Abstract:
The invention relates to an optical system for spectral analysis devices particularly for use in atomic emission spectroscopy in which the aberrations, astigmatis and coma are compensated separately, comprising two concave spherical reflectors adjacently arranged and having their vertices equidistantly located relative to a center of a dispersing member. The latter has a dispersion plane at right angles to the dispersing structure of the dispersing member and to its surface, the vertices are located in said dispersion plane. The center beams originating from an excitation light source are reflected at the reflectors in reflection planes which are at right angles to the dispersion plane. The light entrance of the optical system comprises two slits the images of which coincide in a focal plane. The center of the focal plane and the light entrance have a same distance to the dispersion plane and are located on different sides of the latter.
Abstract:
A cooled echelle grating spectrometer for detecting wavelengths between one micron and fifteen microns. More specifically, a spectrometer is disclosed having a cross-dispersing grating for ordering infrared energy, and an echelle grating for further ordering of the infrared energy. Means are disclosed to direct infrared energy to the cross-dispersing grating and then to the echelle grating. Ordered radiation from the echelle grating is sensed by a detecting means. Means are also disclosed for cooling the cross-dispersing grating, the echelle grating and the detecting means so that background radiation can be minimized. In a specific embodiment the cross-dispersing grating and echelle grating are in separate enclosed volumes having access to each other through a single intermediate aperture, reflected energy from the cross-dispersing grating being focused so as to pass through the intermediate aperture and then collimated and directed to the echelle grating for further ordering. Also disclosed is use of a Schmidt camera for focusing the further ordered radiation from the echelle grating onto a detector array having individual detectors dispersed on a plane which substantially corresponds to a curved focal plane of the Schmidt camera. A spectrometer constructed according to the teachings of the present invention will continuously cover the spectrum between one micron and fifteen microns and have a resolution of 0.1 cm..sup.-1.
Abstract:
A method and apparatus by which spectral orders produced by a main grating are separated and focused on a focal surface of restricted size, using a combination of grating and prism for the separation of spectral orders, which provides for a relatively uniform spacing of the spectral orders over the entire wave length range within the restricted focal surface.
Abstract:
A method of optical spectroscopy for analysing a sample using an optical spectrometer is provided. The method comprises obtaining a sample spectrum of the sample using the optical spectrometer and obtaining a blank spectrum using the optical spectrometer. The blank spectrum comprises structured background radiation which is correlated with the sample spectrum. A cross-correlation of the sample spectrum and the blank spectrum is determined. A mapped blank spectrum is generated by mapping the blank spectrum to the sample spectrum based on the cross-correlation, and the mapped blank spectrum is subtracted from the sample spectrum to generate a background corrected sample spectrum.
Abstract:
A spectral feature of a pulsed light beam produced by an optical source is estimated by modifying the wavelength of the pulsed light beam based on a predefined repeating pattern having a pattern period including a plurality of steps, the modification including shifting the wavelength of the pulsed light beam by a wavelength offset from a baseline wavelength for each step in the pattern period; measuring the wavelength of the light beam for each step in the pattern period as the wavelength is modified across the pattern; and estimating a spectral feature of the pulsed light beam over an evaluation window that includes all of the steps within the pattern period based at least in part on the measured wavelength of the light beam for each step in the pattern period.
Abstract:
A diffraction grating structure having ultra-high density of grooves comprises an echellette substrate having periodically repeating recessed features, and a multi-layer stack of materials disposed on the echellette substrate. The surface of the diffraction grating is planarized, such that layers of the multi-layer stack form a plurality of lines disposed on the planarized surface of the structure in a periodical fashion, wherein lines having a first property alternate with lines having a dissimilar property on the surface of the substrate. For example, in one embodiment, lines comprising high-Z and low-Z materials alternate on the planarized surface providing a structure that is suitable as a diffraction grating for EUV and soft X-rays. In some embodiments, line density of between about 10,000 lines/mm to about 100,000 lines/mm is provided.
Abstract:
An Echelle spectrometer arrangement (10) with internal order separation contains an Echelle grating (34) and a dispersing element (38) for order separation so that a two-dimensional spectrum having a plurality of separate orders (56) can be generated, an imagine optical system (18, 22, 28, 46), a flat-panel detector (16), and predispersion means (20) for predispersing the radiation into the direction of traverse dispersion of the dispersion element (38). The arrangement is characterized in that the predispersion means (20) comprise a predispersion element which is arranged along the optical path behind the inlet spacing (12) inside the spectrometer arrangement. The imaging optical system is designed in such a manner that the predispersed radiation can be imaged onto an additional image plane (24) which does not have any boundaries in the predispersion direction and which is arranged along the optical path between the predispersion element (20) and the echelle grating (34). Optical means (20, 68) in the area of the predispersed spectrum are arranged to influence the spatial and/or the spectral beam density distribution on the detector (16).
Abstract:
A spectrograph including a primary mirror, a secondary mirror, and a tertiary mirror forming a TMA having a common vertex axis. The spectrograph also may include a collimating mirror, a diffraction grating, and a dispersive prism. The collimating mirror and an entrance aperture form an interchangeable module. Radiation received through the entrance aperture is reflected in a collimated pattern towards an aperture stop. The diffraction grating, located between the collimating mirror and prism, diffracts radiation passed through the aperture stop into multiple beams directed onto the prism. A flat mirror, located to one side of the vertex axis. receives and reflects the multiple beams exiting the prism onto the primary mirror, where they are reflected onto the secondary mirror. The secondary mirror reflects the beams to the tertiary mirror where they are reflected onto an image plane located on the other side of the vertex axis.
Abstract:
A portable spectrograph including a primary mirror, a secondary mirror, and a tertiary mirror forming a TMA having a common vertex axis, a diffraction grating, and a dispersive prism, where the portable spectrograph can detect wavelengths between 150 nm and 1.1 μm. The portable spectrograph also may include a collimating mirror and an entrance aperture, which form an interchangeable module. Radiation received through the entrance aperture is reflected in a collimated pattern towards an aperture stop. The diffraction grating, located between the collimating mirror and prism, diffracts radiation passed through the aperture stop into multiple beams directed onto the prism. A flat mirror, located to one side of the vertex axis receives and reflects the multiple beams exiting the prism onto the primary mirror, where they are reflected onto the secondary mirror. The secondary mirror reflects the beams to the tertiary mirror where they are reflected onto an image plane located on the other side of the vertex axis.
Abstract:
An illumination subsystem configured to provide illumination for a measurement system includes first and second light sources configured to generate light for measurements in different wavelength regimes. The illumination subsystem also includes a TIR prism configured to be moved into and out of an optical path from the first and second light sources to the measurement system. If the TIR prism is positioned out of the optical path, light from only the first light source is directed along the optical path. If the TIR prism is positioned in the optical path, light from only the second light source is directed along the optical path. Various measurement systems are also provided. One measurement system includes an optical subsystem configured to perform measurements of a specimen using light in different wavelength regimes directed along a common optical path. The different wavelength regimes include vacuum ultraviolet, ultraviolet, visible, and near infrared wavelength regimes.