口上时，由掩模片反射的光与由反射部件反射的光之间的强度差变得稳定。 因此，可以以高再现性确定成膜掩模的位置。