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    Method and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production process
    71.
    发明授权
    Method and apparatus of inspecting foreign matters during mass production start-up and mass production line in semiconductor production process 失效
    在半导体生产过程中批量生产启动和批量生产线中检查异物的方法和装置

    公开(公告)号：US5233191A

    公开(公告)日：1993-08-03

    申请号：US679317

    申请日：1991-04-02

    申请人： Minori Noguchi ,  Yukio Kembo ,  Hiroshi Morioka ,  Hiroshi Yamaguchi ,  Makiko Kohno ,  Yoshimasa Ohshima

    发明人： Minori Noguchi ,  Yukio Kembo ,  Hiroshi Morioka ,  Hiroshi Yamaguchi ,  Makiko Kohno ,  Yoshimasa Ohshima

    IPC分类号： G01N21/94 ,  G01N21/956 ,  G01Q10/00 ,  G01Q30/02 ,  G01Q30/04 ,  G01Q30/14 ,  G01Q60/10 ,  G01R31/311 ,  H01J37/256 ,  H01L21/00 ,  H01L21/66

    CPC分类号： H01L21/67253 ,  G01R31/311 ,  H01J37/256 ,  H01L21/67276 ,  H01L21/67288 ,  H01L22/20 ,  B82Y35/00 ,  G01N2021/8822 ,  G01N21/94 ,  G01N21/95623

    摘要： Method and apparatus of detecting, analyzing and evaluating the content of foreign matters such as dusts and impurities contained in various materials, units, processes and environment standing for constituting components of a mass production line during mass production start-up and during mass production, in order to manage a semiconductor production process. A mass production off-line system including an apparatus for detecting, analyzing and evaluating the content of foreign matters during the mass production start-up is separated from the production line and installed independently thereof. Monitors for detection of foreign matters are provided at necessary locations in the production line and monitor data is evaluated through various units to manage the content of foreign matters in the production line, permitting efficient and economical mass production start-up and mass production. The kind of element of a foreign matter on sampling wafer detected in the mass production line is analyzed by means of STM/STS and the results are compared with a data base to effect identification. A foreign matter or a contaminant is detected by detecting a scatttered beam, of a light spot which scans the surface of a substrate. The detection of the scattered beam is carried out under the condition that Rayleigh scattering of the light spot on the light spot irradiation and reflection paths and Rayleigh scattering of the scattered beam on the scattered beam detection path are suppressed to a minimum. For the suppression of Rayleigh scattering, a low-pressure or low-temperature atmosphere may be used.

    摘要翻译： 检测，分析和评估大规模生产启动期间和批量生产期间大规模生产线组成部件的各种材料，单位，工艺和环境中所含的灰尘和杂质等杂质的含量， 为了管理半导体生产过程。 包括用于在批量生产启动期间检测，分析和评估异物含量的装置的批量生产离线系统与生产线分离并独立安装。 在生产线必需的位置提供检测异物的监测器，通过各种单位对监测数据进行评估，对生产线内的异物含量进行管理，实现高效，经济的批量生产启动和批量生产。 通过STM / STS分析在大规模生产线上检测到的采样晶圆上的异物元素的种类，并将结果与​​数据库进行比较以进行识别。 通过检测扫描基板表面的光斑的光斑光束来检测异物或污染物。 在光点照射和反射路径上的光斑的瑞利散射和散射光束检测路径上的散射光束的瑞利散射被抑制到最小的条件下进行散射光束的检测。 为了抑制瑞利散射，可以使用低压或低温气氛。

    Method of and apparatus for detecting foreign substances
    72.
    发明授权
    Method of and apparatus for detecting foreign substances 失效
    异物检测方法及装置

    公开(公告)号：US4740079A

    公开(公告)日：1988-04-26

    申请号：US792320

    申请日：1985-10-28

    申请人： Mitsuyoshi Koizumi ,  Yoshimasa Ohshima ,  Minoru Tanaka

    发明人： Mitsuyoshi Koizumi ,  Yoshimasa Ohshima ,  Minoru Tanaka

    IPC分类号： G01N21/21 ,  G01N21/94 ,  G01N21/95 ,  G01N21/01

    CPC分类号： G01N21/94 ,  G01N2021/4721 ,  G01N21/21 ,  G01N21/9501

    摘要： The present invention provides a method for detecting foreign substances which detects a foreign substance with a first photoelectric conversion element by emphasizing the foreign substance and detects a background on the object with a second photoelectric conversion element by emphasizing the background and detects a foreign substance detection signal obtained from the first photoelectric conversion element by emphasizing the signal with a detection signal obtained from the second photoelectric conversion element.

    摘要翻译： 本发明提供了一种通过强调异物检测第一光电转换元件的异物检测异物的方法，并且通过强调背景来检测物体上的背景，并检测异物检测信号 通过用从第二光电转换元件获得的检测信号强调信号从第一光电转换元件获得。

    Method of detecting pattern defect and its apparatus
    73.
    发明授权
    Method of detecting pattern defect and its apparatus 失效
    检测图案缺陷及其设计的方法

    公开(公告)号：US4614430A

    公开(公告)日：1986-09-30

    申请号：US604998

    申请日：1984-04-27

    申请人： Yasuhiko Hara ,  Yoshimasa Ohshima ,  Satoru Fushimi ,  Hiroshi Makihira

    发明人： Yasuhiko Hara ,  Yoshimasa Ohshima ,  Satoru Fushimi ,  Hiroshi Makihira

    IPC分类号： G01N21/956 ,  G06T7/00 ,  G01N21/88

    CPC分类号： G06T7/001 ,  G01N21/95607 ,  G06T2207/10056 ,  G06T2207/30148

    摘要： A pattern defect is detected in accordance with the difference between a pair of patterns. The patterns are scanned and imaged to obtain first and second binary signals. A positioning error between the patterns is two-dimensionally detected during the scanning with respective first and second binary signals delayed by a prescribed amount so that each of the picture elements in a prescribed area of a two-dimensional image, delayed and cut out two-dimensionally, corresponding to one pattern, is compared with a specified picture element in a predetermined area of an image delayed and cut out two-dimensionally corresponding to another pattern. The result of the comparison is statistically summed to derive a positioning error by detecting the position shown as an extreme value from the summed values. The positioning error is corrected by two-dimensionally shifting at least one of the delayed binary signals. The corrected binary signals are then two-dimensionally compared with each other.

    摘要翻译： 根据一对图案之间的差异来检测图案缺陷。 扫描和成像图案以获得第一和第二二进制信号。 在扫描期间，以相应的第一和第二二进制信号延迟规定量的二维检测图案之间的定位误差，使得二维图像的规定区域中的每个图像元素被延迟和切出二维图像， 对应于一个图案的尺寸与在与另一图案对应地延迟和切出的图像的预定区域中的指定图像元素进行比较。 比较的结果被统计学地相加以通过从求和值中检测显示为极值的位置来导出定位误差。 通过二维移位延迟的二进制信号中的至少一个来校正定位误差。 然后将校正后的二进制信号二维地进行比较。

    Method of apparatus for detecting particles on a specimen
    74.
    发明授权
    Method of apparatus for detecting particles on a specimen 有权
    用于检测样品上的颗粒的装置的方法

    公开(公告)号：US08289507B2

    公开(公告)日：2012-10-16

    申请号：US13118004

    申请日：2011-05-27

    申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

    发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956

    摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

    摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

    METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN
    77.
    发明申请
    METHOD OF APPARATUS FOR DETECTING PARTICLES ON A SPECIMEN 有权
    检测样品中颗粒物的方法

    公开(公告)号：US20110228258A1

    公开(公告)日：2011-09-22

    申请号：US13118004

    申请日：2011-05-27

    申请人： Akira HAMAMATSU ,  Minori NOGUCHI ,  Yoshimasa OHSHIMA ,  Sachio UTO ,  Taketo UENO ,  Hiroyuki NAKANO ,  Takahiro JINGU ,  Hisashi HATANO ,  Yukihisa MOHARA ,  Seiji OTANI ,  Takahiro TOGASHI

    发明人： Akira HAMAMATSU ,  Minori NOGUCHI ,  Yoshimasa OHSHIMA ,  Sachio UTO ,  Taketo UENO ,  Hiroyuki NAKANO ,  Takahiro JINGU ,  Hisashi HATANO ,  Yukihisa MOHARA ,  Seiji OTANI ,  Takahiro TOGASHI

    IPC分类号： G01N21/88

    CPC分类号： G01N21/956

    摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

    摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

    Method for inspecting defect and apparatus for inspecting defect
    78.
    发明授权
    Method for inspecting defect and apparatus for inspecting defect 有权
    检查缺陷的方法和缺陷检查装置

    公开(公告)号：US07903244B2

    公开(公告)日：2011-03-08

    申请号：US12555530

    申请日：2009-09-08

    申请人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    发明人： Akira Hamamatsu ,  Minori Noguchi ,  Hidetoshi Nishiyama ,  Yoshimasa Ohshima ,  Takahiro Jingu ,  Sachio Uto

    IPC分类号： G01N21/00

    CPC分类号： G01N21/8806 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623

    摘要： The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.

    摘要翻译： 本发明是用于检查异物的缺陷的装置，包括照明光学系统，检测光学系统，屏蔽单元，其设置在所述检测光学系统中，以选择性地屏蔽来自存在于检查对象上的电路图案的衍射光图案 以及算术处理系统，其中所述屏蔽单元包括微镜阵列器件或反射型液晶或透射型液晶，或将屏蔽图案转印到光学透明基板或基板或 蚀刻以留下屏蔽图案的薄膜，或通过加热，突然冷或光照射或电场或磁场的变化或透镜中的可变化的光学透明基板或圆柱形的屏蔽板或 板形。

    Method and apparatus for detecting defects on a wafer
    79.
    发明授权
    Method and apparatus for detecting defects on a wafer 有权
    用于检测晶片上的缺陷的方法和装置

    公开(公告)号：US07567343B2

    公开(公告)日：2009-07-28

    申请号：US11500421

    申请日：2006-08-08

    申请人： Yoshimasa Ohshima ,  Sachio Uto ,  Yukihiro Shibata

    发明人： Yoshimasa Ohshima ,  Sachio Uto ,  Yukihiro Shibata

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/21 ,  G01N21/33 ,  G01N21/55 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95623 ,  G01N2201/0697

    摘要： As circuit patterns become finer in recent years, improvement in detection sensitivity of defects is required. To answer this, sensitivity is being enhanced using a laser with a wavelength of the UV band as the laser for irradiation. A pulse oscillation laser is often used as the UV laser. However, a peak (maximum output) of the pulse oscillation laser becomes very large to an average output power required. For example, in the case of a laser of average output power 2 W, pulse interval 10 ns, and pulse width 10 ps, the peak (maximum output) becomes as high as 2 kW, and there is the possibility of causing a damage to a sample. Therefore, it is necessary to reduce the peak (maximum output) with the average output power being maintained, so that it may not cause a damage to the sample. In this invention, the device is configured in such a way that pulsed light is optically divided into several pulses and these pulses are given respective paths whose lengths are set different from one another, whereby the peak (maximum output) is reduced while the average output value are maintained.

    摘要翻译： 随着近年来电路图案变得越来越精细，需要提高缺陷检测灵敏度。 为了解决这个问题，使用具有UV波段波长的激光作为照射用激光，正在提高灵敏度。 经常使用脉冲振荡激光器作为UV激光器。 然而，脉冲振荡激光器的峰值（最大输出）变得非常大，达到所需的平均输出功率。 例如，在平均输出功率2W，脉冲间隔10ns，脉冲宽度10ps的激光器的情况下，峰值（最大输出）变得高达2kW，并且存在对 一个样品。 因此，需要在保持平均输出功率的同时降低峰值（最大输出），从而不会对样品造成损害。 在本发明中，器件被配置成使得脉冲光被光学地分成几个脉冲，并且这些脉冲被给予各自的长度彼此不同的路径，从而峰值（最大输出）减小，而平均输出 保持价值。