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公开(公告)号：US20110017424A1
公开(公告)日：2011-01-27
申请号：US12896272
申请日：2010-10-01
CPC分类号： C23C16/463 , H01L21/6831 , H01L21/6875 , H01L21/68757 , Y10T279/23
摘要： A substrate heat exchange pedestal comprises: (i) a support structure having a contact surface comprising a coating of a diamond-like material, and (ii) a heat exchanger in the support structure, the heat exchanger capable of heating or cooling a substrate.
摘要翻译： 基板热交换基座包括：（i）支撑结构，其具有包括金刚石材料的涂层的接触表面，和（ii）支撑结构中的热交换器，该热交换器能够加热或冷却基板。
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公开(公告)号：US07824498B2
公开(公告)日：2010-11-02
申请号：US10786876
申请日：2004-02-24
IPC分类号： C23C16/00 , H01L21/306 , H01L21/683 , C23F1/00 , B23B31/38
CPC分类号： C23C16/463 , H01L21/6831 , H01L21/6875 , H01L21/68757 , Y10T279/23
摘要： A substrate support has a support structure and a coating on the support structure having a carbon-hydrogen network. The coating has a contact surface having a coefficient of friction of less than about 0.3 and a hardness of at least about 8 GPa. The contact surface of the coating is capable of reducing abrasion and contamination of a substrate that contacts the contact surface. In one version, the support structure has a dielectric covering an electrode. A plurality of mesas on the dielectric have a coating with the contact surface thereon.
摘要翻译： 衬底支撑件具有支撑结构，并且在具有碳 - 氢网络的支撑结构上具有涂层。 涂层具有摩擦系数小于约0.3，硬度至少约8GPa的接触表面。 涂层的接触表面能够减少与接触表面接触的基底的磨损和污染。 在一个版本中，支撑结构具有覆盖电极的电介质。 电介质上的多个台面具有其上具有接触表面的涂层。
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公开(公告)号：US07804040B2
公开(公告)日：2010-09-28
申请号：US11438496
申请日：2006-05-22
申请人： Karl M. Brown , Semyon Sherstinksy , Vineet H. Mehta , Wei W. Wang , John A. Pipitone , Kurt J. Ahmann , Armando Valverde, Jr.
发明人： Karl M. Brown , Semyon Sherstinksy , Vineet H. Mehta , Wei W. Wang , John A. Pipitone , Kurt J. Ahmann , Armando Valverde, Jr.
IPC分类号： B23K9/00
CPC分类号： H01J37/3408 , C23C14/046 , C23C14/345 , C23C14/358 , H01J37/32082 , H01J37/32706 , H01L21/2855 , H01L21/76843 , H01L21/76844
摘要： A physical vapor deposition reactor includes a vacuum chamber with a sidewall, a ceiling and a retractable wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, the retractable wafer support pedestal having an internal electrode and a grounded base with a conductive annular flange extending from the base. A metal sputter target at the ceiling is energized by a high voltage D.C. source. The reactor has an RF plasma source power generator with a frequency suitable for exciting kinetic electrons is coupled to either the sputter target or to the internal electrode of the pedestal. A removable shield protects the sidewall and is grounded by plural compressible conductive tabs dispersed at generally uniform intervals on the annular flange and engaging a bottom edge of the shield whenever the retractable wafer support pedestal is in an unretracted position, each of the uniform intervals being less than a wavelength corresponding to the frequency of the RF plasma source power generator.
摘要翻译： 物理气相沉积反应器包括具有侧壁的真空室，天花板和靠近室的地板附近的可缩回的晶片支撑基座，以及耦合到室的真空泵，所述可缩回晶片支撑基座具有内部电极和接地基座 具有从基座延伸的导电环形凸缘。 天花板上的金属溅射靶由高电压直流电源供电。 反应器具有RF等离子体源功率发生器，其具有适于激发动电子的频率，耦合到溅射靶或底座的内部电极。 可拆卸的屏蔽件保护侧壁并且通过在环形凸缘上以大致均匀间隔分散的多个可压缩导电片接地，并且每当可缩回的晶片支撑基座处于未受损的位置时，接合屏蔽的底部边缘，每个均匀间隔较小 比对应于RF等离子体源发生器的频率的波长。
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公开(公告)号：US08852348B2
公开(公告)日：2014-10-07
申请号：US12896272
申请日：2010-10-01
申请人： Vijay D Parkhe , Kurt J Ahmann , Matthew C Tsai , Steve Sansoni
发明人： Vijay D Parkhe , Kurt J Ahmann , Matthew C Tsai , Steve Sansoni
IPC分类号： C23C16/00 , H01L21/306 , C23F1/00 , H01L21/683 , B23B31/38 , H01L21/687
CPC分类号： C23C16/463 , H01L21/6831 , H01L21/6875 , H01L21/68757 , Y10T279/23
摘要： A substrate heat exchange pedestal comprises: (i) a support structure having a contact surface comprising a coating of a diamond-like material, and (ii) a heat exchanger in the support structure, the heat exchanger capable of heating or cooling a substrate.
摘要翻译： 基板热交换基座包括：（i）支撑结构，其具有包括金刚石材料的涂层的接触表面，和（ii）支撑结构中的热交换器，所述热交换器能够加热或冷却基板。
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