Apparatus for characterization of photoresist resolution, and method of use
    1.
    发明申请
    Apparatus for characterization of photoresist resolution, and method of use 失效
    用于表征光刻胶分辨率的装置及其使用方法

    公开(公告)号:US20050168717A1

    公开(公告)日:2005-08-04

    申请号:US10769132

    申请日:2004-01-29

    IPC分类号: G03F7/20 G03B27/72

    摘要: An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.

    摘要翻译: 用于光致抗蚀剂材料的有效表征的光学装置包括至少一个具有至少两个光栅的光栅干涉仪,其一起限定光学复合平面。 光学阻挡块阻止任何零级光束传播通过设备。 位于复合平面处的掩模版在其中具有至少一个基准标记。 光刻成像光学工具被定位成使得其输入光学平面与光学复合平面基本一致,并且其输出成像平面与晶片上的光致抗蚀剂基本一致。 该装置写入光阻潜在正弦光栅图案,优选地具有不同的空间频率,以及至少一个基准标记,其图案由标线中的标记确定。 在光致抗蚀剂显影之后,其​​固有空间分辨率可以通过自动化方式确定。

    Apparatus for characterization of photoresist resolution, and method of use

    公开(公告)号:US20060126053A1

    公开(公告)日:2006-06-15

    申请号:US11351578

    申请日:2006-02-09

    IPC分类号: G03B27/62

    摘要: An optical apparatus used for the efficient characterization of photoresist material includes at least one grating interferometer having at least two gratings that together define an optical recombination plane. An optical stop blocks any zeroth order beam from propagating through the apparatus. A reticle positioned at the recombination plane has at least one fiducial marking therein. A lithographic imaging optical tool is positioned so that its input optical plane is substantially coincident with the optical recombination plane and its output imaging plane is substantially coincident with photoresist on a wafer. The apparatus writes in the photoresist latent, sinusoidal grating patterns, preferably of different spatial frequencies, as well as at least one fiducial mark whose pattern is determined by the marking in the reticle. After the photoresist is developed, its intrinsic spatial resolution may be determined by automated means.

    Fast model-based optical proximity correction
    3.
    发明申请
    Fast model-based optical proximity correction 失效
    基于快速模型的光学邻近校正

    公开(公告)号:US20050185159A1

    公开(公告)日:2005-08-25

    申请号:US10783938

    申请日:2004-02-20

    IPC分类号: G03F1/08 G03B27/54 G03F7/20

    摘要: An efficient method and system is provided for computing lithographic images that takes into account vector effects such as lens birefringence, resist stack effects and tailored source polarizations, and may also include blur effects of the mask and the resist. These effects are included by forming a generalized bilinear kernel, which is independent of the mask transmission function, which can then be treated using a decomposition to allow rapid computation of an image that includes such non-scalar effects. Dominant eigenfunctions of the generalized bilinear kernel can be used to pre-compute convolutions with possible polygon sectors. A mask transmission function can then be decomposed into polygon sectors, and weighted pre-images may be formed from a coherent sum of the pre-computed convolutions for the appropriate mask polygon sectors. The image at a point may be formed from the incoherent sum of the weighted pre-images over all of the dominant eigenfunctions of the generalized bilinear kernel. The resulting image can then be used to perform model-based optical proximity correction (MBOPC).

    摘要翻译: 提供了一种有效的方法和系统,用于计算光学图像,其考虑了诸如透镜双折射,抗蚀剂堆叠效应和定制的源极化的矢量效应,并且还可以包括掩模和抗蚀剂的模糊效果。 这些效果包括通过形成广义双线性核,其独立于掩模传递函数,其然后可以使用分解来处理,以允许快速计算包括这种非标量效应的图像。 广义双线性核的主要特征函数可用于预先计算可能的多边形扇区的卷积。 然后,掩模传输功能可以被分解成多边形扇区,并且加权预图像可以由针对适当的屏蔽多边形扇区的预先计算的卷积的相干和形成。 一点上的图像可以由广义双线性核的所有主要特征函数上的加权预图像的非相干和形成。 然后,所得到的图像可用于执行基于模型的光学邻近校正(MBOPC)。

    SYSTEM AND METHOD FOR CELLULAR OPTICAL WAVEFRONT SENSING
    4.
    发明申请
    SYSTEM AND METHOD FOR CELLULAR OPTICAL WAVEFRONT SENSING 审中-公开
    用于细胞光学波前感测的系统和方法

    公开(公告)号:US20120215456A1

    公开(公告)日:2012-08-23

    申请号:US13032652

    申请日:2011-02-23

    IPC分类号: G06F19/00

    摘要: An optical system for non-invasive cytometry of mammalian cells includes a light source, a cell positioner, an optical imager, an optical wavefront sensor and a computer. The light source produces an illuminating beam of spatially coherent radiation. The cell positioner sequentially moves a single cell from a population of multiple cells into a sub-aperture region of the illumination beam whose wavefront is perturbed in response to the physical structure of the single cell. An optical system relays a magnified image of the sub-aperture region containing the cell to an image plane. At the image plane a Shack-Hartmann wavefront sensor is positioned. Within the pupil of the wavefront sensor the local tilts of the wavefront in the sub-aperture region are measured and sent to a computer. Software calculates the Zernike coefficients corresponding to the aberration induced by the structure of each cell. Their Zernike signatures classify the cells into distinct types.

    摘要翻译: 用于哺乳动物细胞非侵入性细胞计数的光学系统包括光源,细胞定位器,光学成像仪,光学波前传感器和计算机。 光源产生空间相干辐射的照明光束。 单元定位器顺序地将单个单元从多个单元的群体移动到响应于单个单元的物理结构扰动波阵面的照明波束的子孔径区域。 光学系统将包含单元的子孔径区域的放大图像中继到像平面。 在图像平面,Shack-Hartmann波前传感器被定位。 在波前传感器的瞳孔内,测量子孔径区域中的波前的局部倾斜并将其发送到计算机。 软件计算对应于由每个单元的结构引起的像差的Zernike系数。 他们的Zernike签名将细胞分类为不同的类型。