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14 条记录 (耗时 0.014 秒)

    Diesel fuel formulation for reduced emissions
    4.
    发明授权
    Diesel fuel formulation for reduced emissions 有权
    用于减少排放的柴油燃料配方

    公开(公告)号：US07208078B2

    公开(公告)日：2007-04-24

    申请号：US10393167

    申请日：2003-03-20

    申请人： Walter Weissman ,  John T. Farrell ,  Shizuo Sasaki ,  Kazuhiro Akihama ,  Kiyomi Nakakita

    发明人： Walter Weissman ,  John T. Farrell ,  Shizuo Sasaki ,  Kazuhiro Akihama ,  Kiyomi Nakakita

    IPC分类号： C10L1/08

    CPC分类号： C10L1/08

    摘要： The invention is directed to a method and formula for producing a fuel having reduced particulate emissions from an internal combustion engine. The fuel taught herein is characterized as having a cetane number ranging from about 45 to about 65, a T95 distillation property of less than about 370° C., and having NR, AR, cetane number and T95 defined by the relation: PEI=156+Z1×(cetane#−49)+Z2×(NR−14)+Z3×(AR−25)+Z4×(T95−315° C.) Where Z1 ranges from abut 0.67 to about 1.06, Z2 ranges from about 0.9 to about 1.28, Z3 ranges from about 2.54 to about 2.80, Z4 ranges from about 0.1 to about 0.4, NR is a defined correlation of the naphthene rings content in the fuel, and AR is a defined correlation of the aromatic rings content in the fuel.

    摘要翻译： 本发明涉及一种用于生产具有减少的来自内燃机的颗粒物排放的燃料的方法和配方。 本文教导的燃料的特征在于具有约45至约65的十六烷值，小于约370℃的T 95 C蒸馏性能，并且具有NR，AR，十六烷值和T 由<？in-line-formula description =“In-line Formulas”end =“lead”？> PEI = 156 + Z <1> 定义的< 十六烷-49）+ Z 2 x（NR-14）+ Z 3 x（AR-25）+ Z 4 x（T 95℃-315℃）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中Z <1> 范围为0.67 至约1.06，Z 2范围为约0.9至约1.28，Z 3 3范围为约2.54至约2.80，Z 4范围为约 0.1至约0.4，NR是燃料中环烷烃环含量的确定相关性，AR是燃料中芳环含量的确定相关性。

    Laser deposition method and apparatus
    8.
    发明授权
    Laser deposition method and apparatus 失效
    激光沉积方法和装置

    公开(公告)号：US5126165A

    公开(公告)日：1992-06-30

    申请号：US549115

    申请日：1990-07-06

    申请人： Kazuhiro Akihama ,  Yoshimi Kizaki ,  Noboru Takayanagi

    发明人： Kazuhiro Akihama ,  Yoshimi Kizaki ,  Noboru Takayanagi

    IPC分类号： C23C14/16 ,  C23C14/28 ,  C23C14/54

    CPC分类号： C23C14/16 ,  C23C14/28 ,  C23C14/54

    摘要： For forming a metal film of a desired property on a substrate, a target and the substrate are placed in a pressure-reducing chamber, and then pulse laser is irradiated to the target. This causes the component materials, such as ions, electrons, neutral atoms, cluster, fine grains and liquid drops, of the target to be emitted from the target, and then laser induced plasma is produced. These emissions of substances have spatial and timewise distribution determined by physical and chemical states. Then, a shielding plate having an opening is placed between the target and the substrate, and from the materials, only the material emitted in a predetermined direction is selected to control the property of the film deposited on the substrate. By locating a filter between the target and the substrate to open for a predetermined period of time, only the material emitted at a predetermined velocity can be selected. Further, by applying a predetermined d.c. voltage between the target and the substrate to control the spatial and timewise distribution of charged particles in the emitted materials, it is possible to control the velocity, order and quantity of the charged particles as the latter arrive at the substrate.