公开(公告)号：US07466396B2

公开(公告)日：2008-12-16

申请号：US11546368

申请日：2006-10-12

Applicant: Michael B. Binnard ,  Douglas C. Watson ,  W. Thomas Novak ,  Hiroto Horikawa ,  Yoshifumi Nakakoji ,  Hideaki Sakamoto

Inventor： Michael B. Binnard ,  Douglas C. Watson ,  W. Thomas Novak ,  Hiroto Horikawa ,  Yoshifumi Nakakoji ,  Hideaki Sakamoto

IPC: G03B27/74

CPC classification number: G03F7/709 ,  G03F7/70775 ,  G03F7/70833

Abstract: Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.

Abstract translation: 标线片和/或晶片台干涉仪安装到与支撑光刻设备的投影光学系统的主体分离的支撑体上。 这使得能够减小支撑投影光学系统的主体的尺寸，使其具有更有利的动态特性。

公开(公告)号：US06880942B2

公开(公告)日：2005-04-19

申请号：US10460644

申请日：2003-06-13

Applicant: Andrew J. Hazelton ,  W. Thomas Novak ,  Alton H. Phillips ,  Douglas C. Watson

Inventor： Andrew J. Hazelton ,  W. Thomas Novak ,  Alton H. Phillips ,  Douglas C. Watson

IPC: G02B26/08 ,  G03F7/20 ,  G02B5/08

CPC classification number: G03F7/70266 ,  G02B26/0825

Abstract: Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 to 50 nanometers, responsive to a metrology source and sensor arrangement. The actuators are matched to the deformation characteristics of the adaptive optical elements. Preferably, the actuators provide both positive and negative force for outward and/or inward deflection continuously over the surface of the mirror. The surface of the optical element may thus be accurately, controllably and repeatably deformed to within an allowable deformation limit to optimize optical performance of an optical system for high precision lithography exposure.

Abstract translation: 用于高精度光刻曝光的自适应光学元件设置有离散致动器的阵列，以提供高度稳定且可重复的光学元件形状的校正，使其在EUV范围内的非常短波长的光的一小部分的精度 1至50纳米，响应于测量源和传感器布置。 致动器与自适应光学元件的变形特性相匹配。 优选地，致动器在反射镜的表面上连续地向外和/或向内偏转提供正的和负的力。 因此，光学元件的表面因此可以精确地，可控地和可重复地变形到允许的变形极限内，以优化用于高精度光刻曝光的光学系统的光学性能。

公开(公告)号：US06753534B2

公开(公告)日：2004-06-22

申请号：US09796641

申请日：2001-03-02

Applicant: W. Thomas Novak ,  Michael Kovalerchik

Inventor： W. Thomas Novak ,  Michael Kovalerchik

IPC: G05G1100

CPC classification number: H01L21/68 ,  G03F7/70716 ,  H01J2237/20278 ,  H01J2237/3175

Abstract: A stage positioning system including a stationary frame, a slide movable relative to the frame in a first direction, and a support platform connected to the slide and movable therewith in the first direction. The support platform is movably attached to the slide for movement in a second direction generally orthogonal to the first direction. The system will further include a first linear motor containing a first magnet assembly and a first coil device that engages the first magnet assembly to move the slide in the first direction. A second linear will contain a second magnet assembly and a second coil device that engages the second magnet assembly to move the support platform in the second direction. The stage positioning system is particularly suited for positioning an article in electron beam or EUV light lithography systems.

Abstract translation: 一种舞台定位系统，包括固定框架，可沿第一方向相对于框架移动的滑块，以及连接到滑块并沿第一方向可移动的支撑平台。 支撑平台可移动地附接到滑动件，用于沿大致垂直于第一方向的第二方向移动。 该系统还将包括第一线性电动机，其包含第一磁体组件和接合第一磁体组件以沿第一方向移动滑块的第一线圈装置。 第二线性将包含接合第二磁体组件以在第二方向上移动支撑平台的第二磁体组件和第二线圈装置。 舞台定位系统特别适用于将物品定位在电子束或EUV光刻系统中。

公开(公告)号：US06674512B2

公开(公告)日：2004-01-06

申请号：US09924071

申请日：2001-08-07

Applicant: W. Thomas Novak ,  David Stumbo ,  Fuyuhiko Inoue

Inventor： W. Thomas Novak ,  David Stumbo ,  Fuyuhiko Inoue

IPC: G03B2754

CPC classification number: G03F7/70775 ,  G01B9/02068 ,  G01B9/0207 ,  G01B9/02076

Abstract: An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.

Abstract translation: 干涉仪测量系统包括两个可移动构件和可具有显着较小移动的参考构件，所述组具有多个附接的测量镜，用于测量位置的干涉仪和用于干涉仪的两个光学支撑块。 干涉仪用于确定对每个可移动构件和参考构件的测量光路长度，并且这些位置用于计算可移动构件相对于参考构件的相对位置的未对准或误差。 然后，使用该计算出的误差，通过以计算指导的方式移动适当的成员来校正不对准。

公开(公告)号：US06597435B2

公开(公告)日：2003-07-22

申请号：US09971923

申请日：2001-10-09

Applicant: Alex K Tim Poon ,  W. Thomas Novak

Inventor： Alex K Tim Poon ,  W. Thomas Novak

IPC: G03B2762

CPC classification number: G03F7/70766 ,  G03B27/62

Abstract: A three-degree-of-freedom guideless reticle stage is used with a reaction force-countermass assembly. An anti-gravity device such as a flexure is provided between the reticle stage and the reaction force-countermass assembly. The anti-gravity device offsets the weight of the stage to the reaction force-countermass assembly. Improved reticle-positioning is provided, with minimized distortion to the stage base, reduced forces on the frame, high servo bandwidth, three-degree-of-freedom positioning, high throughput, minimized geometry and low moving mass.

Abstract translation: 一个三自由度的无引导标线台用于反作用力反对组件。 在标线片台和反作用力反对组件之间设置有诸如弯曲部的反重力装置。 反重力装置将载物台的重量抵消反作用力对抗组件。 提供了改进的掩模版定位，使舞台基座的失真最小化，框架上的力减小，伺服带宽高，三自由度定位，高吞吐量，最小化的几何形状和低移动质量。

公开(公告)号：US06499880B2

公开(公告)日：2002-12-31

申请号：US09930285

申请日：2001-08-16

Applicant: Takuma Tsuda ,  Shinji Shinohara ,  Shinobu Tokushima ,  Yukiharu Okubo ,  Toshimasa Shimoda ,  Douglas C. Watson ,  W. Thomas Novak

Inventor： Takuma Tsuda ,  Shinji Shinohara ,  Shinobu Tokushima ,  Yukiharu Okubo ,  Toshimasa Shimoda ,  Douglas C. Watson ,  W. Thomas Novak

IPC: F16C3206

CPC classification number: F16C32/06 ,  B23Q1/0027 ,  B23Q1/38 ,  B23Q1/621 ,  F16C29/025 ,  F16C32/0603 ,  F16C33/748 ,  F16C2300/62 ,  F16C2322/39 ,  G03F7/70816 ,  Y10T29/49639 ,  Y10T29/49641

Abstract: In order to provide a static pressure air bearing having two axes usable in a vacuum environment in which the connection of the supporting air exhaust pipe does not adversely affect the motion of the bearing mechanism, air exhaust pipes are connected only with the fixed part(s) of the lower axis. Air exhaust from the upper axis is conducted through inner air exhaust piping (passages) formed within the fixed parts of the upper and lower axes, so that the exhaust pipes need not be connected with the movable parts.

Abstract translation: 为了提供一种具有两个轴的静压空气轴承，该真空环在真空环境中可以使支撑排气管的连接不会对轴承机构的运动产生不利影响，排气管仅与固定部分 ）。 从上轴排出的排气通过在上下轴的固定部内形成的内部排气管（通道）进行排气，排气管不需要与可动部连接。

公开(公告)号：US06467960B1

公开(公告)日：2002-10-22

申请号：US09642080

申请日：2000-08-18

Applicant: Douglas C. Watson ,  W. Thomas Novak

Inventor： Douglas C. Watson ,  W. Thomas Novak

IPC: F16C3206

CPC classification number: F16C29/025 ,  F16C32/0614 ,  F16C33/748 ,  F16C2300/62 ,  G03F7/70816 ,  G03F7/70841 ,  H01J2237/2006 ,  H01J2237/3175

Abstract: Apparatus associated with air bearings which are suitable for use in an environment with high vacuum levels. According to one aspect, an air bearing linear guide that is suitable for use in a vacuum environment is arranged to substantially wrap around a portion of a guide beam without covering the ends of the guide beam. The air bearing linear guide includes a sleeve that has an inner surface, and a first air pad that is located on the inner surface of the sleeve. A first land is arranged on the inner surface of the sleeve at least partially around the first air pad, e.g., such that the land is substantially offset from the perimeter of the air pad. The first land and the air pad define a first channel therebetween. Finally, the air bearing linear guide includes a second land that is arranged to substantially seal the inner surface of the sleeve from the vacuum environment

Abstract translation: 与空气轴承相关的装置，适用于具有高真空度的环境。 根据一个方面，适于在真空环境中使用的空气轴承线性引导件布置成基本上围绕导向梁的一部分而不覆盖引导梁的端部。 空气轴承直线导轨包括具有内表面的套筒和位于套筒内表面上的第一气垫。 至少部分地围绕第一气垫布置有套筒的内表面上的第一平台，例如使得平台基本上偏离气垫的周边。 第一平台和气垫在其间限定第一通道。 最后，空气轴承线性引导件包括第二凸台，该第二凸台被布置成基本上密封套筒的内表面与真空环境

公开(公告)号：US5998889A

公开(公告)日：1999-12-07

申请号：US963480

申请日：1997-11-03

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: G03F7/20 ,  H02K3/24 ,  H02K9/19 ,  H02K41/03 ,  H02K41/00

CPC classification number: G03F7/70758 ,  H02K41/03 ,  H02K9/19 ,  H02K3/24

Abstract: A lithographic system includes a chamber housing a stage mechanism and a linear motor coil that drives the stage mechanism. The linear motor includes a coil having two sidewalls, the coil being movable along a magnet track generating a magnetic field. A pair of jacket walls are attached to respective ones of each of the coil sidewalls. Each jacket wall has a pair of relatively thin non-magnetic plates of about 0.75 mm thickness bonded together, at least one facing surface of each of the plates including a liquid flow channel. The plates are made of a non-conductive (and non-magnetic) material, e.g. ceramic such as alumina. Coolant liquid from a liquid source flows through the flow channel in each of the jacket walls. In one embodiment a cooling system is provided where the linear motor coil has a cooling and recirculation circuit including a tank which is kept at a negative pressure of from about -3 psig to about -13 psig. In another embodiment a cooling system is provided where the force produced by the motor coil is minimized so that heat dissipation from the motor coil during a low duty cycle is substantially identical to heat dissipation in a high duty cycle. This is done in a three-phase motor coil by having two phases energized to provide force in sum total equal and opposite to the force from the remaining phase.

Abstract translation: 光刻系统包括容纳舞台机构的腔室和驱动舞台机构的线性电动机线圈。 线性电动机包括具有两个侧壁的线圈，该线圈可沿着产生磁场的磁铁轨迹移动。 一对护套壁连接到每个线圈侧壁中的相应的一个。 每个护套壁具有一对约0.75mm厚度的相对薄的非磁性板，粘合在一起，每个板的至少一个面对表面包括液体流动通道。 板由非导电（和非磁性）材料制成，例如， 陶瓷如氧化铝。 来自液体源的冷却剂液体流过每个护套壁中的流动通道。 在一个实施例中，提供了一种冷却系统，其中线性电动机线圈具有包括保持在约-3psig至约-13psig的负压力的罐的冷却和再循环回路。 在另一个实施例中，提供了一种冷却系统，其中由电动机线圈产生的力最小化，使得在低占空比期间来自电动机线圈的散热基本上与高占空比中的散热相同。 这是在三相电动机线圈中完成的，通过使两相通电以提供总和相等于并相对于剩余相的力的力。

公开(公告)号：US4516253A

公开(公告)日：1985-05-07

申请号：US487943

申请日：1983-04-25

Applicant: W. Thomas Novak

Inventor： W. Thomas Novak

IPC: B23Q1/36 ,  G03F7/20 ,  G03F9/00 ,  G03B41/16

CPC classification number: G03F7/70691 ,  B23Q1/36 ,  G03F9/7023 ,  G03F9/7049

Abstract: A lithography system for X-ray or other beam printing on a substrate such as a silicon semiconductor wafer comprises a beam chamber (301), a beam source (302), means (309) for mounting a mask, means (308) for mounting an image sensing means (342) interiorly of the chamber, means (317, 318), for mounting a substrate (307) in multiple including six degrees of freedom and means (308, 292, 320-322) including the image sensing means to align the mask and substrate relative to one another utilizing alignment patterns on the mask and substrate, images of which are brought into registration and sensed by the image sensing means. In a preferred embodiment three sets of target images are provided so as to adjust the substrate and mask relative orientation in six degrees of freedom. The mask seals helium within the chamber. The mask and the substrate are aligned in situ in the same position in which the mask and substrate are to be exposed to the beam. Means (313, 314, 311, 312) are provided for loading masks, calibration assemblies and substrate-holding means. The source-to-substrate distance is adjustable as is the mask-to-substrate gap. To conserve helium volume adjustable optic objectives (342) are provided in the chamber to sense registration of alignment targets on each of the mask and substrate, with essentially the remainder of the optics outside the chamber. Improved compression optics (408) are also provided in the alignment system.

公开(公告)号：US08830443B2

公开(公告)日：2014-09-09

申请号：US13067464

申请日：2011-06-02

Applicant: W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

Inventor： W. Thomas Novak ,  Andrew J. Hazelton ,  Douglas C. Watson

IPC: G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  G03F7/7095

Abstract: A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.

Abstract translation: 布置成使用投影系统从图案形成装置将图案投影到基板上的光刻投影装置具有布置成将液体供应到投影系统和基板之间的空间的液体供应系统。 该装置还包括液体收集系统，其包括具有可渗透构件的液体收集构件，通过该液体收集构件从与液体收集构件相对的物体的表面收集液体，其中可渗透构件具有多个通道，其产生毛细管 力。