公开(公告)号：US08248577B2

公开(公告)日：2012-08-21

申请号：US11120186

申请日：2005-05-03

Applicant: Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

Inventor： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Antonius Leenders ,  Paulus Martinus Maria Liebregts ,  Jeroen Johannes Sophia M. Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Michel Riepen

IPC: G03B27/52 ,  G03B27/42

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

Abstract translation: 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US3880409A

公开(公告)日：1975-04-29

申请号：US43358474

申请日：1974-01-15

Applicant: IN LINE TECHNOLOGY INC

Inventor： BOK HENDRIK F ,  ST ONGE EUGENE

IPC: C04B41/53 ,  G03D3/10 ,  G03D5/04 ,  G03F7/30 ,  H05K3/00 ,  B01F5/20 ,  C23B3/12

CPC classification number: H05K3/0085 ,  C04B41/5353 ,  G03D3/10 ,  G03D5/04 ,  G03F7/3085

Abstract: A solution agitation system to provide a uniform and controlled turbulent flow of treatment liquid over both sides of a flat substrate which is suspended in a treatment solution, wherein a directed liquid spray pattern below the treatment solution level creates parallel, flowing walls of solution running downward through the tank and on each opposite side of the substrate.

Abstract translation: 一种溶液搅拌系统，其在悬浮在处理溶液中的平坦基底的两侧上提供均匀且受控制的处理液湍流，其中在处理液液面以下的定向液体喷雾图案产生平行的流动的溶液壁向下流动 通过罐和基板的每个相对侧。

公开(公告)号：US3824137A

公开(公告)日：1974-07-16

申请号：US35239973

申请日：1973-04-18

Applicant: IN LINE TECHNOLOGY INC

Inventor： BOK H ,  ST ONGE E

IPC: C04B41/53 ,  G03D3/10 ,  G03D5/04 ,  G03F7/30 ,  H05K3/00 ,  B08B3/00 ,  C23B5/02 ,  C23F1/00

CPC classification number: G03D3/10 ,  C04B41/5353 ,  G03D5/04 ,  G03F7/3085 ,  H05K3/0085

Abstract: A SOLUTION AGITATION PROCESS AND SYSTEM OF PROVIDE A UNIFORM AND CONTROLLED TURBULENT FLOW OF TREATMENT LIQUID OVER BOTH SIDES OF A FLAT SUBSTRATE WHICH IS SUSPENDED IN A TREATMENT SOLUTION, WHEREIN A DIRECTED LIQUID SPRAY PATTERN BELOW THE TREATMEBT SOLUTION LEVEL CREATES PARALLEL, FLOWING WALLS OF SOLUTION RUNNING DOWNWARD THROUGH THE TANK AND ON EACH OPPOSITE SIDE OF THE SUBSTRATE.

公开(公告)号：US3382520A

公开(公告)日：1968-05-14

申请号：US55503266

申请日：1966-06-03

Applicant: CREUSOT FORGES ATELIERS

Inventor： BERNARD SAVART

IPC: C23F1/08 ,  G03F7/30

CPC classification number: G03F7/3085 ,  C23F1/08 ,  G03F7/3042