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公开(公告)号：US07545481B2
公开(公告)日：2009-06-09
申请号：US10719683
申请日：2003-11-24
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Paul Graupner , Jan Haisma , Nicodemus Hattu , Christiaan Alexander Hoogendam , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bernard Gellrich
CPC分类号： G03F7/70341 , G03F7/7095
摘要： The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
摘要翻译： 投影系统元件及其支撑体之间的接合部包括无机层或直接接合，因此液密，能够防止浸渍液体发生变形。 关节可以做温暖还是冷。 焊料，胶水和胶水保护都可用于形成这种接头。 在一个实施例中，元件及其支撑由石英制成。
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公开(公告)号：US20090079949A1
公开(公告)日：2009-03-26
申请号：US12289591
申请日：2008-10-30
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroren Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroren Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/70866 , G03F9/7026 , G03F9/7034
摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
摘要翻译： 浸没式光刻在基材曝光完成后，检测器用于检测残留在基片和/或基片台上的任何残留液体。
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73.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07508487B2
公开(公告)日：2009-03-24
申请号：US10719065
申请日：2003-11-24
申请人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Willem Van Schaik , Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Heine Melle Mulder
发明人： Johannes Catharinus Hubertus Mulkens , Paul Van Der Veen , Willem Van Schaik , Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Johannes Hubertus Josephina Moors , Heine Melle Mulder
CPC分类号： G03F7/70558 , G03F7/70883 , G03F7/70933 , G03F7/70941
摘要： In a lithographic projection system, the radiation energy delivered to the substrate needs to be accurately controlled. Attenuation by injecting an absorbent gas into a volume through which the radiation passes is a convenient way to control the energy. Additionally, the interaction between gasses and the radiation may be used to measure the energy of the radiation with minimal disruption to the radiation.
摘要翻译： 在光刻投影系统中，需要准确地控制传送到基板的辐射能量。 通过将吸收气体注入到辐射通过的体积中的衰减是控制能量的便利方式。 此外，气体和辐射之间的相互作用可用于以最小的辐射破坏来测量辐射的能量。
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公开(公告)号：US07372541B2
公开(公告)日：2008-05-13
申请号：US11239480
申请日：2005-09-30
申请人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
发明人： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen , Sjoerd Nicolaas Lambertus Donders
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
摘要翻译： 在光刻投影装置中，结构围绕投影系统与光刻投影装置的基板台之间的空间。 在结构和衬底的表面之间使用气体以在空间中容纳液体。
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公开(公告)号：US20080057440A1
公开(公告)日：2008-03-06
申请号：US11512434
申请日：2006-08-30
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.
摘要翻译： 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。
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公开(公告)号：US07245355B2
公开(公告)日：2007-07-17
申请号：US11246549
申请日：2005-10-11
CPC分类号： G03F7/70341 , G02B5/3091 , G02B27/0043 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.
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公开(公告)号：US07245353B2
公开(公告)日：2007-07-17
申请号：US10961408
申请日：2004-10-12
申请人： Johannes Catharinus Hubertus Mulkens , Wil{acute over (h)}elmus Petrus De Boeij , Carsten Andreas Kohler
发明人： Johannes Catharinus Hubertus Mulkens , Wil{acute over (h)}elmus Petrus De Boeij , Carsten Andreas Kohler
CPC分类号： G03F7/70341 , G02B5/3091 , G02B27/0043 , G03F7/70191 , G03F7/70566 , G03F7/70966
摘要： To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.
摘要翻译： 为了补偿光刻投影装置中的掩模的双折射，测量掩模的双折射并将其作为双折射数据存储在数据存储装置中。 双折射补偿元件设置在光刻投影设备的光路中。 将补偿元件的适当调整确定为最佳地减小掩模双折射对基板水平的偏振状态的影响。
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公开(公告)号：US07224431B2
公开(公告)日：2007-05-29
申请号：US11062765
申请日：2005-02-22
CPC分类号： G03F7/70591 , G03F7/70341 , G03F7/7085 , G03F9/7046
摘要： In, for example, an immersion lithography apparatus, a sensor that would normally be provided on the substrate table is replaced by a retro-reflector on the substrate table and a sensor at, for example, patterning device level. This may avoid the need to make the sensor compatible with the immersion liquid and also make incoupling of radiation easier since the numerical aperture may be less at, for example, patterning device level.
摘要翻译： 例如，浸没式光刻装置，通常设置在基板台上的传感器由基板台上的逆反射器和例如图案形成装置的传感器代替。 这可以避免使得传感器与浸没液体兼容并且还使得辐射的耦合更容易，因为例如在图案形成装置水平上的数值孔径可能较小。
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公开(公告)号：US07193681B2
公开(公告)日：2007-03-20
申请号：US10946344
申请日：2004-09-22
申请人： Christiaan Alexander Hoogendam , Erik Theodorus Maria Bijlaart , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Christiaan Alexander Hoogendam , Erik Theodorus Maria Bijlaart , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
CPC分类号： G03F7/70341
摘要： A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparatus by a stopper.
摘要翻译： 公开了一种光刻投影装置，其中至少部分地将液体限制在投影系统和基板之间的空间的液体限制系统通过止动器限制其在装置的光轴方向上的运动。
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公开(公告)号：US07161654B2
公开(公告)日：2007-01-09
申请号：US11001082
申请日：2004-12-02
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.
摘要翻译： 公开了一种浸没式光刻设备，其包括液体供应系统，该液体供应系统具有被配置为将液体供应到光刻设备的投影系统与基板之间的空间的入口以及被构造成去除至少部分液体的出口，液体供应 系统构造成围绕基本上垂直于衬底的曝光平面的轴旋转入口，出口或两者。
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