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公开(公告)号:US12224166B2
公开(公告)日:2025-02-11
申请号:US17284003
申请日:2019-10-09
Applicant: JX Nippon Mining & Metals Corporation
Inventor: Hiroki Kajita , Yoshitaka Shibuya , Satoyasu Narita
Abstract: A sputtering target configured from a magnesium oxide sintered body, wherein a ratio of crystal grains of the magnesium oxide sintered body in which a number of pinholes in a single crystal grain is 20 or more is 50% or less. The present invention is a sputtering target configured from a magnesium oxide sintered body in which the generation of particles during sputtering is less.
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公开(公告)号:US20240153685A1
公开(公告)日:2024-05-09
申请号:US18284238
申请日:2022-03-03
Inventor: Yukito YAMAMOTO , Kazuyuki SATOH , Konosuke SAWA , Mitsuo BITO
CPC classification number: H01F1/15308 , B32B15/015 , C22C38/002 , C22C38/02 , C22C38/16 , C22C45/008 , C22C2200/02 , C22C2202/02
Abstract: There is provided a laminate that improves the electromagnetic wave shielding effect in a low frequency region. A laminate includes at least one non-magnetic metal layer and at least one magnetic metal layer, wherein the at least one magnetic metal layer contains an amorphous phase.
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公开(公告)号:US20240057305A1
公开(公告)日:2024-02-15
申请号:US18265771
申请日:2021-09-28
Applicant: JX Nippon Mining & Metals Corporation
Inventor: Yukito YAMAMOTO
IPC: H05K9/00
CPC classification number: H05K9/0084
Abstract: An electromagnetic wave shielding material includes a metal layer for ground connection provided as an outermost layer of a laminate; wherein only one surface of the metal layer for ground connection is laminated on the insulating layer via the adhesive layer, and assuming d1 is a thickness and ε1 is a Young's modulus of the adhesive layer on the one surface, d2 is a thickness and ε2 is a Young's modulus of the metal layer for ground connection, and ε3 is a composite Young's modulus of the adhesive layer on the one surface and the metal layer for ground connection, the following relational expression is satisfied: ε3/ε2>0.60; in which, ε3=ε1 (d1/(d1+d2))+ε2 (d2 (d1+d2)).
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公开(公告)号:US20240026525A1
公开(公告)日:2024-01-25
申请号:US18026437
申请日:2022-06-10
Applicant: JX Nippon Mining & Metals Corporation
Inventor: Shuhei Murata , Masaya Iwabuchi , Yusuke Sato
CPC classification number: C23C14/3414 , B23K20/023 , B23K20/02 , C22C9/06 , C22C21/06 , H01J37/3429 , B23K2101/34
Abstract: A sputtering target comprised of a plurality of members including a target material and a base material, wherein the plurality of members includes a first member and a second member laminated to each other, wherein the first member contains Al, and the second member contains Cu, wherein at least one of the first member and the second member contains Mg, wherein the sputtering target includes an alloy layer containing Al and Cu between the first member and the second member, the alloy layer being in contact with the first member and the second member, and wherein the alloy layer further includes an Mg-containing layer containing 5.0 at % or more of Mg in at least a part of the alloy layer.
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5.
公开(公告)号:US20230235426A1
公开(公告)日:2023-07-27
申请号:US17919912
申请日:2021-04-20
Applicant: JX NIPPON MINING & METALS CORPORATION
Inventor: Akira MIURA , Ronny WINARKO , Wenying LIU
CPC classification number: C22B3/02 , C22B15/0071 , C22B3/08
Abstract: Provided is a method for efficiently promoting a leaching reaction of copper. Equipment for leaching copper includes a reactor for leaching reaction and a controller for oxidation-reduction potential. The reactor is configured to be provided with a leaching solution containing iodine and iron. The reactor is configured to be capable of being tightly sealed during the leaching reaction. The controller for oxidation-reduction potential is configured so that, during the leaching reaction, the oxidation-reduction potential of the leaching solution can be maintained at 500 mV (based on Ag/AgCl reference) or higher.
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6.
公开(公告)号:US11651790B2
公开(公告)日:2023-05-16
申请号:US17181093
申请日:2021-02-22
Applicant: JX Nippon Mining & Metals Corporation
Inventor: Hideo Takami , Masataka Yahagi
IPC: H01J37/34 , G11B7/2548 , C04B35/46 , C23C14/08 , G11B7/26 , C23C14/34 , C04B35/645 , G11B7/2578 , G11B7/254
CPC classification number: G11B7/2548 , C04B35/46 , C04B35/645 , C23C14/083 , C23C14/34 , C23C14/3414 , G11B7/266 , H01J37/3429 , B22F2998/00 , C04B2235/408 , C04B2235/5436 , C04B2235/77 , C04B2235/79 , C04B2235/9646 , G11B7/2578 , G11B2007/25408 , B22F2998/00 , C22C29/12
Abstract: A thin film is provided that primarily comprises titanium oxide and includes Ti, Ag and O. The thin film contains 29.6 at % or more and 34.0 at % or less of Ti, 0.003 at % or more and 7.4 at % or less of Ag, and oxygen as the remainder thereof and has a ratio of oxygen to metals, O/(2Ti+0.5Ag), of 0.97 or more. The thin film has a high refractive index and a low extinction coefficient. In addition, the thin film has superior transmittance, minimally deteriorates in reflectance, and is useful as an interference film or a protective film for an optical information recording medium. The film may also be applied to a glass substrate to provide a heat reflective film, an antireflective film, or an interference filter. A method of producing the thin film is also disclosed.
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公开(公告)号:US20230073092A1
公开(公告)日:2023-03-09
申请号:US17795955
申请日:2021-01-22
Applicant: JX Nippon Mining & Metals Corporation
Inventor: Akira SAKO , Yasunobu MIYATA , Kazuhiko KIKUCHI
IPC: B65D19/00 , B65D19/20 , B65D19/36 , B65D19/44 , B65D5/44 , B65D5/50 , B65D5/68 , B65D85/66 , B65D85/672
Abstract: Provided are a packaging container, a packaging method, and a method for carrying metal foil, which can suppress damage and deformation of the packaging container and enable stable carrying even if the packaging container is carried while suspending it in the midair. A packaging container made of corrugated cardboard includes: a pallet 2 having leg portions 21; a body frame 3 arranged on the pallet 2, the body frame 3 having bearing grooves 31 at end wall portions 32 opposing to each other; and a lid portion 4 provided on the body frame 3, wherein each of the leg portions 21 is arranged on an inner side than each of the end wall portions 23 of the pallet 2.
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公开(公告)号:US11552174B2
公开(公告)日:2023-01-10
申请号:US16498712
申请日:2018-09-14
Applicant: JX NIPPON MINING & METALS CORPORATION
Inventor: Kohei Yamada , Koji Murakami , Kenya Itani
Abstract: Provided is a cadmium zinc telluride (CdZnTe) single crystal including a main surface that has a high mobility lifetime product (μτ product) in a wide range, wherein the main surface has an area of 100 mm2 or more and has 50% or more of regions where the μτ product is 1.0×10−3 cm2/V or more based on the entire main surface, and a method for effectively producing the same.
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公开(公告)号:US20220362844A1
公开(公告)日:2022-11-17
申请号:US17771552
申请日:2021-06-25
Applicant: JX Nippon Mining & Metals Corporation
Inventor: Hirofumi WATANABE , Yoshitaka SHIBUYA
Abstract: Provided is a copper alloy powder which is a metal powder to be used for additive manufacturing by a laser beam system, and which is able to achieve a higher laser absorption rate and additionally suppress heat transfer through necking, and a method for producing this copper alloy powder. A copper alloy powder which contains one or more elements selected from among Cr, Zr and Nb in a total amount of 15 wt % or less, with a balance being made up of Cu and unavoidable impurities, and which is characterized in that a coating film containing Si atoms is formed on the copper alloy powder, and a Si concentration in the copper alloy powder with the coating film is 5 wt ppm or more and 700 wt ppm or less.
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公开(公告)号:US11499207B2
公开(公告)日:2022-11-15
申请号:US16496269
申请日:2018-03-20
Applicant: JX Nippon Mining & Metals Corporation
Inventor: Akihiro Kakitani , Hironori Imamura
Abstract: Provided is a Corson alloy having improved bending workability and also having high dimensional accuracy after press-working. A copper alloy strip which is a rolling material, the rolling material containing from 0 to 5.0% by mass of Ni or from 0 to 2.5% by mass of Co, the total amount of Ni+Co being from 0.2 to 5% by mass; from 0.2 to 1.5% by mass of Si, the balance being copper and unavoidable impurities, wherein the rolling material has a surface satisfying the relationship: 1.0≤I(200)/I0(200)≤5.0; wherein an area ratio of Cube orientation {100} is from 2 to 10% in EBSD measurement of a rolling parallel cross section; and wherein a ratio: (an average crystal grain size of Cube orientation {100} of the rolling parallel cross section)/(an average crystal grain size of the rolling parallel cross section) is from 0.75 to 1.5.
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