公开(公告)号：US20080159064A1

公开(公告)日：2008-07-03

申请号：US11793193

申请日：2005-12-13

Applicant: Youqi Wang ,  Peijun Cong ,  Guilin Wang ,  Wenhui Wang ,  Lichen Diao ,  Youshu Kang ,  Yubin Zhong ,  Bohejin Tang ,  Fuxin Huang

Inventor： Youqi Wang ,  Peijun Cong ,  Guilin Wang ,  Wenhui Wang ,  Lichen Diao ,  Youshu Kang ,  Yubin Zhong ,  Bohejin Tang ,  Fuxin Huang

IPC: B01F15/02 ,  B01F15/06

CPC classification number: B01F7/008 ,  B01F3/0807 ,  B01F7/00816 ,  B29B7/407

Abstract: The present invention discloses an apparatus for processing materials, which is used to process the materials introduced thereinto, comprising a working part and a driving part, wherein the working part comprises, in cylindrical form, a first element and a second element arranged within the first element, and a containing chamber for storing materials to be processed being formed by the gap between the first element and the second element, and the second element is driven by the driving part to rotate relatively to the first element, and on the surface of the second element toward the containing chamber, provided is a disturbing part capable of producing axial forces in a direction parallel to the axis of the first element. Thanks to the disturbing part of the second element, the apparatus of the present invention can process materials thoroughly, control retention time of materials within the containing chamber, prevent materials from entering into the mixing blind area and thus make all materials processed thoroughly.

Abstract translation: 本发明公开了一种用于处理材料的装置，其用于处理引入其中的材料，包括工作部分和驱动部分，其中工作部件包括圆柱形形式的第一元件和布置在第一 元件和用于存储待处理材料的容纳室由第一元件和第二元件之间的间隙形成，并且第二元件由驱动部分驱动以相对于第一元件旋转，并且在第二元件的表面上 第二元件朝向容纳室设置有能够在平行于第一元件的轴线的方向上产生轴向力的扰动部。 由于第二元件的干扰部分，本发明的装置可以充分地处理材料，控制容纳室内材料的保留时间，防止材料进入混合遮光区域，从而使所有材料被彻底处理。

公开(公告)号：US20090304557A1

公开(公告)日：2009-12-10

申请号：US12067040

申请日：2006-09-18

Applicant: Guilin Wang ,  Lichen Diao

Inventor： Guilin Wang ,  Lichen Diao

IPC: B01J19/00 ,  G05B1/00

CPC classification number: B01J19/0013 ,  B01J19/004 ,  B01J19/0046 ,  B01J2219/00029 ,  B01J2219/00038 ,  B01J2219/00153 ,  B01J2219/00155 ,  B01J2219/00286 ,  B01J2219/00308 ,  B01J2219/00423 ,  B01J2219/00495 ,  B01J2219/00585 ,  B01J2219/00596 ,  B01J2219/00698 ,  B01J2219/00747

Abstract: A system for conducting one or more reactions is provided. The system includes one or more reaction chambers, a temperature controller and an insulator each thermally coupled to the reaction chambers, and a heat radiation shield. The insulator comprises a vacuum environment. The system is provided with the temperature controller, heat radiation shield and insulator such that the temperature of the reaction chambers can be accurately controlled, heat loss, gain and fluctuation of the reaction chambers can be minimized, and temperature uniformity of the reaction chambers can be ensured.

Abstract translation: 提供了进行一个或多个反应的系统。 该系统包括一个或多个反应室，温度控制器和各自热耦合到反应室的绝缘体和散热屏蔽。 绝缘体包括真空环境。 该系统配有温度控制器，散热屏蔽和绝缘体，使得反应室的温度可以被精确控制，反应室的热损失，增益和波动可以最小化，反应室的温度均匀性可以 确保。