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公开(公告)号:US09466387B2
公开(公告)日:2016-10-11
申请号:US14790572
申请日:2015-07-02
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sang-Wan Nam , Kang-Bin Lee , Junghoon Park
CPC classification number: G11C16/26 , G11C16/0483 , G11C16/12 , G11C16/16 , G11C16/34 , G11C16/3459 , H01L27/1157 , H01L27/11582
Abstract: An operating method of a nonvolatile memory, which includes a plurality of cell strings, each cell string having a plurality of memory cells and a string selection transistor stacked on a substrate, includes detecting threshold voltages of the string selection transistors of the plurality of cell strings; adjusting voltages to be supplied to the string selection transistors according to the detected threshold voltages; and applying the adjusted voltages to the string selection transistors to select or unselect the plurality of cell strings during a programming operation.
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公开(公告)号:US09431115B2
公开(公告)日:2016-08-30
申请号:US14723525
申请日:2015-05-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sang-Wan Nam
CPC classification number: G11C16/14 , G11C16/16 , G11C16/26 , G11C16/3445 , H01L27/11524 , H01L27/11556 , H01L27/1157 , H01L27/11582
Abstract: An erase system and method of a nonvolatile memory device includes supplying an erase voltage to a plurality of memory cells of a nonvolatile memory, performing a read operation with a read voltage to word lines of the plurality of memory cells, and performing an erase verification operation with an erase verification voltage to at least one of the word lines of the plurality of memory cells, the erase verification voltage lower than the read voltage.
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公开(公告)号:US09396802B2
公开(公告)日:2016-07-19
申请号:US14723525
申请日:2015-05-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sang-Wan Nam
Abstract: An erase system and method of a nonvolatile memory device includes supplying an erase voltage to a plurality of memory cells of a nonvolatile memory, performing a read operation with a read voltage to word lines of the plurality of memory cells, and performing an erase verification operation with an erase verification voltage to at least one of the word lines of the plurality of memory cells, the erase verification voltage lower than the read voltage.
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44.
公开(公告)号:US20250087256A1
公开(公告)日:2025-03-13
申请号:US18418001
申请日:2024-01-19
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yoonjae Lee , Yeji Shin , Sang-Wan Nam , Sang-Won Shim
IPC: G11C7/10
Abstract: Disclosed is a memory device which includes a memory cell array that includes a plurality of memory cells, and a peripheral circuit configured to perform a plurality of operations on the memory cell array by using a plurality of operating voltages. The peripheral circuit includes a voltage generating circuit including a first pump block, a second pump block, and a common pump block. The voltage generating circuit connects the first pump block and the common pump block in parallel to generate a first operating voltage among the plurality of operating voltages and connects the common pump block and the second pump block in series to generate a second operating voltage among the plurality of operating voltages. The common pump block is configurable to match the first pump block, the second pump block, or both, as needed.
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公开(公告)号:US12153812B2
公开(公告)日:2024-11-26
申请号:US18052285
申请日:2022-11-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jae-Hoon Choi , Sang-Wan Nam , Sangyong Yoon , Kookhyun Cho
IPC: G06F3/06
Abstract: A memory package includes a printed circuit board, a first memory device that is stacked on the printed circuit board, and a second memory device stacked on the first memory device. The first memory device includes a first one-time programmable (OTP) block, the second memory device includes a second OTP block different from the first OTP block, and a horizontal distance from one side of the first memory device to the first OTP block is different from a horizontal distance from one side of the second memory device to the second OTP block.
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公开(公告)号:US11854982B2
公开(公告)日:2023-12-26
申请号:US17982255
申请日:2022-11-07
Applicant: Samsung Electronics Co., Ltd.
Inventor: Bongsoon Lim , Sang-Wan Nam , Sang-Won Park , Sang-Won Shim , Hongsoo Jeon , Yonghyuk Choi
IPC: H01L23/535 , H10B43/27 , H10B43/40
CPC classification number: H01L23/535 , H10B43/40
Abstract: A three-dimensional semiconductor memory device may include a first stack structure block including first stack structures arranged in a first direction on a substrate, a second stack structure block including second stack structures arranged in the first direction on the substrate, a separation structure disposed on the substrate between the first and second stack structure blocks and including first mold layers and second mold layers, and a contact plug penetrating the separation structure. A bottom surface of the contact plug may contact the substrate.
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公开(公告)号:US11200952B2
公开(公告)日:2021-12-14
申请号:US16991821
申请日:2020-08-12
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sang-Won Park , Sang-Wan Nam , Ji Yeon Shin , Won Bo Shim , Jung-Yun Yun , Ji Ho Cho , Sang Gi Hong
IPC: G11C16/10 , H01L25/065 , H01L25/18 , G11C16/04 , H01L23/00
Abstract: A non-volatile memory device comprises a memory cell region including a first metal pad, a peripheral circuit region including a second metal pad and vertically connected to the memory cell region by the first metal pad and the second metal pad, a memory cell array in the memory cell region including a plurality of memory cells, each of the memory cells being connected to a plurality of word lines in the memory cell region and a plurality of bit lines in the memory cell region, and a control logic circuit in the peripheral circuit region configured to control voltages to be applied to the plurality of word lines and the plurality of bit lines.
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48.
公开(公告)号:US11164637B2
公开(公告)日:2021-11-02
申请号:US17015525
申请日:2020-09-09
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sang-Wan Nam , Dong-Hun Kwak , Chi-Weon Yoon
IPC: G11C16/04 , G11C16/16 , G11C8/12 , H01L27/11573 , H01L27/11582 , G11C16/14
Abstract: A nonvolatile memory device includes a memory cell region, a peripheral circuit region, a memory block in the memory cell region, and a control circuit in the peripheral circuit region. The memory cell region includes a first metal pad. The peripheral circuit region includes a second metal pad and is vertically connected to the memory cell region by the first metal pad and the second metal pad. The memory block includes a plurality of memory cells disposed in a vertical direction. The control circuit applies an erase voltage to an erase source terminal of the memory block, and applies a first voltage to a first selection line among a plurality of selection lines in the memory block. The first voltage is higher than the erase voltage. The first selection line is disposed closest to the erase source terminal among the plurality of selection lines and is used for selecting the memory block as an erase target block.
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公开(公告)号:US10770148B2
公开(公告)日:2020-09-08
申请号:US15959323
申请日:2018-04-23
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Won-Taeck Jung , So-Yeong Gwak , Sang-Wan Nam
Abstract: An operation method of a nonvolatile memory device includes applying a program voltage to a selected word line and programming a selected memory cell connected to the selected word line; reading an adjacent memory cell connected to an adjacent word line of the selected word line; and verifying the selected memory cell by adjusting charge sharing between the selected memory cell and a sensing node, which is connected to the selected memory cell through a bit line.
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50.
公开(公告)号:US20200185038A1
公开(公告)日:2020-06-11
申请号:US16788638
申请日:2020-02-12
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sang-Wan Nam , Dong-Hun Kwak , Chi-Weon Yoon
IPC: G11C16/16 , G11C16/04 , H01L27/11582 , H01L27/11573
Abstract: A method of operating a nonvolatile memory device includes erasing data within a NAND string of memory cells within the memory device by applying a non-zero erase voltage to a source/drain terminal at a first end of the NAND string. This erase voltage is applied concurrently with establishing gate-induced drain leakage (GIDL) in a pair of selection transistors within the NAND string. This GIDL can occur by applying unequal and non-zero first and second voltages to respective first and second gate terminals of the pair of selection transistors. The selection transistors can be string selection transistors or ground selection transistors.
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