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公开(公告)号：US08068208B2
公开(公告)日：2011-11-29
申请号：US11677949
申请日：2007-02-22
申请人： Jui-Chung Peng , Tzung-Chi Fu , Chin-Hsiang Lin , Chien-Hsun Lin , Chun-Hung Lin , Yao-Wen Guo , Shy-Jay Lin , Heng-Hsin Liu
发明人： Jui-Chung Peng , Tzung-Chi Fu , Chin-Hsiang Lin , Chien-Hsun Lin , Chun-Hung Lin , Yao-Wen Guo , Shy-Jay Lin , Heng-Hsin Liu
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70783
摘要： System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner including a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method includes providing a water tank that connects to at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.
摘要翻译： 描述了用于提高浸没式扫描仪覆盖性能的系统和方法。 一个实施例是一种提高光刻浸没扫描仪的覆盖性能的方法，该扫描仪包括设置在其中的水通道中的具有透镜冷却水（“LCW”）的晶片台，晶片台具有用于将LCW接收到水通道中的输入端， 输出用于从水道排出LCW。 该方法包括：提供连接到晶片台输入和晶片台输出中的至少一个的水箱; 监测水箱内的水压; 并且将水箱中的水的压力保持在预定水平。
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公开(公告)号：US07795601B2
公开(公告)日：2010-09-14
申请号：US11421590
申请日：2006-06-01
申请人： Chin-Hsiang Lin , Jui-Chung Peng , Yung-Cheng Chen , Shy-Jay Lin
发明人： Chin-Hsiang Lin , Jui-Chung Peng , Yung-Cheng Chen , Shy-Jay Lin
CPC分类号： G03F7/70991 , G03F7/70466
摘要： The present disclosure provides a lithography apparatus with improved lithography throughput. The lithography apparatus includes a first lens system; a first substrate stage configured to receive a first radiation energy from the first lens system, and designed operable to move a substrate during an exposing process; a second lens system, having a higher resolution than that of the first lens system; and a second substrate stage approximate to the first substrate stage and configured to receive a second radiation energy from the second lens system, and designed operable to receive the substrate from the first substrate stage and move the substrate.
摘要翻译： 本公开提供了具有改进的光刻产量的光刻设备。 光刻设备包括第一透镜系统; 第一衬底台，被配置为从所述第一透镜系统接收第一辐射能量，并且被设计为可操作以在曝光过程期间移动衬底; 第二透镜系统，具有比第一透镜系统更高的分辨率; 以及第二衬底台，其近似于所述第一衬底台并且被配置为从所述第二透镜系统接收第二辐射能量，并且被设计为可操作以从所述第一衬底台接收所述衬底并移动所述衬底。
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公开(公告)号：US07738692B2
公开(公告)日：2010-06-15
申请号：US11458915
申请日：2006-07-20
申请人： Nan-Jung Chen , Jui-Chung Peng , Kevin Hung , An-Kuo Yang
发明人： Nan-Jung Chen , Jui-Chung Peng , Kevin Hung , An-Kuo Yang
CPC分类号： G03F7/70133 , G01J1/4257 , G03F7/70125
摘要： Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.
摘要翻译： 提供了用于确定应用于光刻工艺的光源的质量的方法。 图像传感器阵列暴露于来自光源的光。 对应于瞳孔图上表示来自图像传感器阵列的光的强度的多个位置的地址和各自的强度。 基于收集的地址和相应的强度来定义瞳孔图的内部曲线和外部曲线中的至少一个。 如果地址相对于内曲线和外曲线中的至少一个具有预定图案，则将光源施加到光刻工艺。
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公开(公告)号：US20060054432A1
公开(公告)日：2006-03-16
申请号：US10941977
申请日：2004-09-16
申请人： Yu-Yen Chiu , Jui-Chung Peng , Wei-Li Yi , George Yao
发明人： Yu-Yen Chiu , Jui-Chung Peng , Wei-Li Yi , George Yao
IPC分类号： F16F15/03
CPC分类号： F16F15/022 , F16F15/02
摘要： An anti-shock system for a machine. A first movable device is disposed between the machine and a surface. When vibration is transmitted to the machine from the surface, the first movable device releases the machine, which slides along the base to prevent vibration from transmitted to the machine.
摘要翻译： 一台机器的防震系统。 第一可移动装置设置在机器和表面之间。 当振动从表面传递到机器时，第一可移动装置释放机器，其沿着底座滑动以防止振动传递到机器。
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公开(公告)号：US08184896B2
公开(公告)日：2012-05-22
申请号：US12773143
申请日：2010-05-04
申请人： Nan-Jung Chen , Jui-Chung Peng , Kevin Hung , An-Kuo Yang
发明人： Nan-Jung Chen , Jui-Chung Peng , Kevin Hung , An-Kuo Yang
IPC分类号： G06K9/00
CPC分类号： G03F7/70133 , G01J1/4257 , G03F7/70125
摘要： Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.
摘要翻译： 提供了用于确定应用于光刻工艺的光源的质量的方法。 图像传感器阵列暴露于来自光源的光。 对应于瞳孔图上表示来自图像传感器阵列的光的强度的多个位置的地址和各自的强度。 基于收集的地址和相应的强度来定义瞳孔图的内部曲线和外部曲线中的至少一个。 如果地址相对于内曲线和外曲线中的至少一个具有预定图案，则将光源施加到光刻工艺。
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公开(公告)号：US20080198351A1
公开(公告)日：2008-08-21
申请号：US11677320
申请日：2007-02-21
申请人： Chien-Hsun Lin , An-Kao Yang , Jui-Chung Peng , Yao-Wen Guo
发明人： Chien-Hsun Lin , An-Kao Yang , Jui-Chung Peng , Yao-Wen Guo
IPC分类号： G03B27/42
CPC分类号： G03F7/70358 , G03F7/70425 , G03F7/70466
摘要： A method for use in the manufacture of a microelectronic apparatus, the method comprising exposing a dummy field on a substrate by utilizing a lithographic scanner at a first speed, and exposing a production field on the substrate by utilizing the lithographic scanner at a second speed, where the first speed is substantially greater than the second speed. In a related embodiment, a method for use in the manufacture a microelectronic apparatus comprises exposing a non-critical layer of the apparatus by utilizing a lithographic scanner at a first speed, and exposing a critical layer of the apparatus by utilizing the lithographic scanner at a second speed, where the first speed is substantially greater than the second speed.
摘要翻译： 一种用于制造微电子装置的方法，所述方法包括以第一速度利用光刻扫描仪曝光衬底上的虚拟场，并以第二速度利用光刻扫描器暴露衬底上的生产场， 其中第一速度基本上大于第二速度。 在相关实施例中，一种用于制造微电子设备的方法包括：以第一速度利用光刻扫描仪曝光设备的非临界层，并且通过利用光刻扫描仪在一个 第二速度，其中第一速度基本上大于第二速度。
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公开(公告)号：US20080129969A1
公开(公告)日：2008-06-05
申请号：US11677949
申请日：2007-02-22
申请人： Jui-Chung Peng , Tzung-Chi Fu , Chin-Hsiang Lin , Chien-Hsun Lin , Chun-Hung Lin , Yao-Wen Guo , Shy-Jay Lin , Heng-Hsin Liu
发明人： Jui-Chung Peng , Tzung-Chi Fu , Chin-Hsiang Lin , Chien-Hsun Lin , Chun-Hung Lin , Yao-Wen Guo , Shy-Jay Lin , Heng-Hsin Liu
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70783
摘要： System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner comprising a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method comprises providing a water tank at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.
摘要翻译： 描述了用于提高浸没式扫描仪覆盖性能的系统和方法。 一个实施例是一种提高光刻浸没式扫描仪的覆盖性能的方法，其包括设置在其中的水通道中的透镜冷却水（“LCW”）的晶片台，晶片台具有用于将LCW接收到水通道中的输入端， 输出用于从水道排出LCW。 该方法包括：提供一个水箱至少一个晶片台输入和晶片台输出; 监测水箱内的水压; 并且将水箱中的水的压力保持在预定水平。
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公开(公告)号：US20080019586A1
公开(公告)日：2008-01-24
申请号：US11458915
申请日：2006-07-20
申请人： Nan-Jung Chen , Jui-Chung Peng , Kevin Hung , An-Kuo Yang
发明人： Nan-Jung Chen , Jui-Chung Peng , Kevin Hung , An-Kuo Yang
CPC分类号： G03F7/70133 , G01J1/4257 , G03F7/70125
摘要： Methods for determining a quality of a light source applied to a photolithographic process are provided. An image sensor array is exposed to a light from a light source. Addresses and respective intensities corresponding to a plurality of locations on a pupil map representing intensity of the light from on the image sensor array. At least one of an inner curve and an outer curve of the pupil map is defined based upon the collected addresses and respective intensities. The light source is applied to a photolithographic process if the addresses have a predetermined pattern relative to the at least one of the inner curve and the outer curve.
摘要翻译： 提供了用于确定应用于光刻工艺的光源的质量的方法。 图像传感器阵列暴露于来自光源的光。 对应于瞳孔图上表示来自图像传感器阵列的光的强度的多个位置的地址和各自的强度。 基于收集的地址和相应的强度来定义瞳孔图的内部曲线和外部曲线中的至少一个。 如果地址相对于内曲线和外曲线中的至少一个具有预定图案，则将光源施加到光刻工艺。
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公开(公告)号：US09529275B2
公开(公告)日：2016-12-27
申请号：US11677320
申请日：2007-02-21
申请人： Chien-Hsun Lin , An-Kao Yang , Jui-Chung Peng , Yao-Wen Guo
发明人： Chien-Hsun Lin , An-Kao Yang , Jui-Chung Peng , Yao-Wen Guo
CPC分类号： G03F7/70358 , G03F7/70425 , G03F7/70466
摘要： A method for use in the manufacture of a microelectronic apparatus, the method comprising exposing a dummy field on a substrate by utilizing a lithographic scanner at a first speed, and exposing a production field on the substrate by utilizing the lithographic scanner at a second speed, where the first speed is substantially greater than the second speed. In a related embodiment, a method for use in the manufacture a microelectronic apparatus comprises exposing a non-critical layer of the apparatus by utilizing a lithographic scanner at a first speed, and exposing a critical layer of the apparatus by utilizing the lithographic scanner at a second speed, where the first speed is substantially greater than the second speed.
摘要翻译： 一种用于制造微电子装置的方法，所述方法包括以第一速度利用光刻扫描仪曝光衬底上的虚拟场，并以第二速度利用光刻扫描器暴露衬底上的生产场， 其中第一速度基本上大于第二速度。 在相关实施例中，一种用于制造微电子设备的方法包括：以第一速度利用光刻扫描仪曝光设备的非临界层，并且通过利用光刻扫描仪在一个 第二速度，其中第一速度基本上大于第二速度。
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10.发明授权公开(公告)号：US08199314B2
公开(公告)日：2012-06-12
申请号：US13288133
申请日：2011-11-03
申请人： Jui-Chung Peng , Tzung-Chi Fu , Chin-Hsiang Lin , Chien-Hsun Lin , Chun-Hung Lin , Yao-Wen Guo , Shy-Jay Lin , Heng-Hsin Liu
发明人： Jui-Chung Peng , Tzung-Chi Fu , Chin-Hsiang Lin , Chien-Hsun Lin , Chun-Hung Lin , Yao-Wen Guo , Shy-Jay Lin , Heng-Hsin Liu
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70783
摘要： System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner including a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method includes providing a water tank that connects to at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level.
摘要翻译： 描述了用于提高浸没式扫描仪覆盖性能的系统和方法。 一个实施例是一种提高光刻浸没扫描仪的覆盖性能的方法，该扫描仪包括设置在其中的水通道中的具有透镜冷却水（“LCW”）的晶片台，晶片台具有用于将LCW接收到水通道中的输入端， 输出用于从水道排出LCW。 该方法包括：提供连接到晶片台输入和晶片台输出中的至少一个的水箱; 监测水箱内的水压; 并且将水箱中的水的压力保持在预定水平。
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