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公开(公告)号:US12237174B2
公开(公告)日:2025-02-25
申请号:US17642356
申请日:2021-04-22
Applicant: Hitachi High-Tech Corporation
Inventor: Kazunori Shinoda , Hirotaka Hamamura , Kenji Maeda , Kenetsu Yokogawa , Kenji Ishikawa , Masaru Hori
IPC: H01L21/311 , H01L21/02 , H01L21/3065
Abstract: Provided is an etching technique providing higher uniformity of etching amount and a higher yield of etching processing. An etching method for etching a film layer as a processing object containing nitride of transition metal, the film layer being disposed on a surface of a wafer, includes a step of supplying reactive particles containing fluorine and hydrogen but containing no oxygen to a surface of the film layer to form a reaction layer on the surface of the film layer, and a step of eliminating the reaction layer by heating the film layer.
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公开(公告)号:US12237145B2
公开(公告)日:2025-02-25
申请号:US17791013
申请日:2020-01-22
Applicant: HITACHI HIGH-TECH CORPORATION
Inventor: Atsuko Shintani , Makoto Suzuki , Hiroki Kawada
IPC: H01J37/22 , G01N23/2251 , H01J37/147 , H01J37/244
Abstract: System and method for preventing blurring of an image in a scanning direction caused by a signal processing delay of a detector. of a charged particle beam device. The charged particle beam device is configured to calibrate first image data generated based on a detection signal output from a detector when the sample is two-dimensionally scanned with the charged particle beam, to generate second image data, in which the the second image data is generated using n first signal profiles each of which corresponds to a signal strength distribution in a first direction and which are extracted from the first image data, and a power spectral density P(f) (f: spatial frequency) of a window function corresponding to the signal processing delay of the detector.
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公开(公告)号:US12236625B2
公开(公告)日:2025-02-25
申请号:US17850321
申请日:2022-06-27
Applicant: THE TRUSTEES OF PRINCETON UNIVERSITY
Inventor: Seung-Hwan Baek , Felix Heide
Abstract: The present disclosure relates generally to image processing, and more particularly, toward techniques for structured illumination and reconstruction of three-dimensional (3D) images. Disclosed herein is a method to jointly learn structured illumination and reconstruction, parameterized by a diffractive optical element and a neural network in an end-to-end fashion. The disclosed approach has a differentiable image formation model for active stereo, relying on both wave and geometric optics, and a trinocular reconstruction network. The jointly optimized pattern, dubbed “Polka Lines,” together with the reconstruction network, makes accurate active-stereo depth estimates across imaging conditions. The disclosed method is validated in simulation and used with an experimental prototype, and several variants of the Polka Lines patterns specialized to the illumination conditions are demonstrated.
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公开(公告)号:US12224157B2
公开(公告)日:2025-02-11
申请号:US17763320
申请日:2021-03-25
Applicant: HITACHI HIGH-TECH CORPORATION
Inventor: Yuki Tanaka , Takamasa Ichino , Shintarou Nakatani , Ryusuke Eijima
Abstract: A plasma processing apparatus having an improved yield includes a metal base member having a disk shape or a cylindrical shape arranged inside a sample table; a refrigerant flow path arranged multiple times in a concentrical shape around a center of the base member; at least one temperature sensor; and a controller configured to detect a temperature of the base member or the wafer using the temperature sensor. The controller is configured to detect the temperature of the base member or the wafer based on one of a plurality of linear functions indicating a relation between an error and a set temperature of the refrigerant, and the linear functions are different corresponding to regions of a plurality of continuous temperature ranges within an adjustable temperature range of the refrigerant, and the plurality of linear functions include the same coefficient and have a point where the error is 0.
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公开(公告)号:US12222690B2
公开(公告)日:2025-02-11
申请号:US17370131
申请日:2021-07-08
Applicant: Hitachi High-Tech Corporation
Inventor: Takashi Dobashi , Hiroyuki Kobayashi , Takeshi Ohmori
Abstract: To facilitate evaluation of a predicted process shape in process recipe development using machine learning, a process recipe search apparatus that searches for an etching recipe that is a parameter of a plasma processing apparatus set so as to etch a sample into a desired shape displays, on a display device, the predicted process shape of the sample by a candidate etching recipe predicted by using a machine leaning model, by highlighting a difference between the predicted process shape and a target shape.
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公开(公告)号:US12210003B2
公开(公告)日:2025-01-28
申请号:US17911763
申请日:2021-03-05
Applicant: HITACHI HIGH-TECH CORPORATION
Inventor: Midori Tobita , Yuichiro Hashimoto , Nobuhiro Tsukada
IPC: G01N30/32
Abstract: A liquid chromatographic apparatus which removes air bubbles during preparatory operation for apparatus startup includes a liquid feeding pump to feed a solvent, an injector to inject a sample into the solvent, a separation column to receive the solvent and the sample through the injector and separate the sample into components, a detector to detect the components supplied from the separation column, a pressure sensor to measure a pressure in a solvent flow channel of the liquid feeding pump, and a controller to control a purge operation for removing air bubbles in the solvent flow channel by the liquid feeding pump, determine whether a pressure change amount in the solvent flow channel measured by the pressure sensor during the purge operation is a specified change amount or larger, and complete the air bubble removal operation when the pressure change amount is the specified change amount or larger.
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公开(公告)号:US12116421B2
公开(公告)日:2024-10-15
申请号:US18021645
申请日:2021-09-02
Inventor: Charlotte A. E. Hauser , Maria Hountondji , Manola Moretti , Panagiotis Bilalis
CPC classification number: C07K7/06 , C12N5/0062 , C12N5/0601 , C12N2513/00 , C12N2533/50
Abstract: The present disclosure relates to Dopa containing ultrashort peptides capable of forming a gel, to a gel comprising a peptide in accordance with the present disclosure, and to a glue comprising a peptide in accordance with the present disclosure. Such gel is adhesive and is biocompatible. The peptides are suitable for building 3D structures, 3D printing, gluing as well as other applications.
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公开(公告)号:US12109327B2
公开(公告)日:2024-10-08
申请号:US17401542
申请日:2021-08-13
Inventor: Charlotte A. E. Hauser , Salwa Alshehri , Hepi H. Susapto
CPC classification number: A61L27/365 , A61L27/22 , B33Y10/00 , B33Y70/00 , B33Y80/00 , C12N5/0654 , A61L2430/02 , C12N2506/1353 , C12N2513/00 , C12N2533/50
Abstract: The present disclosure relates generally to an osteo-tissue graft capable of promoting bone tissue growth and regeneration, comprising at least one self-assemble peptide and mesenchymal stem cells (MSCs) in accordance with the present invention and a method of preparing such an osteo-tissue graft. The grafts are suitable for treatment of bone disorder or damages through tissue engineering, cellular replacement therapies as well as other applications.
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公开(公告)号:USD1040867S1
公开(公告)日:2024-09-03
申请号:US29835579
申请日:2022-04-20
Applicant: LTA Distributing, LLC
Designer: Donald Andrew McCoy, Jr.
Abstract: FIG. 1 is a perspective view of a hinged plate, showing a new design;
FIG. 2 is a front elevation view thereof;
FIG. 3. is a rear elevation view thereof;
FIG. 4. is a left elevation view thereof;
FIG. 5. is a right elevation view thereof;
FIG. 6. is a top plan view thereof;
FIG. 7. is a bottom plan view thereof; and,
FIG. 8. is a perspective view of the hinged plate in an open state.-
公开(公告)号:US12002692B2
公开(公告)日:2024-06-04
申请号:US17507932
申请日:2021-10-22
Applicant: Hitachi High-Tech Corporation
Inventor: Ryoichi Isomura , Keitarou Ogawa , Takahiro Sakuragi
IPC: H01L21/67 , H01L21/677
CPC classification number: H01L21/67184 , H01L21/67017 , H01L21/67161 , H01L21/67196 , H01L21/67201 , H01L21/67742
Abstract: According to one embodiment, a vacuum processing device is provided which is capable of being controlled to create the most suitable gas flow under the situation where the device is placed by allowing a plurality of vacuum transfer chambers to communicate with each other via the intermediate chamber in an operation method of the vacuum processing device including the plurality of vacuum transfer chambers connected to each other via the intermediate chamber and a plurality of vacuum processing chambers respectively connected to the vacuum transfer chambers.
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