IMPRINT METHOD, IMPRINT APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

    公开(公告)号:US20220242013A1

    公开(公告)日:2022-08-04

    申请号:US17580815

    申请日:2022-01-21

    IPC分类号: B29C35/08 B29C59/02

    摘要: The present invention provides an imprint method of forming a pattern of an imprint material on a substrate using a mold, comprising: performing preliminary curing in which the imprint material is cured to a first target hardness by irradiating the imprint material with first light, in order to execute alignment between the mold and the substrate; and performing, after the alignment, main curing in which the imprint material is cured to a second target hardness by irradiating the imprint material with second light, wherein before performing the preliminary curing, an irradiation light amount of the first light to be used in the preliminary curing is determined based on a curing time until the imprint material is cured to the first target hardness, the curing time being obtained by irradiating an imprint material with third light.