公开(公告)号：US20020086224A1

公开(公告)日：2002-07-04

申请号：US10033081

申请日：2001-12-27

Inventor： Tsuneo Kanda

IPC: H01J037/08 ,  G21K005/10 ,  G03C005/00 ,  G03B027/42 ,  G03F009/00

CPC classification number: G03F1/62 ,  G03F1/72 ,  G03F7/70308 ,  G03F7/70983

Abstract: There is to provide a mask including a transparent member at a side of a surface of a base, a pattern being formed on the surface, and a correction part for correcting a change in an optical path of the transparent member.

Abstract translation: 提供一种掩模，其包括在基底表面侧的透明构件，形成在表面上的图案，以及用于校正透明构件的光路变化的校正部。

公开(公告)号：US20020020824A1

公开(公告)日：2002-02-21

申请号：US09768722

申请日：2001-01-25

Inventor： Hiroyuki Itoh

IPC: G21K005/10 ,  H01J037/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

Abstract: It is an object of the present invention to reduce a number of deflection awaiting and a connection error between shots by scanning and exposing a formed beam having a large area. To achieve the object, a continuous scanning deflector and a scan limiter are added to a variable forming type electron beam column and the drawing is performed such that a state in which the electron beam is limited by the scan limiter is continuous to a state in which the electron beam is irradiated on a face of a sample. According to this structure, the number of deflection awaiting and the connection error between shots are reduced and further, a high-speed and highly accurate drawing of a 45null slanted figure is made possible.

Abstract translation: 本发明的目的是通过扫描和曝光具有大面积的成形光束来减少等待的偏转次数和拍摄之间的连接误差。 为了实现该目的，将连续的扫描偏转器和扫描限制器添加到可变形成型电子束柱，并且进行绘图，使得电子束被扫描限制器限制的状态连续到其中 电子束照射在样品的表面上。 根据该结构，能够减少等待时的偏转次数和拍摄间的连接误差，进一步提高45°斜面的高精度和高精度的绘图。

公开(公告)号：US20020003638A1

公开(公告)日：2002-01-10

申请号：US09859806

申请日：2001-05-16

Inventor： Tetsuya Matsuyama

IPC: G03H001/02 ,  G21K005/10 ,  H01J037/08

CPC classification number: G03H1/0486 ,  G03H2001/0489

Abstract: The invention provides a hologram recording or replicating optical system wherein a misalignment-with-time of the center of a laser generated beam is automatically corrected so that the color balance in a color hologram surface, for instance, can be well maintained with no disturbance. In the hologram recording or replicating optical system for irradiating a photosensitive material 20 with a beam from a laser 31 through a pinhole 10, a beam position correcting mechanism 32 and a beam splitter 33 are located in an optical path between the laser 31 and the pinhole 10, and a laser beam position detector 35 is located at a position in an optical path split by the beam splitter 33 and conjugate to the pinhole 10, so that the beam position correcting mechanism 32 can be operated on the basis of a beam position error signal obtained from the laser beam position detector 35 to keep the position of the beam incident on the pinhole 10 always constant.

Abstract translation: 本发明提供一种全息记录或复制光学系统，其中激光产生光束的中心的随时间偏移被自动校正，使得例如彩色全息图表面中的色彩平衡能够在没有干扰的情况下被良好地维持。 在用激光31通过针孔10照射感光材料20的全息图记录或复制光学系统中，光束位置校正机构32和分束器33位于激光器31和针孔之间的光路中 如图10所示，并且激光束位置检测器35位于由分束器33分开并与针孔10分开的光路中的位置处，使得光束位置校正机构32可以基于光束位置误差 从激光束位置检测器35获得的信号保持入射在针孔10上的光束的位置总是恒定的。

公开(公告)号：US20010051304A1

公开(公告)日：2001-12-13

申请号：US09899881

申请日：2001-07-05

Inventor： Alan R. Stivers ,  Edita Tejnil

IPC: H01J037/08 ,  G21K005/10 ,  G03C005/00 ,  C23C014/00 ,  G21K005/00 ,  G03F009/00 ,  C23C014/32

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/84 ,  G21K2201/067

Abstract: A reflective mask having non-reflective and reflective regions. The reflective regions are reflective of light at an inspection wavelength and a semiconductor processing wavelength and the non-reflective regions are substantially non-reflective of light at the inspection wavelength and the semiconductor processing wavelength. The contrast of reflected light off of the non-reflective and reflective regions is greater than 0.210 at either of the two wavelengths.

Abstract translation: 具有非反射和反射区域的反射掩模。 反射区域在检查波长和半导体处理波长下反射光，并且非反射区域在检查波长和半导体处理波长处基本上不反射光。 非反射和反射区域的反射光的对比度在两个波长中的任一个处都大于0.210。

公开(公告)号：US20010048084A1

公开(公告)日：2001-12-06

申请号：US09865454

申请日：2001-05-29

Inventor： Shigeyuki Uzawa

IPC: G21K005/10 ,  H01J037/08

CPC classification number: G03F7/70525 ,  G03F7/70933 ,  G21K5/04

Abstract: An exposure apparatus includes a plurality of purge spaces delimited along the optical path between the laser light source and the substrate by housings the boundary members of which are invisible to the exposing light, and pressure regulating unit for exercising control in such a manner that the pressure within each purge space attains a predetermined value. In the exposure apparatus that is purged in sections, therefore, it is possible to reduce the amount of deformation of the end faces between mutually adjacent purge spaces, e.g., the end face of a projection optics unit.

Abstract translation: 曝光装置包括沿着激光光源和基板之间的光路限定的多个吹扫空间，其外围部件对于曝光灯是不可见的;以及压力调节单元，以这样的方式进行控制，即压力 在每个净化空间内达到预定值。 因此，在分段吹扫的曝光装置中，可以减少例如投影光学单元的端面之间的相邻的吹扫空间之间的端面的变形量。

公开(公告)号：US20010038953A1

公开(公告)日：2001-11-08

申请号：US09842056

申请日：2001-04-26

Inventor： Masami Tsukamoto ,  Keiko Chiba

IPC: G03F009/00 ,  G21K005/00 ,  C23C014/00 ,  C23C014/32 ,  G03C005/00 ,  G21K005/10 ,  H01J037/08

CPC classification number: G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  C23C8/04 ,  C23C14/3464 ,  C23C28/00 ,  G03F1/24 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70283 ,  G21K2201/067

Abstract: A reflection-type mask for use in exposing a pattern onto a photosensitive material, wherein the mask includes a reflection area, having a multilayer film, for reflecting exposure light, and a non-reflection area which does not reflect the exposure light, the reflection area and the non-reflection area forming a mask pattern, wherein at least one layer of the multilayer film consists of an impurity semiconductor, whereby bad influences, for example, caused by poor conduction of the multilayer film at mask-production stage, can be prevented.

Abstract translation: 一种用于将图案曝光到感光材料上的反射型掩模，其中所述掩模包括具有用于反射曝光光的多层膜的反射区域和不反映曝光光的非反射区域，所述反射 区域和形成掩模图案的非反射区域，其中多层膜的至少一层由杂质半导体构成，由此，例如由掩模制造阶段的多层膜的导通性差导致的不良影响可以是 防止了

公开(公告)号：US20040212866A1

公开(公告)日：2004-10-28

申请号：US10851854

申请日：2004-05-20

Applicant: OLYMPUS OPTICAL CO., LTD.

Inventor： Tomio Endo ,  Takeshi Yamagishi ,  Katsuya Sadamori

IPC: G02B026/02 ,  G02B021/00 ,  G21K005/10 ,  H01J037/08

CPC classification number: G02B21/0032 ,  G02B21/0024 ,  G02B21/0044

Abstract: In a pattern formation member adopted to a sectioning image observation apparatus which selectively irradiates a light from a light source to a sample, scans the sample, and acquires a light from the sample as a sectioning image, the pattern formation member comprises an irradiation section and a cutoff section, each of the irradiation section and the cutoff section is in a straight pattern, and these straight patterns are disposed alternatively.

公开(公告)号：US20040178366A1

公开(公告)日：2004-09-16

申请号：US10806414

申请日：2004-03-23

Applicant: Hitachi, Ltd.

Inventor： Kimiaki Ando ,  Haruo Yoda ,  Rikio Tomiyoshi ,  Masamichi Kawano

IPC: H01J037/08

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/3174 ,  H01J2237/31776

Abstract: In the case of drawing an oblique figure pattern, when drawing an oblique figure by using a slender rectangular beam, a problem occurs that edge roughness occurs at an oblique-side portion to deteriorate the drawing accuracy. The present invention solves the above problem and provides an electron-beam drawing apparatus and an electron-beam drawing method capable of accurately drawing even an oblique figure. A first rectangular aperture and a second parallelogrammatic aperture are used and a variable parallelogrammatic electron beam formed by two apertures is used to draw a desired pattern on the surface of a sample. Moreover, oblique-side-portion-contour decomposition means is used to draw an oblique-side portion by a variable parallelogram and the inside of an oblique side by a triangle and a quadrangle (rectangle).

Abstract translation: 在绘制斜图形图形的情况下，当使用细长矩形波束绘制斜图时，会出现在倾斜侧部分发生边缘粗糙度以降低绘图精度的问题。 本发明解决了上述问题，并且提供了能够精确地绘制斜图的电子束描绘装置和电子束描绘方法。 使用第一矩形孔和第二平行四边形孔，并且使用由两个孔形成的可变平行四边形电子束来在样品的表面上画出期望的图案。 此外，倾斜侧部分轮廓分解装置用于通过可变的平行四边形和斜边的内侧以三角形和四边形（矩形）绘制斜侧部分。

公开(公告)号：US20040119025A1

公开(公告)日：2004-06-24

申请号：US10667277

申请日：2003-09-19

Inventor： C. Christopher Klepper ,  James M. Williams

IPC: G21K005/10 ,  H01J037/08 ,  H01J027/00 ,  H01L021/26 ,  H01L021/425

CPC classification number: H05H1/54 ,  G21K1/08 ,  H01J37/3171 ,  H01L21/26513

Abstract: A boron ion plasma, generated by use of a cathodic arc, is manipulated and delivered to a large flat product such as a silicon wafer with boron ion energies suitable for incorporation of boron atoms into solid state devices as one of the key steps in manufacturing solid state electronics and with uniformity of boron dose over the area suitable for the scale of manufacturing desired.

Abstract translation: 通过使用阴极电弧产生的硼离子等离子体被操纵并输送到具有适合于将硼原子并入固态器件的硼离子能量的大平坦产品例如硅晶片，作为制造固体的关键步骤之一 并且在适合于所需制造规模的区域上具有硼剂量的均匀性。

公开(公告)号：US20040104357A1

公开(公告)日：2004-06-03

申请号：US10712594

申请日：2003-11-12

Inventor： Kouji Fujiyoshi ,  Masami Takigawa

IPC: G21G005/00 ,  A61N005/00 ,  G01J001/00 ,  G01N021/00 ,  H01J037/08 ,  G21K005/10 ,  G01N023/00

CPC classification number: H01J37/3023 ,  H01J2237/31762

Abstract: An electron beam exposure apparatus for exposing a wafer with an electron beam includes a section for generally controlling a wafer exposing system, a first buffer memory for temporarily storing exposure data, a second buffer memory for temporarily storing the exposure data, a first exposing section for irradiating the wafer with an electron beam based on exposure data output from the first buffer memory, and a first comparing section for comparing exposure data output from the first buffer memory with exposure data output from the second buffer memory and notifying the comparison results to the general control section. Further, an exposure apparatus and a pattern error detection method for accurately detecting an error of an exposure pattern formed to a wafer is disclosed.

Abstract translation: 用电子束曝光晶片的电子束曝光装置包括用于大体控制晶片曝光系统的部分，用于临时存储曝光数据的第一缓冲存储器，用于临时存储曝光数据的第二缓冲存储器，用于 基于从第一缓冲存储器输出的曝光数据，用电子束照射晶片;以及第一比较部分，用于将从第一缓冲存储器输出的曝光数据与从第二缓冲存储器输出的曝光数据进行比较，并将比较结果通知给一般 控制部分。 此外，公开了一种用于精确检测形成于晶片的曝光图案的误差的曝光装置和图案错误检测方法。