Aqueous developing composition for lithographic diazo printing plates
    83.
    发明授权
    Aqueous developing composition for lithographic diazo printing plates 失效
    用于光刻重氮印刷版的水性显影组合物

    公开(公告)号:US3891438A

    公开(公告)日:1975-06-24

    申请号:US30307272

    申请日:1972-11-02

    申请人: POLYCHROME CORP

    IPC分类号: G03F7/32 G03C5/34 G03F7/08

    摘要: A developer composition for photosensitive coatings on substrates, particularly lithographic printing plates sensitized with substantially water-insoluble diazonium compounds, which is comprised of an aqueous solution of an amphoteric surfactant. The novel developers quickly remove non-image areas of the plate and yet do not detrimentally dissolve the image areas of the plate.

    摘要翻译: 用于基材上的感光涂料的显影剂组合物,特别是用基本上不溶于水的重氮化合物敏化的平版印刷版,其由两性表面活性剂的水溶液组成。 新颖的开发人员快速地去除板的非图像区域,但不会有害地溶解板的图像区域。

    Semiconductor wafer stabilization process and stabilization solution therefor
    86.
    发明授权
    Semiconductor wafer stabilization process and stabilization solution therefor 失效
    SEMICONDUCTOR WAFER STABILIZATION PROCESS AND STABILIZATION SOLUTION THEREFOR

    公开(公告)号:US3846181A

    公开(公告)日:1974-11-05

    申请号:US40877673

    申请日:1973-10-23

    申请人: MOTOROLA INC

    发明人: FLOWERS D

    IPC分类号: H01L21/316 H01L23/31 H01L7/34

    摘要: 1. IN A PROCESS OF MANUFACTURING SEMICONDUCTOR DEVICES WHICH INCLUDES THE STEPS OF FORMING P-N JUNCTIONS IN A SURFACE OF A SEMICONDUCTOR SUBSTRATE WHICH JUNCTIONS EXTEND TO THE SURFACE OF SAID SUBSTRATE AND COVERING SAID JUNCTIONS WITH A PASSIVATION LAYER ON THE SURFACE OF SAID WAFER, THE IMPROVEMENT WHICH COMPRISES THE STEPS OF COATING THE IMPROVEMENT DEVICE WITH A COMPLEX SILICATE SOLUTION CONTAINING 1 TO 30 GRAMS PER LITER PHOSPHOROUS PENTOXIDE, 1 TO 60 GRAMS PER LITER BORIC ANHYDRIDE, .005 TO 5.0 GRAMS PER LITER VANADIUM OXIDE, 0.01 TO 50 MILLILITERS PER LITER TETRAETHYLORTHOSILICATE AND THE BALANCE AN ORGANIC SOLVENT.

    Cationic silicones
    87.
    发明授权
    Cationic silicones 失效
    阳离子硅

    公开(公告)号:US3836559A

    公开(公告)日:1974-09-17

    申请号:US21911872

    申请日:1972-01-19

    发明人: PROKAI B

    摘要: CATIONIC BIS(TRIMETHYLSILOXY)SILOXANES OF THE FORMULA:

    MD''XM

    WHEREIN M IS THE TRIMETHYLSILOXY UNIT, ME3SIO1/2, X IS AN INTEGER OF 1 TO 3, PREFERABLY 1, AND D'' IS A CATIONIC DIFUNCTIONAL SILOXY UNIT OF THE FORMULA:

    X(-)(C6H5-N(+)(-R)2-R0-(O)T-SI(-CH3)(-O-)-)

    WHERE R0 IS A DIVALENT ORGANIC GROUP, T IS 0 OR 1, R IS METHYL OR ETHYL, C6H5 IS A PHENYL RADICAL AND X IS AN ANION. ALSO THE TERTIAARY AMINO BIS(TRIMETHYLSILOXY) SILOXANES OF THE FORMULA MDXM WHEREIN M AND X ARE AS DEFINED ABOVE AND D IS A TERTIARY AMINO DIFUNCTIONAL SILOXY UNIT OF THE FORMULA:

    R-N(-C6H5)-R0-(O)T-SI(-CH3)(-O-)-

    WHEREIN R, R*, T AND C6H5 ARE AS DEFINED ABOVE, WHICH ARE USED IN PREPAARING THE ABOVE CATIONIC SILOXANES. THE ABOVE CATIONIC SILOXANES ARE USEFUL AS EMULSIFIERS, E.G., FOR WATER-POLY(DIMETHYLSILOXANE) OIL SYSTEMS, BACTERIOCIDES, ANTISTATIC AGENTS, WETTING AGENTS AND MOLD RELEASE AGENTS.

    Photographic coating compositions
    88.
    发明授权
    Photographic coating compositions 失效
    摄影涂料组合物

    公开(公告)号:US3824102A

    公开(公告)日:1974-07-16

    申请号:US18903671

    申请日:1971-10-13

    CPC分类号: G03C1/38 Y10S516/01

    摘要: A PHOTOGRAPHIC COATING AID HAVING THE FORMULA

    R-O-CH2-CH(-O-A)-CH2-SO2-O-M OR

    R-O-CH2-CH(-O-A)-CH2-N(-B)-CH2-CH2-SO2-O-M

    WHEREIN R IS A HYDROCARBON RADICAL HAVING 4-18 CARBON ATOMS OR A PHENYL GROUP HAVING A C4-18 HYDROCARBON RADICAL. A IS HYDROGEN OR ALOWER ACYL GROUP, B IS HYDROGEN OR METHYL AND M IS A CATION, IS INCORPORATED INTO A PHTOTGRAPHIC COATING COMPOSITION IN AN AMOUNT OF 0.01 TO 20 G/KG. OF COMPOSITION.