公开(公告)号：US20120104253A1

公开(公告)日：2012-05-03

申请号：US13383259

申请日：2010-06-01

Applicant: Ruriko Tsuneta ,  Hideki Kikuchi ,  Takafumi Yotsuji

Inventor： Ruriko Tsuneta ,  Hideki Kikuchi ,  Takafumi Yotsuji

IPC: H01J37/28 ,  G01N23/00

CPC classification number: H01J37/26 ,  H01J37/20 ,  H01J37/263 ,  H01J37/3005 ,  H01J2237/30461

Abstract: A charged particle beam device is equipped with a function of: obtaining an approximation function of a sample drift from a visual field shift amount among plural images (S1); capturing a save image while correcting the drift on the basis of the approximation function (S2); and creating from the save image a target image in which the effect of the sample drift is reduced (S3). This makes it possible to smooth the random errors in the visual field shift measurements by approximating the sample drift to the function and also to predict the sample drift changing over time. Therefore, it is possible to provide a charged particle beam device in which the effect of the sample drift is very limited even in a high magnification and also provide a measuring method using the charged particle beam device.

Abstract translation: 带电粒子束装置具有以下功能：从多个图像中的视场偏移量获得样本漂移的近似函数（S1）; 在基于近似函数校正漂移的同时捕获保存图像（S2）; 以及从保存图像创建其中减少样本漂移的影响的目标图像（S3）。 这使得可以通过近似于函数的样本漂移并且还预测随时间变化的样本漂移来平滑视野偏移测量中的随机误差。 因此，即使在高放大率下也可以提供样品漂移的效果非常有限的带电粒子束装置，并且还提供使用带电粒子束装置的测量方法。

公开(公告)号：US20120004879A1

公开(公告)日：2012-01-05

申请号：US13234831

申请日：2011-09-16

Applicant: Muneyuki FUKUDA ,  Tomoyasu SHOJO ,  Atsuko FUKADA ,  Noritsugu TAKAHASHI

Inventor： Muneyuki FUKUDA ,  Tomoyasu SHOJO ,  Atsuko FUKADA ,  Noritsugu TAKAHASHI

IPC: G06F19/00

CPC classification number: H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817

Abstract: An object of the invention is to be able to select easily and quickly inspection recipes which are appropriate to samples from any number of inspection recipes. A calculating device displays a plurality of inspection recipes on the GUI. An inspection recipe includes settings for controlling charged particle columns which irradiate charged particles on samples with a plurality of characteristics. Plural inspection recipes are arranged and displayed on a coordinate system which is specified by a plurality of axes having characteristic values (robustness variable of charge up, throughput of defect inspection, and accuracy of defect inspection) which have mutually trade-off relationships.

Abstract translation: 本发明的目的是能够从任何数量的检查配方中选择适合于样品的容易且快速的检查配方。 计算装置在GUI上显示多个检查配方。 检查配方包括用于控制带有多个特征的样品上照射带电粒子的带电粒子列的设置。 多个检查配方被布置和显示在由具有相互折衷关系的特征值（充电的鲁棒性变量，缺陷检查的吞吐量和缺陷检查的精度）的多个轴指定的坐标系上。

公开(公告)号：US20110253893A1

公开(公告)日：2011-10-20

申请号：US13089059

申请日：2011-04-18

Applicant: Helmut BANZHOF

Inventor： Helmut BANZHOF

IPC: G01N23/225

CPC classification number: H01J37/28 ,  H01J37/1478 ,  H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/2809 ,  H01J2237/2814

Abstract: A charged particle beam device is provided, including: a charged particle beam source adapted to generate a charged particle beam on an axis; an optical aberration correction device and an objective lens device, which define a corrected beam aperture angle adjusted to reduce diffraction; and a charged particle beam tilting device; wherein the optical aberration correction device and the objective lens device are adapted to provide the charged particle beam with a beam aperture angle smaller than the corrected beam aperture angle; and wherein the charged particle beam tilting device is adapted to provide a beam tilt angle which is equal or less than the corrected beam aperture angle. Further, a method of operating a charged particle beam device is provided.

Abstract translation: 提供带电粒子束装置，包括：带电粒子束源，适于在轴上产生带电粒子束; 光学像差校正装置和物镜装置，其限定校正后的光束孔径角度，以减小衍射; 和带电粒子束倾斜装置; 其中所述光学像差校正装置和所述物镜装置适于为所述带电粒子束提供小于校正的光束孔径角的光束孔径角; 并且其中所述带电粒子束倾斜装置适于提供等于或小于所述校正光束孔径角的光束倾斜角度。 此外，提供了一种操作带电粒子束装置的方法。

公开(公告)号：US08026481B2

公开(公告)日：2011-09-27

申请号：US11700838

申请日：2007-02-01

Applicant: Muneyuki Fukuda ,  Tomoyasu Shojo ,  Atsuko Fukada ,  Noritsugu Takahashi

Inventor： Muneyuki Fukuda ,  Tomoyasu Shojo ,  Atsuko Fukada ,  Noritsugu Takahashi

IPC: G01N23/00 ,  G21K7/00 ,  A61N5/00

CPC classification number: H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/21 ,  H01J2237/2487 ,  H01J2237/2817

Abstract: An object of the invention is to be able to select easily and quickly inspection recipes which are appropriate to samples from any number of inspection recipes. A calculating device displays a plurality of inspection recipes on the GUI. An inspection recipe includes settings for controlling charged particle columns which irradiate charged particles on samples with a plurality of characteristics. Plural inspection recipes are arranged and displayed on a coordinate system which is specified by a plurality of axes having characteristic values (robustness variable of charge up, throughput of defect inspection, and accuracy of defect inspection) which have mutually trade-off relationships.

Abstract translation: 本发明的目的是能够从任何数量的检查配方中选择适合于样品的容易且快速的检查配方。 计算装置在GUI上显示多个检查配方。 检查配方包括用于控制带有多个特征的样品上照射带电粒子的带电粒子列的设置。 多个检查配方被布置和显示在由具有相互折衷关系的特征值（充电的鲁棒性变量，缺陷检查的吞吐量和缺陷检查的精度）的多个轴指定的坐标系上。

公开(公告)号：US07838833B1

公开(公告)日：2010-11-23

申请号：US11998502

申请日：2007-11-30

Applicant: Matthew Lent ,  Stanislaw Marek Borowicz ,  Mehran Nasser-Ghodsi ,  Niles Kenneth MacDonald ,  Ye Yang ,  Kenneth J. Krzeczowski

Inventor： Matthew Lent ,  Stanislaw Marek Borowicz ,  Mehran Nasser-Ghodsi ,  Niles Kenneth MacDonald ,  Ye Yang ,  Kenneth J. Krzeczowski

IPC: G01N23/00

CPC classification number: G01N23/2251 ,  H01J37/263 ,  H01J37/28 ,  H01J37/2955 ,  H01J2237/24475 ,  H01J2237/2804

Abstract: A method of imaging using an electron beam. An incident electron beam is focused onto the specimen surface, a scattered electron beam is extracted from the specimen surface, and a plurality of dark field signals are detected using a detection system. An interpolated dark field signal is generated using the plurality of dark field signals. In addition, a bright field signal may be detected using the detection system, and a final interpolated signal may be generated using the interpolated dark field signal and the bright field signal. User input may be received which determines a degree of interpolation between two adjacent dark field signals so as to generate the interpolated dark field signal and which determines an amount of interpolation between the interpolated dark field signal and the bright field signal so as to generate a final interpolated signal. Other embodiments, aspects and features are also disclosed.

Abstract translation: 使用电子束成像的方法。 入射电子束被聚焦在样本表面上，从样本表面提取散射的电子束，并且使用检测系统检测多个暗场信号。 使用多个暗场信号产生内插暗场信号。 此外，可以使用检测系统检测亮场信号，并且可以使用内插的暗场信号和亮场信号来产生最终的内插信号。 可以接收确定两个相邻暗场信号之间的内插程度的用户输入，以产生内插的暗场信号，并确定内插暗场信号和亮场信号之间的内插量，以便产生最终的 内插信号。 还公开了其它实施例，方面和特征。

公开(公告)号：US07805023B2

公开(公告)日：2010-09-28

申请号：US11802262

申请日：2007-05-21

Applicant: Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

Inventor： Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

IPC: G06K9/32 ,  G21K7/00

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/263 ,  H01J2237/2823

Abstract: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

Abstract translation: 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，在图像的整个区域或图像的整个区域上进行平均化， 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象，因此可以获得高精度和良好重复性的图像分辨率评估值。

公开(公告)号：US20100230584A1

公开(公告)日：2010-09-16

申请号：US12655635

申请日：2010-01-04

Applicant: Harald Niebel ,  Giuseppe Pavia ,  Heiko Stegmann ,  Richard Schillinger

Inventor： Harald Niebel ,  Giuseppe Pavia ,  Heiko Stegmann ,  Richard Schillinger

IPC: H01J37/20 ,  G12B13/00 ,  H01J37/26

CPC classification number: H01J37/20 ,  H01J37/153 ,  H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J2237/1534 ,  H01J2237/201 ,  H01J2237/2826

Abstract: A method for adjusting an operating parameter of a particle beam device and a sample holder, which is suitable in particular for performing the method are provided. An adjustment of an operating parameter of a particle beam device is possible without transfer of the sample holder out of the particle beam device. A reference sample is placed in a first sample receptacle, so that in ongoing operation of the particle beam device, the sample holder need only be positioned in such a way that the reference sample is bombarded and measured with the aid of a particle beam generated in the particle beam device.

Abstract translation: 提供了一种用于调整特别用于执行该方法的粒子束装置和样品架的操作参数的方法。 在将粒子束装置的样品保持器转移出来之前，可以调整粒子束装置的操作参数。 将参考样品放置在第一样品容器中，使得在粒子束装置的持续操作中，样品保持器仅需要以使得参考样品被轰击和测量的方式定位，借助于在 粒子束装置。

公开(公告)号：US20100213369A1

公开(公告)日：2010-08-26

申请号：US12405279

申请日：2009-03-17

Applicant: Joachim Zach ,  Harald Rose

Inventor： Joachim Zach ,  Harald Rose

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/263 ,  H01J2237/2614

Abstract: The invention relates to a method for producing image contrast by phase shifting in the electron optics, wherein, from an intermediate image (5), an anamorphic image (6, 6′) of the axial rays (xα, yβ) is produced by quadrupole fields (Q1′, Q2′, Q3′; Q11′, Q12′, Q13′) with simultaneous passage through zero of the field rays (xγ, yδ) in at least one diffraction intermediate image plane (8, 8′), where a relative phase shift between a region (14) around the electron beam of zeroth order of diffraction (13) and the electron beams of higher orders of diffraction (15) is caused by a magnetic or electric field (9, 9′), and thereafter the at least one anamorphosis of the beam path produced is corrected again by further quadrupole fields (Q4′, Q5′; Q13′, Q14′, Q15′). According to the invention, the image contrast can be further improved without causing aberrations that are no longer tolerable by using, for production and correction of the at least one anamorphic image (6, 6′), quadrupole fields (Q2′, Q4′; Q12′, Q14′) before and after this image (6, 6′) whose extent in the direction of the optical axis (10) is equal to at least twice their focal length, and wherein at least one of the axial rays (xα, yβ), by an appropriate choice of the magnification M of the intermediate image (5), enters the quadrupole field (Q2′, Q12′) before the at least one anamorphic image (6, 6′) at a slope 1/M such that a length (7) of the anamorphic image (6, 6′) is achieved at which any aberrations caused are still within a tolerable range. The invention also relates to devices for implementing this method.

Abstract translation: 本发明涉及通过电子光学器件中的相移产生图像对比度的方法，其中，从中间图像（5），通过以下方式产生轴向射线（xα，y＆bgr）的变形图像（6,6'）， 在至少一个衍射中间像平面（8,8'）中同时穿过场射线（xγ，yδ）的零点的四极场（Q1'，Q2'，Q3'; Q11'，Q12'，Q13' 其中绕着衍射（13）的电子束周围的区域（14）和较高衍射级（15）的电子束之间的相对相移由磁场或电场（9,9'）引起， 此后，通过另外的四极场（Q4'，Q5'; Q13'，Q14'，Q15'再次校正产生的光束路径的至少一个变形。 根据本发明，可以进一步改善图像对比度，而不会导致用于生成和校正至少一个变形图像（6,6'），四极场（Q2'，Q4'; ...）的不再容忍的像差。 Q12'，Q14'）在其在光轴（10）的方向上的程度等于它们的焦距的至少两倍的该图像（6,6'）之前和之后，并且其中至少一个轴向射线 通过适当选择中间图像（5）的放大倍率M，在斜率1/2的至少一个变形图像（6,6'）之前进入四极场（Q2'，Q12'）， 使得实现变形图像（6,6'）的长度（7），其中所引起的任何像差仍然在可容许的范围内。 本发明还涉及用于实现该方法的装置。

公开(公告)号：US20100108883A1

公开(公告)日：2010-05-06

申请号：US12575312

申请日：2009-10-07

Applicant: Ahmed H. Zewail

Inventor： Ahmed H. Zewail

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/22 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/2482 ,  H01J2237/2809 ,  H01J2237/2813

Abstract: The present invention relates to methods and systems for 4D ultrafast electron microscopy (UEM)—in situ imaging with ultrafast time resolution in TEM. Single electron imaging is used as a component of the 4D UEM technique to provide high spatial and temporal resolution unavailable using conventional techniques. Other embodiments of the present invention relate to methods and systems for convergent beam UEM, focusing the electron beams onto the specimen to measure structural characteristics in three dimensions as a function of time. Additionally, embodiments provide not only 4D imaging of specimens, but characterization of electron energy, performing time resolved electron energy loss spectroscopy (EELS).

Abstract translation: 本发明涉及4D超快速电子显微镜（UEM）在TEM中超快时间分辨率的原位成像方法和系统。 单电子成像被用作4D UEM技术的组成部分，以提供使用常规技术不可用的高空间和时间分辨率。 本发明的其他实施例涉及用于会聚波束UEM的方法和系统，其将电子束聚焦到样本上以测量作为时间的函数的三维结构特征。 此外，实施例不仅提供了样本的4D成像，而且提供电子能量的表征，执行时间分辨的电子能量损耗光谱（EELS）。

公开(公告)号：US20100072366A1

公开(公告)日：2010-03-25

申请号：US12564617

申请日：2009-09-22

Applicant: Peter Christiaan Tiemeijer ,  Uwe Luecken ,  Alan Frank De Jong ,  Hendrik Nicolaas Slingerland

Inventor： Peter Christiaan Tiemeijer ,  Uwe Luecken ,  Alan Frank De Jong ,  Hendrik Nicolaas Slingerland

IPC: G01N23/04 ,  H01J37/26

CPC classification number: H01J37/153 ,  H01J37/263 ,  H01J2237/1534 ,  H01J2237/2823

Abstract: The invention relates to a method for correcting distortions introduced by the projection system (106) of a TEM. As known to the person skilled in the art distortions may limit the resolution of a TEM, especially when making a 3D reconstruction of a feature using tomography. Also when using strain analysis in a TEM the distortions may limit the detection of strain.To this end the invention discloses a detector equipped with multipoles (152), the multipoles warping the image of the TEM in such a way that distortions introduced by the projection system are counteracted. The detector may further include a CCD or a fluorescent screen (151) for detecting the electrons.

Abstract translation: 本发明涉及一种用于校正由TEM的投影系统（106）引入的失真的方法。 如本领域技术人员所知，失真可能限制TEM的分辨率，特别是当使用层析成像进行特征的3D重建时。 此外，当在TEM中使用应变分析时，失真可能会限制应变的检测。 为此，本发明公开了一种装备有多极（152）的检测器，该多极体使得TEM的图像翘曲，使得由投影系统引入的失真被抵消。 检测器还可以包括用于检测电子的CCD或荧光屏（151）。