公开(公告)号：US07974136B2

公开(公告)日：2011-07-05

申请号：US12645337

申请日：2009-12-22

Applicant: Geeng-Chuan Michael Chern ,  Ben Sheen ,  Jonathan Pabustan ,  Der-Tsyr Fan ,  Yaw Wen Hu ,  Prateep Tuntasood

Inventor： Geeng-Chuan Michael Chern ,  Ben Sheen ,  Jonathan Pabustan ,  Der-Tsyr Fan ,  Yaw Wen Hu ,  Prateep Tuntasood

IPC: G11C16/04

CPC classification number: G11C16/16

Abstract: A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.

Abstract translation: 闪存单元是具有第一导电类型的衬底的类型，在第一端具有第二导电类型的第一区域，在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ，在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对，其中浮置栅极位于沟道区域的部分上方并与其绝缘，并且每个控制栅极在浮动栅极上并与其隔离。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极，在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中，将第一正电压的脉冲施加到交替擦除栅极（“第一交替栅极”）。 此外，施加接地电压以擦除除第一交流栅极（“第二交替栅极”）之外的栅极。 在擦除闪存单元的第二种方法中，将第一正电压的脉冲施加到第一交流栅极，并且向第二交替栅极和所有控制栅极施加负电压。

公开(公告)号：US07701248B2

公开(公告)日：2010-04-20

申请号：US12100406

申请日：2008-04-10

Applicant: Kai Man Yue ,  Bomy Chen ,  Geeng Chuan Michael Chern ,  Tsung-Lu Syu

Inventor： Kai Man Yue ,  Bomy Chen ,  Geeng Chuan Michael Chern ,  Tsung-Lu Syu

IPC: G06F7/38 ,  H03K19/173 ,  G11C7/00

CPC classification number: H03K17/693 ,  G11C16/0433 ,  G11C16/26

Abstract: The present invention is a storage element for controlling a logic circuit and a logic device having a plurality of storage elements. The storage element has a first and a second non-volatile memory cells connected in series at an output node. Each of the first and second non-volatile memory cells is for storing a state opposite to the other. A demultiplexer has an input, a switched input and two outputs. The output node is connected to the input of the demultiplexer. One of the outputs is used to control the logic circuit. The other output is connected to a bit line which is connected to a sense amplifier. Finally, the switched input receives a switch signal and outputs the signal from the output node to either the one output or the other output.

Abstract translation: 本发明是用于控制逻辑电路的存储元件和具有多个存储元件的逻辑器件。 存储元件具有在输出节点串联连接的第一和第二非易失性存储器单元。 第一和第二非易失性存储单元中的每一个用于存储与另一个相反的状态。 解复用器具有输入，开关输入和两个输出。 输出节点连接到解复用器的输入端。 其中一个输出用于控制逻辑电路。 另一个输出连接到连接到读出放大器的位线。 最后，切换输入接收开关信号，并将输出节点的信号输出到一个输出或另一个输出。

公开(公告)号：US20090201744A1

公开(公告)日：2009-08-13

申请号：US12027654

申请日：2008-02-07

Applicant: Geeng-Chuan Michael Chern ,  Ben Sheen ,  Jonathan Pabustan ,  Prateep Tuntasood ,  Der-Tsyr Fan ,  Yaw Wen Hu

Inventor： Geeng-Chuan Michael Chern ,  Ben Sheen ,  Jonathan Pabustan ,  Prateep Tuntasood ,  Der-Tsyr Fan ,  Yaw Wen Hu

IPC: G11C16/16

CPC classification number: G11C16/16

Abstract: A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.

Abstract translation: 闪存单元是具有第一导电类型的衬底的类型，在第一端具有第二导电类型的第一区域，在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ，在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对，其中浮置栅极位于沟道区域的部分上方并与其绝缘，并且每个控制栅极在浮动栅极上并与其隔离。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极，在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中，将第一正电压的脉冲施加到交替擦除栅极（“第一交替栅极”）。 此外，施加接地电压以擦除除第一交流栅极（“第二交替栅极”）之外的栅极。 在擦除闪存单元的第二种方法中，将第一正电压的脉冲施加到第一交流栅极，并且向第二交替栅极和所有控制栅极施加负电压。

公开(公告)号：US20100157687A1

公开(公告)日：2010-06-24

申请号：US12645337

申请日：2009-12-22

Applicant: Geeng-Chuan Michael Chern ,  Ben Sheen ,  Jonathan Pabustan ,  Prateep Tuntasood ,  Der-Tsyr Fan ,  Yaw Wen Hu

Inventor： Geeng-Chuan Michael Chern ,  Ben Sheen ,  Jonathan Pabustan ,  Prateep Tuntasood ,  Der-Tsyr Fan ,  Yaw Wen Hu

IPC: G11C16/06 ,  G11C16/16

CPC classification number: G11C16/16

Abstract: A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.

Abstract translation: 闪存单元是具有第一导电类型的衬底的类型，在第一端具有第二导电类型的第一区域，在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ，在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对，其中浮置栅极位于沟道区域的部分上方并与其绝缘，并且每个控制栅极在浮动栅极上并与之绝缘。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极，在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中，将第一正电压的脉冲施加到交替擦除栅极（“第一交替栅极”）。 此外，施加接地电压以擦除除第一交流栅极（“第二交替栅极”）之外的栅极。 在擦除闪存单元的第二种方法中，将第一正电压的脉冲施加到第一交流栅极，并且向第二交替栅极和所有控制栅极施加负电压。

公开(公告)号：US07668013B2

公开(公告)日：2010-02-23

申请号：US12027654

申请日：2008-02-07

Applicant: Geeng-Chuan Michael Chern ,  Ben Sheen ,  Jonathan Pabustan ,  Prateep Tuntasood ,  Der-Tsyr Fan ,  Yaw Wen Hu

Inventor： Geeng-Chuan Michael Chern ,  Ben Sheen ,  Jonathan Pabustan ,  Prateep Tuntasood ,  Der-Tsyr Fan ,  Yaw Wen Hu

IPC: G11C16/04

CPC classification number: G11C16/16

Abstract: A flash memory cell is of the type having a substrate of a first conductivity type having a first region of a second conductivity type at a first end, and a second region of the second conductivity type at a second end, spaced apart from the first end, with a channel region between the first end and the second end. The flash memory cell has a plurality of stacked pairs of floating gates and control gates with the floating gates positioned over portions of the channel region and are insulated therefrom, and each control gate over a floating gate and insulated therefrom. The flash memory cell further has a plurality of erase gates over the channel region which are insulated therefrom, with an erase gate between each pair of stacked pair of floating gate and control gate. In a method of erasing the flash memory cell, a pulse of a first positive voltage is applied to alternating erase gates (“first alternating gates”). In addition, a ground voltage is applied to erase gates other than the first alternating gates (“second alternating gates”). In a second method to erase the flash memory cell, a pulse of a first positive voltage is applied to the first alternating gates and a negative voltage is applied to the second alternating gates and to all control gates.

Abstract translation: 闪存单元是具有第一导电类型的衬底的类型，在第一端具有第二导电类型的第一区域，在第二端处具有与第一端部间隔开的第二导电类型的第二区域 ，在第一端和第二端之间具有通道区域。 闪存单元具有多个堆叠的浮置栅极和控制栅极对，其中浮置栅极位于沟道区域的部分上方并与其绝缘，并且每个控制栅极在浮动栅极上并与其隔离。 闪速存储单元还在通道区域上具有与其绝缘的多个擦除栅极，在每对堆叠的一对浮置栅极和控制栅极之间具有擦除栅极。 在擦除闪存单元的方法中，将第一正电压的脉冲施加到交替擦除栅极（“第一交替栅极”）。 此外，施加接地电压以擦除除第一交流栅极（“第二交替栅极”）之外的栅极。 在擦除闪存单元的第二种方法中，将第一正电压的脉冲施加到第一交流栅极，并且向第二交替栅极和所有控制栅极施加负电压。

公开(公告)号：US06706592B2

公开(公告)日：2004-03-16

申请号：US10146569

申请日：2002-05-14

Applicant: Geeng-Chuan Michael Chern ,  Chien-Sheng Su

Inventor： Geeng-Chuan Michael Chern ,  Chien-Sheng Su

IPC: H01L21336

CPC classification number: H01L27/11521 ,  H01L27/115 ,  H01L29/66545

Abstract: A self aligned method of forming a semiconductor memory array of floating gate memory cells in a semiconductor substrate having a plurality of spaced apart isolation regions and active regions on the substrate substantially parallel to one another in the column direction. Floating gates are formed in trenches using a first layer of conducting material at the bottom of the trenches, and a second layer of conducting material along sidewalls of the trenches. An etch process is used to etch away portions of the first and second layers of the conductive material to form floating gate blocks of the conductive material having sloping portions that terminate in pointed edges formed along the trench sidewalls. The sharpness of the pointed edges are enhanced by the presence of the conductive material disposed along the trench sidewalls.

Abstract translation: 一种在半导体衬底中形成浮置栅极存储单元的半导体存储器阵列的自对准方法，该半导体衬底在衬底上具有多个间隔开的隔离区域和在衬底上彼此基本上平行的有源区域。 在沟槽底部使用第一层导电材料形成浮动栅极，并沿着沟槽的侧壁形成第二层导电材料。 蚀刻工艺用于蚀刻掉导电材料的第一和第二层的部分，以形成具有沿着沟槽侧壁形成的尖锐边缘终止的倾斜部分的导电材料的浮动栅极块。 通过沿着沟槽侧壁设置的导电材料的存在来增强尖锐边缘的锐度。

公开(公告)号：US20090256590A1

公开(公告)日：2009-10-15

申请号：US12100406

申请日：2008-04-10

Applicant: Kai Man Yue ,  Bomy Chen ,  Geeng Chuan Michael Chern ,  Tsung-Lu Syu

Inventor： Kai Man Yue ,  Bomy Chen ,  Geeng Chuan Michael Chern ,  Tsung-Lu Syu

IPC: H03K19/0944 ,  G11C16/04

CPC classification number: H03K17/693 ,  G11C16/0433 ,  G11C16/26

Abstract: The present invention is a storage element for controlling a logic circuit and a logic device having a plurality of storage elements. The storage element has a first and a second non-volatile memory cells connected in series at an output node Each of the first and second non-volatile memory cells is for storing a state opposite to the other. A multiplexer has an input, a switched input and two outputs. The output node is connected to the input of the multiplexer. One of the outputs is used to control the logic circuit. The other output is connected to a bit line which is connected to a sense amplifier. Finally, the switched input receives a switch signal and outputs the signal from the output node to either the one output or the other output.

Abstract translation: 本发明是用于控制逻辑电路的存储元件和具有多个存储元件的逻辑器件。 存储元件具有在输出节点串联连接的第一和第二非易失性存储器单元。第一和第二非易失性存储器单元中的每一个用于存储与另一个相反的状态。 复用器具有输入，开关输入和两个输出。 输出节点连接到多路复用器的输入。 其中一个输出用于控制逻辑电路。 另一个输出连接到连接到读出放大器的位线。 最后，切换输入接收开关信号，并将输出节点的信号输出到一个输出或另一个输出。