Writing a container index to persistent storage

    公开(公告)号:US11593021B2

    公开(公告)日:2023-02-28

    申请号:US17091048

    申请日:2020-11-06

    IPC分类号: G06F3/06 H04L9/06

    摘要: Example implementations relate to metadata operations in a storage system. An example method includes receiving, from a first stream process, a first write request for a first container index in memory. The method further includes, in response to a receipt of the first write request, sending a first token to the first stream process without writing the first container index to a persistent storage. The method further includes receiving, from a second stream process, a first completion request for the first container index. The method further includes, in response to a receipt of the first completion request, writing the first container index from the memory to the persistent storage.

    METADATA CACHE FOR STORING MANIFEST PORTION

    公开(公告)号:US20220107902A1

    公开(公告)日:2022-04-07

    申请号:US17060456

    申请日:2020-10-01

    摘要: Example implementations relate to storing manifest portions in a metadata cache. An example includes receiving, by a storage controller, a read request associated with a first data unit. In response to receiving the read request, the storage controller stores a manifest portion in a metadata cache, the stored manifest portion comprising a plurality of records, the plurality of records including a first record associated with the first data unit. The storage controller determines storage information of the first data unit using pointer information included in the first record of the stored manifest portion, and replaces the pointer information in the first record with the determined storage information of the first data unit.

    Repeatable heat-treating methods and apparatus
    83.
    发明授权
    Repeatable heat-treating methods and apparatus 有权
    可重复的热处理方法和装置

    公开(公告)号:US09482468B2

    公开(公告)日:2016-11-01

    申请号:US11521074

    申请日:2006-09-14

    摘要: A first heat-treating method involves monitoring at least one thermal efficiency parameter associated with an irradiance system configured to produce an irradiance flash incident on a surface of a workpiece, and automatically updating control information used by the irradiance system to produce the irradiance flash, in response to the monitoring of the thermal efficiency parameter. A second method involves predicting a heating effect of an irradiance flash to be incident upon a surface of a workpiece, in response to a measurement of a heating parameter of the surface, and pre-adjusting the irradiance flash, in response to the predicted heating effect. A third method involves measuring a temperature of a surface of a workpiece during an initial portion of an irradiance flash incident on the surface, and controlling a power of a remaining portion of the irradiance flash, in response to the temperature.

    摘要翻译: 第一热处理方法包括监测与被配置为产生入射在工件表面上的辐照闪光相关联的辐射系统的至少一个热效率参数,并且自动更新由辐照系统使用的控制信息以产生辐照闪光, 响应于热效率参数的监测。 第二种方法包括响应于表面的加热参数的测量以及响应于预测的加热效应来预先调节辐照度闪光来预测辐射闪光的加热效应入射到工件的表面上 。 第三种方法包括测量在入射到表面上的辐照闪光的初始部分期间工件表面的温度,以及响应于温度来控制辐照闪光的剩余部分的功率。

    Methods, apparatus and media for determining a shape of an irradiance pulse to which a workpiece is to be exposed
    84.
    发明授权
    Methods, apparatus and media for determining a shape of an irradiance pulse to which a workpiece is to be exposed 有权
    用于确定要暴露工件的辐照脉冲的形状的方法,装置和介质

    公开(公告)号:US09279727B2

    公开(公告)日:2016-03-08

    申请号:US13824269

    申请日:2011-10-14

    IPC分类号: G01J5/02 H01L21/67 H01L21/66

    摘要: A method and system for determining a shape of an irradiance pulse to which a semiconductor wafer is to be exposed during a thermal cycle are disclosed. The method includes receiving, with a processor circuit, thermal cycle parameters specifying requirements of the thermal cycle, and determining, with the processor circuit, a shape of a heating portion of the irradiance pulse. Determining includes optimizing at least one parameter of a flux profile model of the heating portion of the irradiance pulse to satisfy the requirements while minimizing frequency-domain energy spectral densities of the flux profile model at resonant frequencies of the wafer, to minimize vibration of the wafer at the resonant frequencies when the wafer is exposed to the irradiance pulse.

    摘要翻译: 公开了一种在热循环期间确定半导体晶片将被暴露的辐照脉冲的形状的方法和系统。 该方法包括使用处理器电路接收指定热循环的要求的热循环参数,以及利用处理器电路确定辐照脉冲的加热部分的形状。 确定包括优化辐照脉冲的加热部分的通量分布模型的至少一个参数以满足要求,同时使晶片的谐振频率处的通量分布模型的频域能量密度最小化,以最小化晶片的振动 当晶片暴露于辐照度脉冲时的谐振频率。

    APPARATUS AND METHODS FOR GENERATING ELECTROMAGNETIC RADIATION
    86.
    发明申请
    APPARATUS AND METHODS FOR GENERATING ELECTROMAGNETIC RADIATION 有权
    用于产生电磁辐射的装置和方法

    公开(公告)号:US20150035436A1

    公开(公告)日:2015-02-05

    申请号:US14379470

    申请日:2012-02-24

    IPC分类号: H01J61/10 H01J61/52

    摘要: An apparatus for generating electromagnetic radiation includes an envelope, a vortex generator configured to generate a vortexing flow of liquid along an inside surface of the envelope, first and second electrodes within the envelope configured to generate a plasma arc therebetween, and an insulative housing associated surrounding at least a portion of an electrical connection to one of the electrodes. The apparatus further includes a shielding system configured to block electromagnetic radiation emitted by the arc to prevent the electromagnetic radiation from striking all inner surfaces of the insulative housing. The apparatus further includes a cooling system configured to cool the shielding system.

    摘要翻译: 一种用于产生电磁辐射的装置包括一个外壳,一个涡流发生器,其配置成沿着该外壳的内表面产生液体的涡旋流,该外壳内的第一和第二电极构造成在其间产生等离子体电弧, 至少一部分电连接到一个电极。 该装置还包括屏蔽系统,其构造成阻挡由电弧发射的电磁辐射,以防止电磁辐射撞击绝缘外壳的所有内表面。 该装置还包括被配置为冷却屏蔽系统的冷却系统。

    IRRADIANCE PULSE HEAT-TREATING METHODS AND APPARATUS
    89.
    发明申请
    IRRADIANCE PULSE HEAT-TREATING METHODS AND APPARATUS 有权
    辐射脉冲热处理方法和装置

    公开(公告)号:US20110274417A1

    公开(公告)日:2011-11-10

    申请号:US13182341

    申请日:2011-07-13

    IPC分类号: F27D11/12

    摘要: A method of heat-treating a workpiece includes generating an initial heating portion and a subsequent sustaining portion of an irradiance pulse incident on a target surface area of the workpiece. A combined duration of the initial heating portion and the subsequent sustaining portion is less than a thermal conduction time of the workpiece. The initial heating portion heats the target surface area to a desired temperature and the subsequent sustaining portion maintains the target surface area within a desired range from the desired temperature. Another method includes generating such an initial heating portion and subsequent sustaining portion of an irradiance pulse, monitoring at least one parameter indicative of a presently completed amount of a desired thermal process during the irradiance pulse, and modifying the irradiance pulse in response to deviation of the at least one parameter from an expected value.

    摘要翻译: 对工件进行热处理的方法包括产生入射到工件的目标表面区域上的辐照脉冲的初始加热部分和随后的维持部分。 初始加热部分和随后的维持部分的组合持续时间小于工件的热传导时间。 初始加热部分将目标表面积加热至所需温度,随后的维持部分将目标表面积保持在所需温度的期望范围内。 另一种方法包括生成辐照度脉冲的这种初始加热部分和随后的维持部分,在辐照脉冲期间监测指示目前完成的期望热处理量的至少一个参数,以及响应于辐射脉冲的偏差来修改辐照度脉冲 来自预期值的至少一个参数。