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    DEVICE FOR POWDER METERING FOR CHEMICAL PRODUCTION PROCESSES UNDER CLEAN-ROOM CONDITIONS, USE THEREOF AND METERED ADDITION METHOD
    2.
    发明申请
    DEVICE FOR POWDER METERING FOR CHEMICAL PRODUCTION PROCESSES UNDER CLEAN-ROOM CONDITIONS, USE THEREOF AND METERED ADDITION METHOD 审中-公开

    公开(公告)号：US20190025107A1

    公开(公告)日：2019-01-24

    申请号：US16078998

    申请日：2017-03-14

    申请人： ANCOSYS GMBH

    发明人： Juerg Stahl ,  Irene Popova ,  Christian Rueckl

    IPC分类号： G01F11/28 ,  B01J8/00

    摘要： Device for metering powder, in particular in clean-rooms, which includes a vessel containing powder and a sealing head with a septum for the vessel, wherein the sealing head is connectable powder-tight with the vessel and the septum powder-tight with the sealing head and the device further includes a vessel holder, which serves to hold the sealing head of the vessel, and the vessel with its opening points downwards, so that the powder can flow out of the vessel, wherein a gap is provided between the sealing head and a holding bowl of the vessel holder, in which a gas flow between the holding bowl and the sealing head can be created. The invention also relates to a use of the device and a metered addition method.

    USE OF A REFERENCE SYSTEM FOR ELECTROCHEMICAL ANALYSIS AND DEPOSITION METHODS
    3.
    发明申请
    USE OF A REFERENCE SYSTEM FOR ELECTROCHEMICAL ANALYSIS AND DEPOSITION METHODS 审中-公开
    电化学分析和沉积方法的参考系统的使用

    公开(公告)号：US20150212041A1

    公开(公告)日：2015-07-30

    申请号：US14417539

    申请日：2013-07-10

    申请人： ancosys GmbH

    发明人： Juerg Stahl

    IPC分类号： G01N27/416 ,  G01N27/30

    CPC分类号： G01N27/4165 ,  G01N27/301

    摘要： Use of a reference system for electrochemical analysis and deposition methods, in which analysis or deposition methods at least one operating electrode (21), a mating electrode (23) and a reference electrode (22) are used, wherein the reference electrode (22) is a pH electrode (10) that has an impermeable membrane (12), and an input amplifier V1 (16) for the pH electrode (10) having a high input impedance is provided, and supplies the signal from the pH electrode (10) to the input amplifier V1 (16) via a cable, and a further amplifier V2 (17) is provided, which is used to compensate for the disadvantageous effects of the screening and of the cable and of the test setup, or the amplifier V1 (16) is integrated in the pH electrode (10) as an impedance converter, or the amplifier V1 (16) is integrated in the connector of the pH electrode as an impedance converter.

    摘要翻译： 使用用于电化学分析和沉积方法的参考系统，其中使用至少一个操作电极（21），配合电极（23）和参考电极（22）进行分析或沉积方法，其中参考电极（22） 是具有不渗透膜（12）的pH电极（10），并且设置具有高输入阻抗的用于pH电极（10）的输入放大器V1（16），并且提供来自pH电极（10）的信号， 通过电缆连接到输入放大器V1（16），并提供另外的放大器V2（17），其用于补偿屏蔽和电缆以及测试装置或放大器V1（ 16）作为阻抗转换器集成在pH电极（10）中，或者放大器V1（16）集成在pH电极的连接器中作为阻抗转换器。

    Electrodeposition system and method incorporating an anode having a back side capacitive element
    7.
    发明授权
    Electrodeposition system and method incorporating an anode having a back side capacitive element 有权

    公开(公告)号：US10156019B2

    公开(公告)日：2018-12-18

    申请号：US15802619

    申请日：2017-11-03

    申请人： International Business Machines Corporation ,  Ancosys GmbH

    发明人： Charles L. Arvin ,  Jürg Stahl

    IPC分类号： C25D3/56 ,  C25D21/00 ,  C23F13/00 ,  C25D3/30 ,  C25D3/46 ,  C25D21/12 ,  C25D3/60 ,  C25D3/64 ,  C25D17/10

    摘要： Disclosed are an electrodeposition system and method with an anode assembly comprising a capacitor comprising a first conductive plate (i.e., an anode) with a frontside having a surface exposed to a plating solution, a second conductive plate on a backside of the first conductive plate, and a dielectric layer between the two conductive plates. During a non-plating mode, a power source, having positive and negative terminals connected to the first and second conductive plates, respectively, is turned on, thereby polarizing the first conductive plate (i.e., the anode) relative to the second conductive plate to prevent degradation of the anode and/or plating solution. During an active plating mode, another power source, having positive and negative terminals connected to the first conductive plate (i.e., the anode) and a cathode, respectively, is turned on, thereby polarizing the anode relative to the cathode in order to deposit a plated layer on a workpiece.

    IN-SITU FINGERPRINTING FOR ELECTROCHEMICAL DEPOSITION AND/OR ELECTROCHEMICAL ETCHING
    10.
    发明公开
    IN-SITU FINGERPRINTING FOR ELECTROCHEMICAL DEPOSITION AND/OR ELECTROCHEMICAL ETCHING 审中-公开

    公开(公告)号：US20240044039A1

    公开(公告)日：2024-02-08

    申请号：US18346769

    申请日：2023-07-03

    申请人： ANCOSYS GMBH

    发明人： Juerg Stahl ,  Norbert Schroeder ,  Fred Richter

    IPC分类号： C25D21/12 ,  C25D7/12 ,  C25D7/00 ,  C23C18/16 ,  G01N27/416 ,  C25F7/00 ,  C25F3/02

    CPC分类号： C25D21/12 ,  C25D7/12 ,  C25D7/00 ,  C23C18/1675 ,  G01N27/4166 ,  C25F7/00 ,  C25F3/02

    摘要： Electrochemical analysis method and system for monitoring and controlling the quality of electrochemical deposition and/or plating processes. The method uses a fingerprinting analysis method of an output signal to indicate whether the chemistry and/or process is operating in the normally expected range and utilizes one or more substrates as working electrode(s) and a) whereby the potential between the one or more working electrodes and one or more reference electrodes is analyzed to provide an output signal fingerprint which is represented as potential difference as a function of time or b) the input power of a process power supply to provide input energy in the form of current and/or potential between the working electrode(s) and a counter-electrode whereby the method utilizes the potential between the one or more working electrode(s) and at least one of: one or more reference electrodes; or one or more counter-electrodes; to provide an output signal fingerprint.