Ultra low RA sensors
    52.
    发明申请
    Ultra low RA sensors 有权
    超低RA传感器

    公开(公告)号:US20090269617A1

    公开(公告)日:2009-10-29

    申请号:US12150191

    申请日:2008-04-25

    IPC分类号: G11B5/39 B05D5/12

    摘要: A high performance TMR sensor with a spacer including at least one Cu layer and one or more MgO layers is disclosed. Optionally, Cu may be replaced by one of Au, Zn, Ru, or Al. In addition, there may be a dopant such as Zn, Mn, Al, Cu, Ni, Cd, Cr, Ti, Zr, Hf, Ru, Mo, Nb, Co, or Fe in the MgO layer. In an alternative embodiment, the MgO layer may be replaced by other low band gap insulating or semiconductor materials. A resonant tunneling mechanism is believed to be responsible for achieving an ultra-low RA of

    摘要翻译: 公开了具有包括至少一个Cu层和一个或多个MgO层的间隔物的高性能TMR传感器。 任选地,Cu可以被Au,Zn,Ru或Al中的一种取代。 此外,在MgO层中可以存在Zn,Mn,Al,Cu,Ni,Cd,Cr,Ti,Zr,Hf,Ru,Mo,Nb,Co或Fe等掺杂剂。 在替代实施例中,MgO层可以由其他低带隙绝缘或半导体材料代替。 据信谐振隧穿机构负责实现<0.4兆欧姆 - 厘米2的超低RA与14%的MR,低磁致伸缩和约20Oe的低Hin值的组合。 在Cu / MgO / Cu,MgO / Cu / MgO,Cu / MgO,MgO / Cu,Cu / MgO / Cu / MgO等的间隔构造中,Cu层的厚度为0.1〜10埃,MgO的厚度为5〜 MgO / Cu和(Cu / MgO)n / Cu多层。

    Seed layer for TMR or CPP-GMR sensor
    53.
    发明申请
    Seed layer for TMR or CPP-GMR sensor 有权
    种子层用于TMR或CPP-GMR传感器

    公开(公告)号:US20090251829A1

    公开(公告)日:2009-10-08

    申请号:US12080277

    申请日:2008-04-02

    IPC分类号: G11B5/33

    摘要: A composite seed layer that reduces the shield to shield distance in a read head while improving Hex and Hex/Hc is disclosed and has a SM/A/SM/B configuration in which the SM layers are soft magnetic layers, the A layer is made of at least one of Co, Fe, Ni, and includes one or more amorphous elements, and the B layer is a buffer layer that contacts the AFM layer in the spin valve. The SM/A/SM stack together with the S1 shield forms an effective shield such that the buffer layer serves as the effective seed layer with a thickness as low as 5 Angstroms while maintaining a blocking temperature of 260° C. in the AFM layer. The lower SM layer may be omitted. Examples of the amorphous layer are CoFeB, CoFeZr, CoFeNb, CoFeHf, CoFeNiZr, CoFeNiHf, and CoFeNiNbZr while the buffer layer may be Cu, Ru, Cr, Al, or NiFeCr.

    摘要翻译: 公开了一种复合种子层,其在改善Hex和Hex / Hc的同时减小了读头中屏蔽距离的屏蔽,并具有SM / A / SM / B构造,其中SM层是软磁性层,制成A层 的Co,Fe,Ni中的至少一种,并且包括一个或多个非晶元素,并且B层是与自旋阀中的AFM层接触的缓冲层。 SM / A / SM堆叠与S1屏蔽形成有效的屏蔽,使得缓冲层用作有效种子层,其厚度低至5埃,同时在AFM层中保持260℃的阻挡温度。 可以省略下层SM层。 非晶层的实例是CoFeB,CoFeZr,CoFeNb,CoFeHf,CoFeNiZr,CoFeNiHf和CoFeNiNbZr,而缓冲层可以是Cu,Ru,Cr,Al或NiFeCr。

    Novel free layer design for TMR/CPP device
    54.
    发明申请
    Novel free layer design for TMR/CPP device 审中-公开
    TMR / CPP设备的新型自由层设计

    公开(公告)号:US20090121710A1

    公开(公告)日:2009-05-14

    申请号:US11983718

    申请日:2007-11-09

    IPC分类号: G01R33/09 G01R3/00 H01L21/00

    CPC分类号: G01R33/09

    摘要: A TMR sensor and a CPP GMR sensor all include a free layer that is of the form CoFexBy/non-magnetic layer/NiFez or of the form CoFe/CoFeB/non-magnetic layer/NiFe, where, in one embodiment, the thickness of the non-magnetic layer is less than approximately 15 angstroms and the atom percentage x, z of Fe can vary between 0 and 70% for x and 0 and 100% for z and the atom percentage, y, of B can vary between 0 and 30%. This arrangement can produce a 5-10% improvement in dR/R and can allow the coupling field between the CoFeB and the NiFe to be strong enough that an in-stack biasing of the CoFeB layer occurs and the hysteresis behavior and stability of the sensor is improved.

    摘要翻译: TMR传感器和CPP GMR传感器都包括形式为CoFexBy /非磁性层/ NiFez或CoFe / CoFeB /非磁性层/ NiFe形式的自由层,其中在一个实施例中, 非磁性层小于约15埃,Fe的原子百分比x,z可以在0和70%之间变化,对于z,Z的原子百分比y可以在0和 30%。 这种布置可以在dR / R中产生5-10%的改进,并且可以允许CoFeB和NiFe之间的耦合场足够强,使得CoFeB层的堆叠偏压发生,并且传感器的滞后特性和稳定性 改进了

    TMR device with improved MgO barrier
    58.
    发明授权
    TMR device with improved MgO barrier 有权
    具有改善的MgO屏障的TMR器件

    公开(公告)号:US08202572B2

    公开(公告)日:2012-06-19

    申请号:US12927698

    申请日:2010-11-22

    IPC分类号: H01L21/00

    摘要: A method of forming a high performance magnetic tunnel junction (MTJ) is disclosed wherein the tunnel barrier includes at least three metal oxide layers. The tunnel barrier stack is partially built by depositing a first metal layer, performing a natural oxidation (NOX) process, depositing a second metal layer, and performing a second NOX process to give a MOX1/MOX2 configuration. An uppermost metal layer on the MOX2 layer is not oxidized until after the MTJ stack is completely formed and an annealing process is performed to drive unreacted oxygen in the MOX1 and MOX2 layers into the uppermost metal layer. In an alternative embodiment, a plurality of metal oxide layers is formed on the MOX1 layer before the uppermost metal layer is deposited. The resulting MTJ stack has an ultralow RA around 1 ohm-μm2 and maintains a high magnetoresistive ratio characteristic of a single metal oxide tunnel barrier layer.

    摘要翻译: 公开了一种形成高性能磁隧道结(MTJ)的方法,其中隧道势垒包括至少三个金属氧化物层。 通过沉积第一金属层,执行自然氧化(NOX)工艺,沉积第二金属层以及执行第二NOX工艺以产生MOX1 / MOX2配置来部分构建隧道势垒堆叠。 在MOX2层上的最上层的金属层直到MTJ堆叠完全形成之后才被氧化,并且进行退火处理以将MOX1和MOX2层中的未反应的氧气驱入最上层的金属层。 在替代实施例中,在最上层金属层被沉积​​之前,在MOX1层上形成多个金属氧化物层。 所得到的MTJ堆叠具有约1欧姆 - μm2的超低RA,并且保持单个金属氧化物隧道势垒层的高磁阻比特性。

    TMR device with novel free layer structure
    59.
    发明申请
    TMR device with novel free layer structure 有权
    TMR器件具有新颖的自由层结构

    公开(公告)号:US20120038012A1

    公开(公告)日:2012-02-16

    申请号:US13317485

    申请日:2011-10-19

    IPC分类号: H01L29/82

    摘要: A composite free layer having a FL1/insertion/FL2 configuration is disclosed for achieving high dR/R, low RA, and low λ in TMR or GMR sensors. Ferromagnetic FL1 and FL2 layers have (+) λ and (−) λ values, respectively. FL1 may be CoFe, CoFeB, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, or Nb. FL2 may be CoFe, NiFe, or alloys thereof with Ni, Ta, Mn, Ti, W, Zr, Hf, Tb, Nb, or B. The thin insertion layer includes at least one magnetic element such as Co, Fe, and Ni, and at least one non-magnetic element selected from Ta, Ti, W, Zr, Hf, Nb, Mo, V, Cr, or B. In a TMR stack with a MgO tunnel barrier, dR/R>60%, λ˜1+10−6, and RA=1.2 ohm-um2 when FL1 is CoFe/CoFeB/CoFe, FL2 is CoFe/NiFe/CoFe, and the insertion layer is CoTa or CoFeBTa.

    摘要翻译: 公开了具有FL1 /插入/ FL2配置的复合自由层,用于在TMR或GMR传感器中实现高dR / R,低RA和低λ。 铁磁FL1和FL2层分别具有(+)λ和( - )λ值。 FL1可以是CoFe,CoFeB或其与Ni,Ta,Mn,Ti,W,Zr,Hf,Tb或Nb的合金。 FL2可以是CoFe,NiFe或其与Ni,Ta,Mn,Ti,W,Zr,Hf,Tb,Nb或B的合金。薄插入层包括至少一种诸如Co,Fe和Ni 以及选自Ta,Ti,W,Zr,Hf,Nb,Mo,V,Cr或B中的至少一种非磁性元素。在具有MgO隧道势垒的TMR堆叠中,dR / R> 60%,λ 〜1 + 10-6,当FL1为CoFe / CoFeB / CoFe时,RA = 1.2ohm-um2,FL2为CoFe / NiFe / CoFe,插入层为CoTa或CoFeBTa。