公开(公告)号：USD1036213S1

公开(公告)日：2024-07-23

申请号：US29875060

申请日：2023-04-28

Applicant: Sachin Shashikant Dakare ,  Rahul Maruti Nanche ,  John Wayne Kroening ,  Andrew Francis Troy ,  Katey Earley ,  Jae Kwang Lee ,  John Hagan

Designer： Sachin Shashikant Dakare ,  Rahul Maruti Nanche ,  John Wayne Kroening ,  Andrew Francis Troy ,  Katey Earley ,  Jae Kwang Lee ,  John Hagan

Abstract: FIG. 1 is a front perspective view of a conduit bending tool, showing the new design.
FIG. 2 is an alternate front perspective view of the conduit bending tool;
FIG. 3 is a front elevation view of the conduit bending tool;
FIG. 4 is a rear elevation view of the conduit bending tool;
FIG. 5 is a right side elevation view of the conduit bending tool;
FIG. 6 is a left side elevation view of the conduit bending tool;
FIG. 7 is a top plan view of the conduit bending tool; and,
FIG. 8 is a bottom plan view of the conduit bending tool.
The broken lines in the drawings depict portions of the conduit bending tool which form no part of the claimed design.

公开(公告)号：US09776306B2

公开(公告)日：2017-10-03

申请号：US14009879

申请日：2012-03-19

Applicant: Seh-Kwang Lee ,  Rak-Joo Sung ,  Sang-Wook Park

Inventor： Seh-Kwang Lee ,  Rak-Joo Sung ,  Sang-Wook Park

IPC: B24D18/00 ,  B23D61/18 ,  B23D65/00 ,  C25D5/02 ,  B25D13/00 ,  C25D15/00 ,  C25D13/00 ,  C25D7/06

CPC classification number: B24D18/0018 ,  B23D61/185 ,  B23D65/00 ,  C25D5/022 ,  C25D7/0607 ,  C25D13/00 ,  C25D15/00

Abstract: The present invention relates to an electrodeposited diamond wire saw using patterned non-conductive materials in which non-conductive materials are pre-patterned along the outer circumference of a wire on which diamond grit should not be rubbed, before the diamond grit is upset, in order to efficiently improve the manufacturing process, and to a method for manufacturing same. According to one preferred embodiment of the invention, the method for manufacturing an electrodeposited diamond wire saw includes: printing a masking solution on the outer circumference of a wire in a plurality of directions when the wire is inserted for patterning; and upsetting diamond grit on the remaining regions of the outer circumference of the wire, with the exception of the patterned region.

公开(公告)号：US09619047B2

公开(公告)日：2017-04-11

申请号：US12912281

申请日：2010-10-26

Applicant: Chee Foo Lum ,  Sai Mun Lee ,  Khoon Guan Tee ,  Hun Kwang Lee

Inventor： Chee Foo Lum ,  Sai Mun Lee ,  Khoon Guan Tee ,  Hun Kwang Lee

IPC: G06F3/03

CPC classification number: G06F3/0317

Abstract: An optical finger navigation (OFN) device for use in handheld portable devices is presented. The OFN device may include a light source, a sensor, a lens holder integrated with a light guide system and a molded lead frame. The lens holder may include a lens receiving region for receiving the lens, a light guide system for directing light emitted by the light source towards the navigation surface. The light guide system may include a slanted wall that may be coated with a light reflective material.

公开(公告)号：US09421668B2

公开(公告)日：2016-08-23

申请号：US14405116

申请日：2012-06-07

Applicant: Seh Kwang Lee ,  Youn Chul Kim ,  Joo Han Lee ,  Jae Kwang Choi ,  Jae Phil Boo

Inventor： Seh Kwang Lee ,  Youn Chul Kim ,  Joo Han Lee ,  Jae Kwang Choi ,  Jae Phil Boo

IPC: B24B37/00 ,  B24B49/18 ,  B24B37/005 ,  B24B53/017

CPC classification number: B24B49/186 ,  B24B37/005 ,  B24B49/18 ,  B24B53/017

Abstract: Provided is a chemical mechanical polishing (CMP) apparatus that includes a swing unit installed apart from a platen, on which a CMP pad to be conditioned is placed, at a predetermined interval, a connector installed on an upper end of the swing unit at one end thereof in a perpendicular direction to the swing unit and pivoting around the swing unit above the CMP pad, a rotator rotatably installed on the other end of the connector, a CMP pad conditioner coupled to the rotator and conditioning the CMP pad when rotated, and a vibration meter installed on the connector and detecting vibrations to measure a vibration acceleration of the CMP pad conditioner, thereby predicting a wear rate of the CMP pad based on the vibration acceleration and a state in which the CMP pad conditioner is installed or being used.

Abstract translation: 提供了一种化学机械抛光（CMP）装置，其包括摆动单元，该摆动单元以预定间隔安装在其上放置待调理的CMP垫的压板上，安装在摆动单元的上端的连接器 在摆动单元的垂直方向上的端部，并且围绕摆放单元围绕CMP垫旋转，可旋转地安装在连接器的另一端上的旋转器，耦合到旋转体并在旋转时调节CMP垫的CMP垫调节器，以及 安装在连接器上并检测振动以测量CMP垫调节器的振动加速度的振动计，从而基于振动加速度和CMP垫调节器的安装或使用状态来预测CMP垫的磨损率。

公开(公告)号：US09314901B2

公开(公告)日：2016-04-19

申请号：US14117936

申请日：2012-05-15

Applicant: Seh Kwang Lee ,  Youn Chul Kim ,  Joo Han Lee ,  Jae Kwang Choi ,  Jae Phil Boo

Inventor： Seh Kwang Lee ,  Youn Chul Kim ,  Joo Han Lee ,  Jae Kwang Choi ,  Jae Phil Boo

IPC: B24B53/017 ,  B24B53/02 ,  B24D18/00

CPC classification number: B24B53/017 ,  B24D18/00

Abstract: This invention relates to a conditioner for a CMP (Chemical Mechanical Polishing) pad, which is used in a CMP process which is part of the fabrication of a semiconductor device, and more particularly, to a CMP pad conditioner in which the structure of the cutting tips is such that the change in the wear of the polishing pad is not great even when different kinds of slurry are used and when there are changes in pressure of the conditioner, and to a method of manufacturing the same.

Abstract translation: 本发明涉及一种用于CMP（化学机械抛光）焊盘的调节器，其用于作为半导体器件的制造的一部分的CMP工艺中，更具体地，涉及一种CMP焊盘调节器，其中切割结构 即使使用不同种类的浆料和调节剂的压力变化时，抛光垫的磨损变化也不是很大，而且制造方法也是如此。

公开(公告)号：US20140364764A1

公开(公告)日：2014-12-11

申请号：US14362895

申请日：2012-07-19

Applicant: Hyung Il Jung ,  Chengguo Li ,  Chang Yoel Lee ,  Kwang Lee

Inventor： Hyung Il Jung ,  Chengguo Li ,  Chang Yoel Lee ,  Kwang Lee

IPC: A61B5/151 ,  A61B5/15

CPC classification number: A61B5/15113 ,  A61B5/150022 ,  A61B5/150099 ,  A61B5/150221 ,  A61B5/150396 ,  A61B5/150969 ,  A61B5/150984 ,  A61B5/15142

Abstract: The present invention relates to a device for collecting body fluids, the device comprising: (a) an internal pressure adjustment means for adjusting the internal pressure of the device, and the internal pressure adjustment means has an internal space and is made of an elastic deformable material; (b) a fluid accommodation means, which is openly connected to the internal pressure adjustment means, for accommodating body fluids collected from the human body; and (c) a perforation means which is connected to the fluid accommodation means, is located at the lower part of the device, and comprises a hollow microstructure for forming an opening on the body.

Abstract translation: 本发明涉及一种用于收集体液的装置，该装置包括：（a）用于调节装置的内部压力的内部压力调节装置，并且内部压力调节装置具有内部空间，并且由弹性变形 材料; （b）流体容纳装置，其与内部压力调节装置公开连接，用于容纳从人体收集的体液; 和（c）连接到流体容纳装置的穿孔装置位于装置的下部，并且包括用于在主体上形成开口的中空微结构。

公开(公告)号：US08620253B2

公开(公告)日：2013-12-31

申请号：US12815794

申请日：2010-06-15

Applicant: Kwang Lee ,  Byung Ki Han ,  Si Bum Jun

Inventor： Kwang Lee ,  Byung Ki Han ,  Si Bum Jun

IPC: H04B1/00

CPC classification number: H04B1/30

Abstract: An apparatus and method of compensating for a direct voltage offset in a direct conversion receiver of a wireless communications system is provided. The apparatus includes a voltage control oscillator for generating a local oscillation signal having the same frequency as an input signal, a frequency converter for combining the input signal with the local oscillation signal, a first compensator for determining a first direct voltage offset generated due to a leaked local oscillation signal flowed into the frequency converter, for feeding back a magnitude of the determined first direct voltage offset to the frequency converter and for compensating for the first direct voltage offset, and a first register for storing a magnitude of direct voltage offset for a first variable gain amplifier, wherein the first variable gain amplifier is positioned in a rear end of the frequency converter, connected to the first register, and performs a modem associated offset compensation using a magnitude of direct voltage offset stored in the first register.

Abstract translation: 提供一种用于补偿无线通信系统的直接转换接收机中的直接电压偏移的装置和方法。 该装置包括用于产生具有与输入信号相同频率的本地振荡信号的电压控制振荡器，用于将输入信号与本地振荡信号进行组合的频率转换器，用于确定由于输入信号产生的第一直流电压偏移的第一补偿器 泄漏的本地振荡信号流入变频器，用于将所确定的第一直接电压偏移的大小反馈到变频器并补偿第一直接电压偏移;以及第一寄存器，用于存储直流电压偏移的幅度 第一可变增益放大器，其中第一可变增益放大器位于变频器的后端，连接到第一寄存器，并且使用存储在第一寄存器中的直流电压偏移量来执行调制解调器相关的偏移补偿。

公开(公告)号：US08574792B2

公开(公告)日：2013-11-05

申请号：US13110024

申请日：2011-05-18

Applicant: Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hyang-Shik Kong

Inventor： Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hyang-Shik Kong

IPC: G03F1/00

CPC classification number: G03F1/50

Abstract: A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.

Abstract translation: 光掩模包括基板，掩模图案层和超透镜。 基板包括包括突出部分和突出部分之间的开口部分的图案。 掩模图案层位于图案的开口部分并填充图案的开口部分。 超透镜位于基板和掩模图案层上。

公开(公告)号：US08477836B2

公开(公告)日：2013-07-02

申请号：US12665311

申请日：2008-06-18

Applicant: Young-Suk Yoon ,  Wonyoung Yoo ,  Yong-Seok Seo ,  Sang Kwang Lee ,  Jin Soo Seo ,  Seungjae Lee ,  Weon Geun Oh ,  Young Ho Suh

Inventor： Young-Suk Yoon ,  Wonyoung Yoo ,  Yong-Seok Seo ,  Sang Kwang Lee ,  Jin Soo Seo ,  Seungjae Lee ,  Weon Geun Oh ,  Young Ho Suh

IPC: H04N11/02

CPC classification number: H04N5/91

Abstract: A method for managing digital videos includes extracting a feature of an input digital video, searching for candidate features having similarity to the extracted feature, and comparing the extracted feature with each of the candidate features to select at least one of the candidate features similar to the extracted feature and provide information on a digital video corresponding to the selected candidate feature.

Abstract translation: 一种用于管理数字视频的方法包括提取输入数字视频的特征，搜索具有与所提取的特征相似的候选特征，以及将提取的特征与每个候选特征进行比较，以选择至少一个类似于 提取特征并提供与所选候选特征相对应的数字视频的信息。

公开(公告)号：US20130122403A1

公开(公告)日：2013-05-16

申请号：US13471080

申请日：2012-05-14

Applicant: Bong-Yeon Kim ,  Min Kang ,  Jong Kwang Lee ,  Jin Ho Ju

Inventor： Bong-Yeon Kim ,  Min Kang ,  Jong Kwang Lee ,  Jin Ho Ju

IPC: G03F7/20 ,  G03F1/26

CPC classification number: G03F1/32

Abstract: Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.

Abstract translation: 提供了一种能够在不更换或改变曝光器的情况下形成超出曝光机的临界分辨率的精细图案的光刻掩模。 掩模包括至少部分吸光相移层并使用复合波长光源。