摘要:
According to one embodiment, a semiconductor device includes first to third electrodes, first to fifth layers, and an insulating portion. A position of the third electrode is between a position of the first electrode and a position of the second electrode. The first layer includes first to fifth partial regions. The first partial region is between the fourth and third partial regions. The second partial region is between the third and fifth partial regions. The second layer includes first and second semiconductor regions. The third layer is provided between the third partial region and the third electrode. The fourth layer is provided between the third partial region and the third layer. The fifth layer includes first and second intermediate regions. The third layer is provided between the first and second intermediate regions. The insulating portion includes a first insulating region provided between the third layer and the third electrode.
摘要:
According to one embodiment, a semiconductor element includes a first nitride semiconductor region, a second nitride semiconductor region, and an intermediate region provided between the first nitride semiconductor region and the second nitride semiconductor region. A Si concentration in the intermediate region is not less than 1×1018/cm3 and not more than 1×1019/cm3. A charge density in the intermediate region is 3×1017/cm3 or less.
摘要:
According to one embodiment, a semiconductor device includes first, second, and third electrodes, and first, second, third, fourth, and fifth semiconductor regions. The first electrode includes a first conductive region. The second electrode includes a second conductive region separated. The third electrode includes a third conductive region. The first semiconductor region is separated from the first, second, and third conductive regions. The second semiconductor region is provided between the first conductive and semiconductor regions, between the second conductive and first semiconductor regions, and between the third conductive and first semiconductor regions. The third semiconductor region is provided between the first conductive region and the second semiconductor region. The fourth semiconductor region is provided between the second conductive region and the second semiconductor region. The fifth semiconductor region is provided between the third conductive region and the second semiconductor region and between the third and fourth semiconductor regions.
摘要:
According to one embodiment, a light emitting element includes n-type and p-type semiconductor layers and a light emitting unit. The light emitting unit is provided between the n-type semiconductor layer and the p-type semiconductor layer, the light emitting unit emits light with a peak wavelength of not less than 530 nm. The light emitting unit includes an n-side barrier layer and a first light emitting layer. The first light emitting layer includes a first barrier layer provided between the n-side barrier layer and the p-type semiconductor layer, a first well layer contacting the n-side barrier layer between the n-side barrier layer and the first barrier layer, a first AlGaN layer provided between the first well layer and the first barrier layer and including Alx1Ga1-x1N (0.15≦x1≦1), and a first p-side InGaN layer provided between the first AlGaN layer and the first barrier layer and including Inya1Ga1-ya1N (0
摘要翻译:根据一个实施例,发光元件包括n型和p型半导体层和发光单元。 发光单元设置在n型半导体层和p型半导体层之间,发光单元发出峰值波长不小于530nm的光。 发光单元包括n侧阻挡层和第一发光层。 第一发光层包括设置在n侧阻挡层和p型半导体层之间的第一阻挡层,与n侧阻挡层和第一阻挡层之间的n侧势垒层接触的第一阱层, 第一AlGaN层,设置在第一阱层和第一势垒层之间,并且包括Al x Ga 1-x N(0.15和n 1; x 1和n 1 E 1);以及设置在第一AlGaN层和第一势垒层之间的第一p侧InGaN层, Inya1Ga1-ya1N(0
摘要:
According to one embodiment, a semiconductor light emitting device includes: a conductive layer; a first stacked body; a second stacked body; a first light-transmissive electrode; and a first interconnect electrode. The first stacked body includes a first semiconductor layer and a second semiconductor layer. The second semiconductor layer is provided between the first semiconductor layer and the conductive layer. The first light emitting layer is provided between the first semiconductor layer and the second semiconductor layer. The second stacked body includes a third semiconductor layer, a fourth semiconductor layer, and a second light emitting layer. The fourth semiconductor layer is provided between the third semiconductor layer and the conductive layer. The second light emitting layer is provided between the third semiconductor layer and the fourth semiconductor layer. The first interconnect electrode is provided between the second semiconductor layer and the third semiconductor layer.
摘要:
According to one embodiment, a semiconductor light emitting device includes an n-type semiconductor layer, a p-type semiconductor layer, a light emitting part, and a p-side electrode. The light emitting part is provided between the n-type and the p-type semiconductor layers, and includes a plurality of barrier layers and a plurality of well layers. The p-side electrode contacts the p-type semiconductor layer. The p-type semiconductor layer includes first, second, third, and fourth p-type layers. The first p-type layer contacts the p-side electrode. The second p-type layer contacts the light emitting part. The third p-type layer is provided between the first p-type layer and the second p-type layer. The fourth p-type layer is provided between the second p-type layer and the third p-type layer. The second p-type layer contains Al and contains a p-type impurity in a lower concentration lower than that in the first concentration.
摘要:
According to one embodiment, a semiconductor light emitting element includes a first electrode, a first semiconductor layer, a light emitting layer, a second semiconductor layer, a first insulating portion, and a first conductive layer. The first electrode includes first and second regions. The first semiconductor layer is separated from the first region, and includes first and second portions. The light emitting layer is provided between the second portion and the first region. The second semiconductor layer is provided between the light emitting layer and the first region. The second electrode is provided between the first region and the second semiconductor layer to contact the second semiconductor layer. The first insulating portion is provided between the first region and the second electrode. The first conductive layer is provided between the first portion and the first region, and includes a contact portion contacting the first portion.
摘要:
According to one embodiment, a semiconductor device includes an n-type semiconductor layer and a first metal layer. The n-type semiconductor layer includes a nitride semiconductor. The n-type semiconductor layer includes a boron-containing region including boron bonded to oxygen. The first metal layer contacts the boron-containing region.
摘要:
According to one embodiment, a semiconductor light emitting device includes a first semiconductor layer, a second semiconductor layer, a light emitting layer, a dielectric layer, a first electrode, a second electrode and a support substrate. The first layer has a first and second surface. The second layer is provided on a side of the second surface of the first layer. The emitting layer is provided between the first and the second layer. The dielectric layer contacts the second surface and has a refractive index lower than that of the first layer. The first electrode includes a first and second portion. The first portion contacts the second surface and provided adjacent to the dielectric layer. The second portion contacts with an opposite side of the dielectric layer from the first semiconductor layer. The second electrode contacts with an opposite side of the second layer from the emitting layer.
摘要:
A semiconductor light emitting device has a light emitting element, a first electrode layer, a second electrode layer, a seed electrode layer and a plated layer. The light emitting element has a nitride-based III-V compound semiconductor on a substrate. The light emitting element having a light extraction surface. The first electrode layer on the light extraction surface. The second electrode layer is provided on a surface opposite to the light extraction surface of the light emitting element. The seed electrode layer is configured to cover the entire surface of the second electrode layer. The plated layer is provided on the seed electrode layer. The light emitting element has a light emitting layer, a first conductive type semiconductor layer, and a second conductive type semiconductor layer. The light emitting element has a forward tapered shape of a width which gradually narrows in order of the second conductive type semiconductor layer, the light emitting layer and the first conductive type semiconductor layer.