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公开(公告)号：US09545697B2
公开(公告)日：2017-01-17
申请号：US12419054
申请日：2009-04-06
CPC分类号： B23Q1/5462 , B23Q9/0014 , Y10T29/49622 , Y10T29/5107 , Y10T408/03 , Y10T408/55 , Y10T408/554
摘要： A method for performing operations on a structure. A moveable platform may be positioned in an area relative to the structure to define a working envelope. The moveable platform may be connected to a tool that may be moved around a plurality of axes within the working envelope using the moveable platform. The tool may be moved to a plurality of locations within the working envelope using the moveable platform. An operation may be performed with the tool through the working envelope at each of the plurality of locations using the moveable platform.
摘要翻译： 一种在结构上执行操作的方法。 可移动平台可以位于相对于结构的区域中以限定工作包络。 可移动平台可以连接到可以使用可移动平台在工作包络内围绕多个轴线移动的工具。 可以使用可移动平台将工具移动到工作外壳内的多个位置。 可以使用该可移动平台通过工具在多个位置中的每个位置处通过工作包络来执行操作。
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公开(公告)号：US09033328B2
公开(公告)日：2015-05-19
申请号：US10698215
申请日：2003-10-31
申请人： John A. Baumann
发明人： John A. Baumann
CPC分类号： B23K37/04 , B23K20/126 , B25B5/003 , B25B5/061 , B25B5/14
摘要： The present invention is directed to apparatus and methods for clamping along a work piece. In one embodiment, a clamping system includes one or more force applying units each including a plunger or force applying member adapted to apply clamping force to the work piece, and one or more coupling units linked with the force applying units forming a chain of force applying units and coupling units. The coupling units may include a lockable pivot adapted to pivot to conform the chain to the surface of the work piece when unlocked, and adapted to be locked when at least one of the plurality of force applying units applies clamping force to the work piece. In another embodiment, a clamping system may include multi-axis pivot units. In a further embodiment, a clamping system may include length adjusting units.
摘要翻译： 本发明涉及沿着工件夹持的装置和方法。 在一个实施例中，夹紧系统包括一个或多个施力单元，每个施加单元包括适于向工件施加夹紧力的柱塞或力施加构件，以及与施加力施加单元相连的一个或多个联接单元， 单元和耦合单元。 联接单元可以包括可锁定的枢轴，其适于在解锁时枢转以使链条与工件的表面一致，并且当多个施力单元中的至少一个向工件施加夹紧力时适于被锁定。 在另一个实施例中，夹紧系统可以包括多轴枢轴单元。 在另一实施例中，夹紧系统可以包括长度调节单元。
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公开(公告)号：US08499433B2
公开(公告)日：2013-08-06
申请号：US11764304
申请日：2007-06-18
申请人： Mike P. Matlack , Kurt A. Burton , John A. Baumann
发明人： Mike P. Matlack , Kurt A. Burton , John A. Baumann
IPC分类号： B23Q7/00
CPC分类号： B23Q3/062 , B23Q3/069 , Y10T29/49828 , Y10T29/49998
摘要： A clamping system can be reconfigured to clamp any of multiple workpieces having differing shapes. The system includes a retention assembly for retaining an inflatable bladder that applies a clamping force to the workpiece. The retention assembly includes a flexible chain of pivotally connected links that can be locked in place to form a rigid assembly that conforms to the shape of the workpiece. The links can be unlocked to allow reconfiguration of the retention assembly into shapes matching other workpieces.
摘要翻译： 可以重新配置夹紧系统以夹紧具有不同形状的多个工件中的任何一个。 该系统包括用于保持向工件施加夹紧力的可膨胀囊的保持组件。 保持组件包括可枢转地连接的链节的柔性链，其可以被锁定就位以形成符合工件形状的刚性组件。 可以解锁链接以允许保持组件重构成与其它工件匹配的形状。
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4.发明授权Apparatus and method for effecting pin-to-shoulder tool separation for a friction stir welding pin tool 有权用于实现摩擦搅拌焊针工具的针对肩工具分离的装置和方法公开(公告)号：US08141859B2
公开(公告)日：2012-03-27
申请号：US11934284
申请日：2007-11-02
IPC分类号： B25B5/00
CPC分类号： B23K20/26 , B23K20/1225 , Y10T29/53983
摘要： An apparatus and method for separating a pin tool from a shoulder tool, after the pin tool and shoulder tool have become welded together during a friction stir welding operation. In one exemplary embodiment a frame is used to support the shoulder tool. A fluid pressure actuating assembly is used for gradually exerting a force on the pin tool while the shoulder tool is held stationary within the frame. The gradually increasing force gradually breaks the weld and separates the pin tool from the shoulder tool without damaging the pin tool.
摘要翻译： 在摩擦搅拌焊接操作中，在销工具和肩部工具已经焊接在一起之后，用于将销工具与肩部工具分离的装置和方法。 在一个示例性实施例中，框架用于支撑肩部工具。 流体压力致动组件用于在肩部工具保持固定在框架内时逐渐施加在销工具上的力。 逐渐增加的力逐渐破坏焊缝，并将销工具与肩部工具分离，而不会损坏销钉工具。
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5.发明申请Method for Manufacturing a Workpiece by Friction Welding to Reduce the Occurrence of Abnormal Grain Growth 审中-公开通过摩擦焊接制造工件以减少发生异常颗粒生长的方法公开(公告)号：US20080230584A1
公开(公告)日：2008-09-25
申请号：US11687907
申请日：2007-03-19
IPC分类号： B23K20/12
CPC分类号： B23K20/1225 , C22F1/04
摘要： A method of manufacturing a workpiece is provided. The method generally includes friction stir welding at least one structural member, selectively removing material from the surfaces of the workpiece at the location of a friction stir weld joint, and thereafter subjecting the workpiece to a solution treat, quench, and age treatment. By selectively removing regions from the surfaces of the workpiece that are defined by nonuniform material properties adapted to nucleate nonuniform grain growth during the solution treat, quench, and age treatment, a subsequent grain growth during the thermal treatment can be at least partially prevented.
摘要翻译： 提供了一种制造工件的方法。 该方法通常包括摩擦搅拌焊接至少一个结构构件，在摩擦搅拌焊接接头的位置选择性地从工件的表面去除材料，然后对工件进行溶液处理，淬火和老化处理。 通过选择性地从工件表面去除区域，其由在溶液处理，淬火和老化处理期间适应成核不均匀晶粒生长的不均匀材料特性限定，可以至少部分地防止在热处理期间随后的晶粒生长。
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6.发明授权Films of catenated phosphorus materials, their preparation and use, and semiconductor and other devices employing them 失效接合磷材料的膜，其制备和使用，以及使用它们的半导体和其他装置
公开(公告)号：US5032472A
公开(公告)日：1991-07-16
申请号：US322688
申请日：1989-03-13
IPC分类号： C01B25/00 , C01B25/02 , C01B25/04 , C01B25/08 , C03C17/22 , C09K21/04 , C23C14/06 , C23C14/24 , C23C14/54 , C30B23/02 , C30B25/02 , H01L21/28 , H01L21/314 , H01L21/3205 , H01L21/363 , H01L23/29 , H01L23/31 , H01L29/24 , H01L29/49 , H01L29/51 , H01L29/812 , H01L31/032 , H01L51/00 , H01L51/05 , H01L51/40
CPC分类号： H01L51/0541 , C01B25/003 , C01B25/02 , C01B25/04 , C01B25/08 , C01B25/081 , C01B25/088 , C03C17/22 , C09K21/04 , C23C14/06 , C23C14/24 , C23C14/541 , C30B23/02 , C30B25/02 , C30B29/10 , H01L21/02422 , H01L21/02521 , H01L21/02576 , H01L21/02581 , H01L21/02631 , H01L21/28167 , H01L21/314 , H01L21/32051 , H01L23/291 , H01L23/3171 , H01L29/24 , H01L29/4908 , H01L29/51 , H01L29/8126 , H01L31/032 , H01L51/0545 , C03C2217/28 , C03C2217/283 , C03C2217/29 , C03C2218/15 , H01L2924/0002 , H01L51/001 , H01L51/0508 , H01L51/0512
摘要： High phosphorus polyphosphides, namely MP.sub.x, where M is an alkali metal (Li, Na, K, Rb, and Cs) or metals mimicking the bonding behavior of an alkali metal, and x=7 to 15 or very much greater than 15 (new forms of phosphorus) are useful semiconductors in their crystalline, polycrystalline and amorphous forms (boules and films). MP.sub.15 appears to have the best properties and KP.sub.15 is the easier to synthesize. P may include other pnictides as well as other trivalent atomic species. Resistance lowering may be accomplished by doping with Ni, Fe, Cr, and other metals having occupied d or f outer electronic levels; or by incorporation of As and other pnictides. Top contacts forming junction devices doped with Ni and employing Ni as a back contact comprise Cu, Al, Mg, Ni, Au, Ag, and Ti. Photovoltaic, photoresistive, and photoluminescent devices are also disclosed. All semiconductor applications appear feasible.These semiconductors belong to the class of polymer forming, trivalent atomic species forming homatomic, covalent bonds having a coordination number slightly less than 3. The predominant local order appears to be all parallel pentagonal tubes in all forms, including amorphous, except for the monoclinic and twisted fiber allotropes of phosphorus.Large crystal monoclinic phosphorus (a birefringent material) in two habits, a twisted fiber phosphorus allotrope and a star shaped fibrous high phosphorus material are also disclosed.Single and multiple source vapor transport, condensed phase, melt quench, flash evaporation, chemical vapor deposition, and molecular flow deposition may be employed in synthesizing these materials. Vapor transport may be employed to purify phosphorus.
摘要翻译： 高磷多磷化物，即MPx，其中M是碱金属（Li，Na，K，Rb和Cs）或模拟碱金属键合行为的金属，x = 7至15或非常大于15（新 磷的形式）是其晶体，多晶和无定形形式（晶粒和膜）中的有用的半导体。 MP15似乎具有最好的性能，KP15更容易合成。 P可以包括其他三价物以及其它三价原子物种。 电阻降低可以通过掺杂Ni，Fe，Cr和其他具有d或f外电子水平的金属来实现; 或通过并入As和其他pnictides。 掺杂有Ni并且以Ni作为背接触的结合装置的顶部触点包括Cu，Al，Mg，Ni，Au，Ag和Ti。 还公开了光电，光致抗蚀剂和光致发光器件。 所有半导体应用似乎都是可行的。 这些半导体属于聚合物形成类型，三价原子物质形成具有略小于3的配位数的同原子，共价键。主要的局部顺序似乎是所有形式的所有平行五边形管，包括无定形，除了单斜晶和 扭曲的纤维同素异形体的磷。 还公开了两种习惯中的大晶体单斜晶磷（双折射材料），扭曲纤维磷同素异形体和星形纤维状高磷材料。 可以在合成这些材料时采用单源和多源蒸气输送，冷凝相，熔融淬火，闪蒸，化学气相沉积和分子流沉积。 可以使用蒸气传输来净化磷。
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公开(公告)号：US4822581A
公开(公告)日：1989-04-18
申请号：US677845
申请日：1984-12-04
IPC分类号： C03C17/22 , H01L29/24 , H01L31/032 , H01L51/05 , C01B25/08
CPC分类号： H01L29/24 , C03C17/22 , H01L31/032 , C03C2217/28 , C03C2217/283 , C03C2217/29 , C03C2218/15 , H01L51/0508 , H01L51/0512
摘要： High phosphorus polyphosphides, namely MP.sub.x, where M is an alkali metal (Li, Na, K, Rb, and Cs) or metals mimicking the bonding behavior of an alkali metal, and x=7 to 15 or very much greater than 15 (new forms of phosphorus) are useful semiconducutors in their crystalline, polycrystalline and amorphous forms (boules and films). MP.sub.15 appears to have the best properties and KP.sub.15 is the easier to synthesize. P may include other pnictides as well as other trivalent atomic species. Resistance lowering may be accomplished by doping with Ni, Fe, Cr, and other metals having occupied d or f outer electronic levels; or by incorporation of As and other pnictides. Top contacts forming junction devices doped with Ni and employing Ni as a back contact comprise Cu, Al, Mg, Ni, Au, Ag, and Ti. Photovoltaic, photoresistive, and photoluminescent devices are also disclosed. All semiconductor applications appear feasible.These semiconductors belong to the class of polymer forming, trivalent atomic species forming homatomic, covalent bonds having a coordination number slightly less than 3. The predominant local order appears to be all parallel pentagonal tubes in all forms, including amorphous, except for the monoclinic and twisted fiber allotropes of phosphorus.Large crystal monoclinic phosphorus (a birefringent material) in two habits, a twisted fiber phosphorus allotrope and a star shaped fibrous high phosphorus material are also disclosed.Single and multiple source vapor transport, condensed phase, melt quench, flash evaporation, chemical vapor deposition, and molecular flow deposition may be employed in synthesizing these materials. Vapor transport may be employed to purify phosphorus.The materials may be employed as protective coatings, optical coatings, fire retardants, fillers and reinforcing fillers for plastics and glasses, antireflection coatings for infrared optics, infrated transmitting windows, and optical rotators.
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公开(公告)号：US4818636A
公开(公告)日：1989-04-04
申请号：US680367
申请日：1984-12-11
IPC分类号： C01B25/00 , C01B25/02 , C01B25/04 , C01B25/08 , C03C17/22 , C09K21/04 , C23C14/06 , C23C14/54 , C30B23/02 , C30B25/02 , H01L29/24 , H01L31/032 , H01L51/05 , B32B9/00 , B32B13/00
CPC分类号： H01L31/032 , C01B25/003 , C01B25/02 , C01B25/04 , C01B25/08 , C01B25/081 , C01B25/088 , C03C17/22 , C09K21/04 , C23C14/06 , C23C14/541 , C30B23/02 , C30B25/02 , C30B29/10 , H01L29/24 , C03C2217/28 , C03C2217/283 , C03C2217/29 , C03C2218/15 , H01L51/0508 , H01L51/0512
摘要： High phosphorus polyphosphides, namely MP.sub.x, where M is an alkali metal (Li, Na, K, Rb, and Cs) or metals mimicking the bonding behavior of an alkali metal, and x=7 to 15 or very much greater than 15 (new forms of phosphorus) are useful semiconductors in their crystalline, polycrystalline and amorphous forms (boules and films). MP.sub.15 appears to have the best properties and KP.sub.15 is the easier to synthesize. P may include other pnictides as well as other trivalent atomic species. Resistance lowering may be accomplished by doping with Ni, Fe, Cr, and other metals having occupied d or f outer electronic levels; or by incorporation of As and other pnictides. Top contacts forming junction devices doped with Ni and employing Ni as a back contact comprise Cu, Al, Mg, Ni, Au, Ag, and Ti. Photovoltaic, photoresistive, and photoluminescent devices are also disclosed. All semiconductor applications appear feasible.These semiconductors belong to the class of polymer forming, trivalent atomic species forming homatomic, covalent bonds having a coordination number slightly less than 3. The predominant local order appears to be all parallel pentagonal tubes in all forms, including amorphous, except for the monoclinic and twisted fiber allotropes of phosphorus.Large crystal monoclinic phosphorus (a birefringent material) in two habits, a twisted fiber phosphorus allotrope and a star shaped fibrous high phosphorus material are also disclosed.Single and multiple source vapor transport, condensed phase, melt quench, flash evaporation, chemical vapor deposition, and molecular flow deposition may be employed in synthesizing these materials. Vapor transport may be employed to purify phosphorus.The materials may be employed as protective coatings, optical coatings, fire retardants, fillers and reinforcing fillers for plastics and glasses, antireflection coatings for infrared optics, infrared transmitting windows, and optical rotators.
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公开(公告)号：US07774910B2
公开(公告)日：2010-08-17
申请号：US11771188
申请日：2007-06-29
申请人： John A. Baumann , Herb Bommer , Kurt A. Burton , Mike P. Matlack
发明人： John A. Baumann , Herb Bommer , Kurt A. Burton , Mike P. Matlack
IPC分类号： B25B5/16
CPC分类号： B23K20/126 , B23Q3/16 , Y10T29/53913 , Y10T29/53961 , Y10T29/53978
摘要： Apparatus for performing operations on a workpiece includes a clamping assembly mounted on a tool support for movement along at least one axis independent of the axes along which the tool moves. The clamping assembly includes clamping devices for applying clamping pressure to the workpiece, and a rotary drive mounted on the tool support for rotating the clamping devices around the independent axis. The clamping devices include clamping packs having a clamping roller mounted on a pneumatically driven slide for applying a programmed amount of clamping pressure to the workpiece.
摘要翻译： 用于在工件上执行操作的装置包括安装在工具支架上的夹紧组件，用于沿着至少一个轴线移动，而不受工具移动所沿的轴线的作用。 夹紧组件包括用于向工件施加夹紧压力的夹紧装置和安装在工具支架上的旋转驱动装置，用于围绕独立轴线旋转夹紧装置。 夹紧装置包括夹紧组件，其具有安装在气动驱动的滑动件上的夹紧辊，用于向工件施加编程的夹紧压力。
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公开(公告)号：US4746500A
公开(公告)日：1988-05-24
申请号：US886567
申请日：1986-07-16
CPC分类号： B01D8/00 , B01J2219/0894
摘要： A fore line trap is located before the forepump in a vacuum system. The trap utilizes a cracker, which may be a heated filament or a plasma, and cold walls. The cracker cracks pnictide gas species such as P.sub.4 into other species such as P.sub.2 which have a higher sticking co-efficient. The pnictides are deposited on the cold walls. The cold walls preferably comprise a sleeve which may be removed from the trap and replaced by a clean one.
摘要翻译： 前线陷阱位于真空系统中的前泵前。 该捕集器采用裂化器，其可以是加热的长丝或等离子体，以及冷壁。 裂解器将P4等气体物质分解成其他物种，如P2，具有较高的粘附效率。 ict ides存放在寒冷的墙壁上。 冷壁优选地包括可从捕集器移除并由干净的壁替代的套筒。
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