METHOD FOR FABRICATING VIA HOLE AND THROUGH-SILICON VIA
    51.
    发明申请
    METHOD FOR FABRICATING VIA HOLE AND THROUGH-SILICON VIA 审中-公开
    通过孔和通过硅制造的方法

    公开(公告)号:US20120129341A1

    公开(公告)日:2012-05-24

    申请号:US13187845

    申请日:2011-07-21

    IPC分类号: H01L21/28 H01L21/311

    摘要: A method for fabricating a via hole includes forming a first mask pattern on a first surface of a wafer exposing a portion of the first surface of the wafer, forming a passivation region within the wafer by implanting impurities into the exposed portion of the wafer using the first mask pattern as an ion implantation barrier layer, forming an etching stop layer on the first surface of the wafer including the passivation regions, forming a second mask pattern on a second surface of the wafer faces away from the first surface of the wafer, wherein the second mask pattern exposes a portion of the second surface of the wafer over an area between the passivation regions, and forming a via hole by etching the wafer using the second mask pattern as an etching mask.

    摘要翻译: 一种用于制造通孔的方法包括在晶片的第一表面上形成第一掩模图案,该第一表面露出晶片的第一表面的一部分,通过将晶体中的杂质注入到晶片的暴露部分中,通过使用 第一掩模图案作为离子注入阻挡层,在包括钝化区的晶片的第一表面上形成蚀刻停止层,在晶片的第二表面上形成第二掩模图案,远离晶片的第一表面,其中 第二掩模图案将晶片的第二表面的一部分暴露在钝化区之间的区域上,并且使用第二掩模图案作为蚀刻掩模通过蚀刻晶片形成通孔。

    DATA ERROR CORRECTION CIRCUIT, INTEGRATED CIRCUIT FOR DATA ERROR CORRECTION, AND METHOD OF PERFORMING DATA ERROR CORRECTION
    56.
    发明申请
    DATA ERROR CORRECTION CIRCUIT, INTEGRATED CIRCUIT FOR DATA ERROR CORRECTION, AND METHOD OF PERFORMING DATA ERROR CORRECTION 有权
    数据错误校正电路,用于数据错误校正的集成电路以及执行数据错误校正的方法

    公开(公告)号:US20080001965A1

    公开(公告)日:2008-01-03

    申请号:US11772985

    申请日:2007-07-03

    IPC分类号: G09G5/02

    CPC分类号: H03M13/43

    摘要: A data error correction circuit includes a plurality of one-bit registers, a data error detection unit and a data error correction unit. The data error detection unit detects whether all the data values stored in the plurality of the registers are equal. The data correction unit determines a correct data value based upon each of the stored data values, and corrects each of the data values into the determined correct data value if the data values are not equal. Therefore, the data error correction circuit may correct a data error due to electrostatic discharge (ESD) or electromagnetic interference (EMI).

    摘要翻译: 数据纠错电路包括多个一位寄存器,数据错误检测单元和数据纠错单元。 数据错误检测单元检测存储在多个寄存器中的所有数据值是否相等。 数据校正单元基于每个存储的数据值确定正确的数据值,并且如果数据值不相等,则将每个数据值校正为确定的正确数据值。 因此,数据纠错电路可以校正由于静电放电(ESD)或电磁干扰(EMI)引起的数据误差。

    Flat panel for cathode-ray tube
    58.
    发明授权
    Flat panel for cathode-ray tube 失效
    阴极射线管平板

    公开(公告)号:US07005791B2

    公开(公告)日:2006-02-28

    申请号:US10481414

    申请日:2002-07-02

    IPC分类号: H01J29/70 H01J31/00

    摘要: The present invention is related to a flat panel for cathode-ray tube capable of securing a large viewing area in the flat panel which is fitted into a window of a cabinet. In accordance with the panel of the present invention, stepped portions are formed along an edge of a face to fit the panel into the window of the cabinet. A depth from a surface of the face to a surface of the stepped portion is set to satisfy a condition of 2≧Tf/Tc≧0.7 where Tf is a vertical distance from a starting point of the stepped portion to an inner surface of the panel and Tc is a thickness of the center of the face. The panel in accordance with the present invention can provide perceptual flatness to a viewer; improved implosion-proof characteristics; and a structure capable of enduring an external mechanical impact. Further, the panel having a precise structure can be manufactured by a press-molding process.

    摘要翻译: 本发明涉及一种用于阴极射线管的平板,其能够确保安装在橱柜窗口中的平板中的大的观察面积。 根据本发明的面板,沿着面的边缘形成阶梯部分,以将面板装配到橱柜的窗口中。 从台阶表面到阶梯部分的表面的深度设定为满足2> = Tf / Tc> = 0.7的条件,其中Tf是从阶梯部分的起点到内表面的垂直距离 面板和Tc是面部中心的厚度。 根据本发明的面板可以向观看者提供感知平坦度; 改进的防爆特性; 以及能够承受外部机械冲击的结构。 此外,具有精确结构的面板可以通过压制成型工艺制造。