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公开(公告)号：US20190100282A1
公开(公告)日：2019-04-04
申请号：US16148567
申请日：2018-10-01
申请人： SILCOTEK CORP.
摘要： Articles having a hydrophobically-coated region and processes of using such articles are disclosed. The article includes a substrate material and a hydrophobically-coated region on the substrate material, the hydrophobically-coated region being contacted or configured for contact with a fluid. The hydrophobically-coated region is configured to repulse the fluid from the article while the article is moving through the fluid. The process includes using the article by moving the article through the fluid wherein the hydrophobically-coated region repulses the fluid from the article.
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公开(公告)号：US09975143B2
公开(公告)日：2018-05-22
申请号：US14784731
申请日：2014-05-14
申请人： SILCOTEK CORP.
发明人： David A. Smith , Paul H. Silvis
摘要： Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.
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公开(公告)号：US09915001B2
公开(公告)日：2018-03-13
申请号：US14821949
申请日：2015-08-10
申请人： SILCOTEK CORP.
发明人： Min Yuan , David A. Smith , Paul H. Silvis , James B. Mattzela
摘要： A chemical vapor deposition process and coated article are disclosed. The chemical vapor deposition process includes positioning an article in a chemical vapor deposition chamber, then introducing a deposition gas to the chemical vapor deposition chamber at a sub-decomposition temperature that is below the thermal decomposition temperature of the deposition gas, and then heating the chamber to a super-decomposition temperature that is equal to or above the thermal decomposition temperature of the deposition gas resulting in a deposited coating on at least a surface of the article from the introducing of the deposition gas. The chemical vapor deposition process remains within a pressure range of 0.01 psia and 200 psia and/or the deposition gas is dimethylsilane. The coated article includes a substrate subject to corrosion and a deposited coating on the substrate, the deposited coating having silicon, and corrosion resistance.
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64.发明申请公开(公告)号：US20170130334A1
公开(公告)日：2017-05-11
申请号：US14933295
申请日：2015-11-05
申请人： SILCOTEK CORP.
发明人： Min YUAN , Paul H. SILVIS , David A. SMITH , James B. MATTZELA
IPC分类号： C23C16/455 , C04B41/52 , C04B41/45 , C23C16/56
CPC分类号： C23C16/45557 , C04B41/456 , C04B41/524 , C23C16/24 , C23C16/30 , C23C16/401 , C23C16/56
摘要： Thermal chemical vapor deposition split-functionalizing processes, coatings, and products are disclosed. The thermal chemical vapor deposition split-functionalizing process includes positioning an article within an enclosed chamber, functionalizing the article within a first temperature range for a first period of time, and then further functionalizing the article within a second temperature range for a second period of time. The thermal chemical vapor deposition split-functionalized product includes a functionalization formed by functionalizing within a first temperature range for a first period of time and a further functionalization formed by further functionalizing within a second temperature range for a second period of time.
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公开(公告)号：US20170088947A1
公开(公告)日：2017-03-30
申请号：US15276043
申请日：2016-09-26
申请人： SILCOTEK CORP.
发明人： David A. SMITH
摘要： Thermal chemical vapor deposition functionalization processes, thermal chemical vapor deposition functionalizations, and thermal chemical vapor deposition functionalized articles are disclosed. The thermal chemical vapor deposition functionalization process includes modifying a surface by thermally reacting a gas to form a thermal chemical vapor deposition functionalization on the surface. The gas is selected from the group consisting of methyltrimethoxysilane, methyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylmethoxysilane, trimethylethoxysilane, and combinations thereof. The thermal chemical vapor deposition functionalization and the thermal chemical vapor deposition functionalized article are produced by the thermal chemical vapor deposition process.
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公开(公告)号：US20160059260A1
公开(公告)日：2016-03-03
申请号：US14784731
申请日：2014-05-14
申请人： SILCOTEK CORP.
发明人： David A. SMITH , Paul H. SILVIS
摘要： Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor de position functionalization is not of a refrigerator shelf or a windshield.
摘要翻译： 化学气相沉积制品和方法包括在材料上的化学气相沉积功能化，所述材料包括碳的sp3排列。 化学气相沉积功能化被定位成与工艺流体，烃，分析物，排气或其组合接触。 另外或替代地，化学气相脱除官能化不是冰箱架或挡风玻璃。
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公开(公告)号：US20150064376A1
公开(公告)日：2015-03-05
申请号：US14538021
申请日：2014-11-11
申请人： SILCOTEK CORP.
发明人： David A. SMITH , Paul H. SILVIS
IPC分类号： B05D1/00
CPC分类号： B05D1/60 , B05D5/083 , B05D2201/02 , B05D2202/00 , B05D2203/35 , C23C16/00 , C23C16/56 , Y10T428/13 , Y10T428/218 , Y10T428/24025 , Y10T428/2933 , Y10T428/2962 , Y10T428/31612 , Y10T428/31663
摘要： According to an embodiment of the present disclosure, a coated automotive article includes a functionalized layer applied to at least one surface of the automotive article by chemical deposition, wherein the functionalized layer is selected from a fluoro functional group. The functionalized layer is a layer selected from the group consisting of an oxidized-then-functionalized layer, an organofluoro treated layer, a fluorosilane treated layer, an organofluorotrialkoxysilanes treated layer, an organofluorosilylhydrides-treated layer, an organofluoro silyl treated layer, a tridecafluoro 1,1,2,2-tetrahydrooctylsilane treated layer, an organofluoro alcohol treated layer, a pentafluoropropanol treated layer, an allylheptafluoroisopropyl ether treated layer, a (perfluorobutyl) ethylene treated layer, a (perfluorooctyl) ethylene treated layer, a (perfluoroalkyl) ethylene treated layer, and combinations thereof.
摘要翻译： 根据本公开的实施例，涂覆的汽车制品包括通过化学沉积施加到汽车制品的至少一个表面的官能化层，其中所述官能化层选自氟官能团。 官能化层是选自氧化官能化层，有机氟处理层，氟硅烷处理层，有机氟三烷氧基硅烷处理层，有机氟代硅烷化处理层，有机氟代甲硅烷基处理层，十三氟1 ，1,2,2-四氢辛基硅烷处理层，有机氟醇处理层，五氟丙醇处理层，烯丙基三氟异丙醚处理层，（全氟丁基）乙烯处理层，（全氟辛基）乙烯处理层，（全氟烷基）乙烯处理层 层及其组合。
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公开(公告)号：US20150030885A1
公开(公告)日：2015-01-29
申请号：US14340675
申请日：2014-07-25
申请人： SILCOTEK CORP.
发明人： David A. SMITH
CPC分类号： C23C16/0218 , B05D1/60 , B05D5/08 , C23C16/0272 , C23C16/30 , C23C16/56
摘要： A chemical vapor deposition process and article formed by a chemical vapor deposition process are disclosed. The process includes pretreating a substrate by exposing the substrate to an oxidative environment for a period of time, decomposing a material to form a layer on the substrate, and functionalizing one or both of the layer and the substrate. The pretreating pre-oxidizes the substrate.
摘要翻译： 公开了化学气相沉积工艺和通过化学气相沉积工艺形成的制品。 该方法包括通过将衬底暴露于氧化环境一段时间来预处理衬底，分解材料以在衬底上形成层，并使层和衬底中的一个或两个功能化。 预处理预氧化底物。
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公开(公告)号：USD689107S1
公开(公告)日：2013-09-03
申请号：US29437563
申请日：2012-11-19
申请人： Silcotek Corp.
设计人： William David Grove
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