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    Generation and use of high power 213 nm and 266 nm laser radiation and tunable 210-400 nm laser radiation with BBO crystal matrix array
    1.
    发明授权
    Generation and use of high power 213 nm and 266 nm laser radiation and tunable 210-400 nm laser radiation with BBO crystal matrix array 失效
    使用BBO晶体矩阵阵列生成和使用大功率213 nm和266 nm激光辐射和可调谐的210-400 nm激光辐射

    公开(公告)号：US6078600A

    公开(公告)日：2000-06-20

    申请号：US45468

    申请日：1998-03-20

    申请人： Dieter M. Gruen

    发明人： Dieter M. Gruen

    IPC分类号： G02F1/35 ,  G02F1/39 ,  H01S3/10

    CPC分类号： G02F1/353 ,  G02F1/3501 ,  G02F1/39 ,  G02F2001/3546

    摘要： A 213 nm laser beam is capable of single photon ablative photodecomposition for the removal of a polymer or biological material substrate. Breaking the molecular bonds and displacing the molecules away from the substrate in a very short time period results in most of the laser photon energy being carried away by the displaced molecules, thus minimizing thermal damage to the substrate. The incident laser beam may be unfocussed and is preferably produced by quintupling the 1064 nm radiation from a Nd:YAG solid state laser, i.e., at 213 nm. In one application, the 213 nm laser beam is expanded in cross section and directed through a plurality of small beta barium borate (BBO) crystals for increasing the energy per photon of the laser radiation directed onto the substrate. The BBO crystals are arranged in a crystal matrix array to provide a large laser beam transmission area capable of accommodating high energy laser radiation without damaging the BBO crystals. The BBO crystal matrix array may also be used with 266 nm laser radiation for carrying out single or multi photon ablative photodecomposition. The BBO crystal matrix array may also be used in an optical parametric oscillator mode to generate high power tunable laser radiation in the range of 210-400 nm.

    摘要翻译： 213nm激光束能够用于去除聚合物或生物材料基底的单光子烧蚀光分解。 在非常短的时间内打破分子键并将分子置换离开基底导致大部分激光光子能被被置换的分子带走，从而最小化对基底的热损伤。 入射激光束可能不被聚焦，并且优选地通过将来自Nd：YAG固态激光器的1064nm辐射，即在213nm处的五倍产生。 在一个应用中，213nm激光束在横截面中扩展并且引导通过多个小的硼酸钡（BBO）晶体，以增加定向到衬底上的激光辐射的每个光子的能量。 BBO晶体被布置在晶体矩阵阵列中以提供能够容纳高能量激光辐射而不损坏BBO晶体的大的激光束透射区域。 BBO晶体矩阵阵列还可以与266nm激光辐射一起使用以进行单光子或多光子消融光分解。 BBO晶体矩阵阵列也可以用于光参量振荡器模式以产生在210-400nm范围内的高功率可调谐激光辐射。

    Photo ion spectrometer
    7.
    发明授权
    Photo ion spectrometer 失效
    光离子光谱仪

    公开(公告)号：US4889987A

    公开(公告)日：1989-12-26

    申请号：US14332

    申请日：1987-02-13

    申请人： Dieter M. Gruen ,  Charles E. Young ,  Michael J. Pellin

    发明人： Dieter M. Gruen ,  Charles E. Young ,  Michael J. Pellin

    IPC分类号： H01J49/02 ,  H01J49/06 ,  H01J49/14 ,  H01J49/16 ,  H01J49/28

    CPC分类号： H01J49/161 ,  H01J49/022 ,  H01J49/061 ,  H01J49/142 ,  H01J49/282 ,  H01J49/484

    摘要： A charged particle spectrometer for performing ultrasensitive quantitative analysis of selected atomic components removed from a sample. Significant improvements in performing energy and angular refocusing spectroscopy are accomplished by means of a two dimensional structure for generating predetermined electromagnetic field boundary conditions. Both resonance and non-resonance ionization of selected neutral atomic components allow accumulation of increased chemical information. A multiplexed operation between a SIMS mode and a neutral atomic component ionization mode with EARTOF analysis enables comparison of chemical information from secondary ions and neutral atomic components removed from the sample. An electronic system is described for switching high level signals, such as SIMS signals, directly to a transient recorder and through a charge amplifier to the transient recorder for a low level signal pulse counting mode, such as for a neutral atomic component ionization mode.

    摘要翻译： 一种带电粒子光谱仪，用于对从样品中除去的选定的原子成分进行超敏感定量分析。 通过用于产生预定电磁场边界条件的二维结构来实现执行能量和角度重新聚焦光谱的显着改进。 所选择的中性原子组分的共振和非共振电离都允许累积增加的化学信息。 通过EARTOF分析，SIMS模式和中性原子成分离子化模式之间的多路复用操作能够比较从样品中除去的二次离子和中性原子成分的化学信息。 描述了一种电子系统，用于将高电平信号（例如SIMS信号）直接切换到瞬态记录器，并通过电荷放大器切换到瞬态记录器，用于低电平信号脉冲计数模式，例如用于中性原子分量电离模式。

    Photo ion spectrometer
    8.
    发明授权
    Photo ion spectrometer 失效

    公开(公告)号：US4864130A

    公开(公告)日：1989-09-05

    申请号：US870437

    申请日：1986-06-04

    申请人： Dieter M. Gruen ,  Charles E. Young ,  Michael J. Pellin

    发明人： Dieter M. Gruen ,  Charles E. Young ,  Michael J. Pellin

    IPC分类号： H01J37/08 ,  G01Q30/02 ,  H01J49/06 ,  H01J49/10 ,  H01J49/14 ,  H01J49/16 ,  H01J49/26 ,  H01J49/28

    CPC分类号： H01J49/484 ,  H01J49/061 ,  H01J49/142 ,  H01J49/161 ,  H01J49/282

    摘要： A method and apparatus for extracting for quantitative analysis ions of selected atomic components of a sample. A lens system is configured to provide a slowly diminishing field region for a volume containing the selected atomic components, enabling accurate energy analysis of ions generated in the slowly diminishing field region. The lens system also enables focusing on a sample of a charged particle beam, such as an ion beam, along a path length perpendicular to the sample and extraction of the charged particles along a path length also perpendicular to the sample. Improvement of signal to noise ratio is achieved by laser excitation of ions to selected autoionization states before carrying out quantitative analysis. Accurate energy analysis of energetic charged particles is assured by using a preselected resistive thick film configuration disposed on an insulator substrate for generating predetermined electric field boundary conditions to achieve for analysis the required electric field potential. The spectrometer also is applicable in the fields of SIMS, ISS and electron spectroscopy.

    Field emission from bias-grown diamond thin films in a microwave plasma
    10.
    发明授权
    Field emission from bias-grown diamond thin films in a microwave plasma 失效
    微波等离子体中偏置生长金刚石薄膜的场发射

    公开(公告)号：US06447851B1

    公开(公告)日：2002-09-10

    申请号：US09352063

    申请日：1999-07-14

    申请人： Dieter M. Gruen ,  Alan R. Krauss ,  Ming Q. Ding ,  Orlando Auciello

    发明人： Dieter M. Gruen ,  Alan R. Krauss ,  Ming Q. Ding ,  Orlando Auciello

    IPC分类号： H05H124

    CPC分类号： C23C16/274 ,  C23C16/26 ,  C23C16/279 ,  H01J9/025 ,  Y10S427/104

    摘要： A method of producing diamond or diamond like films in which a negative bias is established on a substrate with an electrically conductive surface in a microwave plasma chemical vapor deposition system. The atmosphere that is subjected to microwave energy includes a source of carbon, nitrogen and hydrogen. The negative bias is maintained on the substrate through both the nucleation and growth phase of the film until the film is continuous. Biases between −100V and −200 are preferred. Carbon sources may be one or more of CH4, C2H2 other hydrocarbons and fullerenes.

    摘要翻译： 一种制造金刚石或类金刚石膜的方法，其中在微波等离子体化学气相沉积系统中在具有导电表面的基板上建立负偏压。 经受微波能量的气氛包括碳源，氮气和氢气。 通过膜的成核和生长阶段，在衬底上保持负偏压，直到膜是连续的。 -100V至-200之间的偏压是优选的。 碳源可以是CH4，C2H2其他烃和富勒烯中的一种或多种。