公开(公告)号：US20150060668A1

公开(公告)日：2015-03-05

申请号：US14470135

申请日：2014-08-27

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Xin MAN ,  Tatsuya ASAHATA ,  Atsushi UEMOTO

IPC: H01J37/317 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/317 ,  H01J37/244 ,  H01J37/28 ,  H01J37/304 ,  H01J37/3056 ,  H01J2237/063 ,  H01J2237/08 ,  H01J2237/24475 ,  H01J2237/2802 ,  H01J2237/31749

Abstract: A charged particle beam apparatus for processing a tip end portion of a sample into a needle shape, includes an ion beam irradiation unit that irradiates the tip end portion with ion beams, an electron beam irradiation unit that irradiates the tip end portion with electron beams, a secondary electron detection unit that detects secondary electrons generated at the tip end portion by the irradiation with the electron beams, and an EBSD detection unit that detects diffracted electrons generated at the tip end portion by the irradiation with the electron beams.

Abstract translation: 一种用于将样品的尖端处理成针状的带电粒子束装置包括：用离子束照射前端部的离子束照射单元，用电子束照射前端部的电子束照射单元， 二次电子检测单元，其通过照射电子束来检测在前端部分产生的二次电子;以及EBSD检测单元，其通过用电子束的照射检测在前端部分产生的衍射电子。

公开(公告)号：US20140291508A1

公开(公告)日：2014-10-02

申请号：US14224164

申请日：2014-03-25

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi UEMOTO ,  Xin MAN ,  Tatsuya ASAHATA

IPC: H01J37/04

CPC classification number: H01J37/28 ,  G01N23/2255 ,  G01N2223/045 ,  H01J37/222 ,  H01J2237/226 ,  H01J2237/24585 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2807

Abstract: A focused ion beam apparatus including: a focused ion beam irradiation mechanism forming first and second cross-sections; a first image generation unit generating a first image, including a reflected electron image or a secondary electron image, of the first and second cross-sections; a second image generation unit generating a second image, including an EDS image or a secondary ion image, of the first and second cross-sections; and a control section causing the second image generation unit to generate the second image of the second cross-section, in a case where the first and second images of the first cross-section are acquired, the first image of the second cross-section is acquired, and the first image of the second cross-section includes a region different from a region representing a specific composition in the first image of the first cross-section.

Abstract translation: 一种聚焦离子束装置，包括：形成第一和第二横截面的聚焦离子束照射机构; 产生包括第一和第二横截面的反射电子图像或二次电子图像的第一图像的第一图像生成单元; 产生包括第一和第二横截面的EDS图像或二次离子图像的第二图像的第二图像生成单元; 以及控制部，其使得所述第二图像生成部生成所述第二横截面的第二图像，在获取所述第一横截面的所述第一图像和所述第二图像的情况下，所述第二横截面的所述第一图像为 并且第二横截面的第一图像包括与表示第一横截面的第一图像中的特定构图的区域不同的区域。

公开(公告)号：US20140284307A1

公开(公告)日：2014-09-25

申请号：US14221548

申请日：2014-03-21

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya ASAHATA ,  Shota TORIKAWA

IPC: H01J37/305 ,  H01J37/30

CPC classification number: H01J37/3056 ,  H01J37/3005 ,  H01J2237/30466 ,  H01J2237/31749

Abstract: A focused ion beam system includes a focused ion beam irradiation mechanism which irradiates a sample, on which a protective film is formed, with a focused ion beam from above the sample, a processing control unit which performs a removal process on both sides of a region to be a thin piece portion of the sample by the focused ion beam and sequentially forms observation surfaces parallel to an irradiation direction of the focused ion beam so as to achieve the thin piece portion, and an observation surface image generation unit which generates an observation surface image. The processing control unit terminates the removal process when a height of the protective film in the irradiation direction of the focused ion beam becomes a predetermined threshold value or less in the observation surface image.

Abstract translation: 聚焦离子束系统包括：聚焦离子束照射机构，其从形成有来自样品上方的聚焦离子束照射形成有保护膜的样品;处理控制单元，其对区域的两侧进行去除处理 通过聚焦离子束成为样品的薄片部分，并顺序地形成与聚焦离子束的照射方向平行的观察面，以实现薄片部分;以及观察表面图像生成单元，其生成观察表面 图片。 当聚焦离子束的照射方向上的保护膜的高度在观察表面图像中变为预定阈值以下时，处理控制单元终止去除处理。

公开(公告)号：US20140131575A1

公开(公告)日：2014-05-15

申请号：US14078852

申请日：2013-11-13

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Atsushi UEMOTO ,  Xin MAN ,  Tatsuya ASAHATA

IPC: H01J37/28

CPC classification number: H01J37/265 ,  G01N1/32 ,  G01N23/04 ,  G01N23/2208 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/2255 ,  G01T1/36 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/304 ,  H01J37/3045 ,  H01J2237/2611 ,  H01J2237/28 ,  H01J2237/2807 ,  H01J2237/2812 ,  H01J2237/30472 ,  H01J2237/30483 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A cross-section processing and observation method performed by a cross-section processing and observation apparatus, the method comprising: a cross-section processing step of forming a cross-section by irradiating a sample with an ion beam; a cross-section observation step of obtaining an observation image of the cross-section by irradiating the cross-section with an electron beam; and repeating the cross-section processing step and the cross-section observation step so as to obtain observation images of a plurality of cross-sections, wherein, in a case where Energy Dispersive X-ray Spectrometry (EDS) measurement of the cross-section is performed and an X-ray of a specified material is detected, an irradiation condition of the ion beam is changed so as to obtain observation images of a plurality of cross-sections of the specified material, and the cross-section processing and observation of the specified material is performed.

Abstract translation: 一种横截面加工和观察装置的横截面处理和观察方法，该方法包括：横截面处理步骤，用离子束照射样品形成横截面; 横截面观察步骤，通过用电子束照射横截面来获得横截面的观察图像; 并且重复横截面处理步骤和横截面观察步骤以获得多个横截面的观察图像，其中，在横截面的能量分散X射线光谱（EDS）测量的情况下 并且检测到特定材料的X射线，改变离子束的照射条件以获得指定材料的多个横截面的观察图像，并且对横截面加工和观察 执行指定的材料。

公开(公告)号：US20140061159A1

公开(公告)日：2014-03-06

申请号：US14012019

申请日：2013-08-28

Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

Inventor： Tatsuya ASAHATA ,  Hidekazu SUZUKI ,  Shota TORIKAWA

IPC: H01J37/30 ,  H01J37/02

CPC classification number: H01J37/3005 ,  H01J37/02 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/28 ,  H01J2237/3174 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A composite charged particle beam apparatus includes: a FIB column irradiating a thin sample with FIB; a GIB column irradiating the thin sample with GIB; a sample stage on which the thin sample is placed; a first tilt unit for tilting the thin sample about a first tilt axis of the sample stage, the first tilt axis being orthogonal to an FIB irradiation axis and being located inside a first plane formed by the FIB irradiation axis and a GIB irradiation axis; and a second tilt unit for tilting the thin sample about an axis which is orthogonal to the FIB irradiation axis and the first tilt axis.

Abstract translation: 复合带电粒子束装置包括：用FIB照射薄样品的FIB柱; GIB柱用GIB照射薄样品; 放置薄样品的样品台; 第一倾斜单元，用于围绕样品台的第一倾斜轴倾斜薄样品，第一倾斜轴正交于FIB照射轴并位于由FIB照射轴和GIB照射轴形成的第一平面内; 以及第二倾斜单元，用于使薄样品围绕与FIB照射轴和第一倾斜轴正交的轴倾斜。