Defect inspection apparatus and defect inspection program

    公开(公告)号:US12112963B2

    公开(公告)日:2024-10-08

    申请号:US17419581

    申请日:2019-03-06

    摘要: The objective of the present invention is provide a defect inspection apparatus that increases defect position precision and can easily align a coordinate origin offset between a reviewing apparatus and the defect inspection apparatus, even when design data cannot be obtained or it is difficult to sufficiently use the design data. The defect inspection apparatus according to the present invention acquires a wafer swath image necessary for inspection, and uses the swath image to detect defects and calculate a positional deviation amount. During the calculation of the positional deviation amount, a template pattern is acquired from one arbitrary swath image via an image processing unit, and the template pattern and a plurality of swath images of the entire wafer are compared, whereby the positional deviation amount for a position corresponding to the template pattern on the wafer is calculated. For positions at which the template pattern is not present, an interpolated positional deviation amount is calculated by executing an interpolation operation by using the calculated positional deviation amount. A defect position is corrected on the basis of the positional deviation amount and the interpolated positional deviation amount, or by using a positional deviation map in which these positional deviation amounts have been mapped on the entire wafer.

    Artifact removal from multimodality OCT images

    公开(公告)号:US12112472B2

    公开(公告)日:2024-10-08

    申请号:US17500583

    申请日:2021-10-13

    摘要: Embodiments disclosed herein provide systems, methods and/or computer-readable media for automatically detecting and removing fluorescence artifacts from catheter-based multimodality OCT-NIRAF images. In one embodiment, a process of determining an automatic threshold value (automatic thresholding) is implemented by sorting characteristic parameter values of the NIRAF signal and finding a maximum perpendicular distance between a curve of the sorted values and a straight line from the highest to the lowest sorted value, combined with the use of unsupervised machine learning classification techniques to detect the frame's NIRAF values that correspond to signal artifacts. Once the signal artifacts are detected, the system can filter out the signal artifacts, correct the frames that had artifacts, and produce a more accurate multimodality image.