Abstract:
An apparatus and method to inspect a defect of a substrate. Since a recess of an under layer of a substrate is darker than a projection of a top layer, a ratio of a value of a secondary electron signal (of an SEM) of the under layer to a value of the top layer may be increased to improve a pattern image used to inspect an under layer defect. Several conditions under which electron beams are irradiated may be set, and the pattern may be scanned under such conditions. Secondary electron signals may be generated according to the conditions and converted into image data to display various pattern images. Scan information on the images may be stored with positional information on the substrate. Each of scan information on the pattern images may be calculated to generate a new integrated image.
Abstract:
A handler tray may include a tray body and a socket. The tray body may be configured to receive an object. The tray body with the object may be transferred to a test board. The tray body may be selectively interposed between the object and the test board to supply a test current from the test board to external terminals of the object. The socket may be formed on the tray body. The socket may electrically make contact with the external terminals of the object. Thus, a pick-up robot and an insert may be unnecessary, so that a test system and method of testing the object may have an optimally available space.
Abstract:
An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about −70° to about +70°.
Abstract:
In a method of analyzing a wafer sample, a first defect of a photoresist pattern on the wafer sample having shot regions exposed with related exposure conditions is detected. A first portion of the pattern includes the shot regions exposed with an exposure condition corresponding to a reference exposure condition and a tolerance error range of the reference exposure condition. The first defect repeatedly existing in at least two of the shot regions in a second portion of the pattern is set up as a second defect of the pattern. A first reference image displaying the second defect is obtained. The first defect of the shot regions in the first portion corresponding to the second defect is set up as a third defect corresponding to weak points of the pattern. The exposure conditions of the shot region having no weak points are set up as an exposure margin of an exposure process.
Abstract:
A wafer inspecting method including the steps of: multi-scanning a pattern image of a unit inspection region in a normal state and a pattern image of a unit inspection region to be inspected, respectively, using different inspection conditions; comparing the multi-scanned pattern images in the normal state with the multi-scanned pattern images to be inspected obtained by the same inspection conditions, and storing differences between the pattern images as difference images; generating a discrimination difference image by calculating a balance between the stored difference images; and discriminating a defect from noise by using the discrimination difference image.
Abstract:
An exposure mask is provided, which includes: a light blocking opaque area blocking incident light; a translucent area; and a transparent area passing the most of incident light, wherein the translucent area generates the phase differences in the range of about −70° to about +70°.
Abstract:
A method of generating a public long code mask for a broadcast/multicast service and apparatus thereof are provided, by which, upon performing the broadcast/multicast service, an overhead of a base station or a mobile terminal can be reduced and a delay occurring in the base station or mobile terminal can be reduced. In a method of carrying out a broadcast/multicast service provided via a channel of a mobile communication system, the method includes steps of receiving a flow identifier indicative of the broadcast/multicast service; and generating, based on the received flow identifier, a public long code mask for the channel providing the broadcast/multicast service.
Abstract:
The transmission power of a retransmission packet is controlled in the event of a packet retransmission request being sent from a receiving side in a wireless mobile communication system supporting hybrid automatic retransmission request (HARQ) transmission. In a method of controlling transmission power of retransmission packets by a mobile terminal in a wireless mobile communication system supporting hybrid automatic retransmission request (HARQ) transmission, the method includes steps of receiving, from a base station, gain information associated with the sequence of the retransmission packets; determining, using the gain information, transmission power of one of the retransmission packets; and transmitting the retransmission packet with the determined transmission power.
Abstract:
A code combining soft handoff method is disclosed. A mobile terminal measures a strength of respective pilot signals received from a plurality of base stations. If the strength of the received pilot signal is higher than a given value, a base station controller allocates a new code pattern to the corresponding base station to additionally receive a signal from the base station. If the strength of the received pilot signal is lower than the specified value, it drops a signal of the corresponding base station. The mobile terminal and the base station change the code pattern of one of the signals from the two base stations into a code pattern different from the code pattern of the other signal.
Abstract:
The present invention relates to a method for preparing a porous alumina which may be suitably used as a catalyst carrier, an adsorbent, and various surface coating agents and has a boehmite or pseudoboehmite structure having a fine and uniform particle size distribution and a large pore volume.