摘要:
A composite material having sliding property is produced by applying, to a substrate, a material comprising a fluorine-containing ethylenic polymer having functional group which is prepared by copolymerizing (a) 0.05 to 30% by mole of at least one of fluorine-containing ethylenic monomers having at least one functional group selected from the group consisting of hydroxyl, carboxyl, a carboxylic salt group, a carboxylic ester group and epoxy, and (b) 70 to 99.95% by mole of at least one of fluorine-containing ethylenic monomers having no functional group mentioned above. The composite material having sliding property which is produced by applying, to the substrate, the material comprising the fluorine-containing polymer having an excellent adhesive property to the substrate without necessitating complicated steps.
摘要:
A fluorine-containing adhesive comprising a fluorine-containing ethylenic polymer (A) having functional group which has a crystalline melting point or glass transition temperature of not more than 270° C. and is prepared by copolymerizing (a) 0.05 to 30% by mole of at least one of fluorine-containing ethylenic monomers having at least one functional group selected from the group consisting of carboxyl and a carboxylic salt group and (b) 70 to 99.95% by mole of at least one of fluorine-containing ethylenic monomers which do not have the above-mentioned functional group and is copolymerizable with the component (a). To provide the fluorine-containing adhesive maintaining chemical resistance, solvent resistance, weather resistance and stain-proofing property and giving direct strong adhesion particularly to a substrate of metal, glass, resin, etc. and an adhesive film and laminated article which are produced from the fluorine-containing adhesive.
摘要:
It is possible to provide the heat resistant material and coating material for OA equipments which comprise a fluorine-containing multi-segment polymer having heat resistance, abrasion resistance, non-sticking property against toner and oil resistance in addition to flexibility and are used particularly on surfaces of fuser roll and belt. Those materials comprise a fluorine-containing multi-segment polymer having an elastomeric fluorine-containing polymer chain segment A and a non-elastomeric fluorine-containing polymer chain segment B, and the elastomeric fluorine-containing polymer chain segment A comprises not less than 90% by mole of perhaloolefin unit as a recurring unit and imparts flexibility to the whole polymer.
摘要:
The present invention provides a focusing method and a light-concentrating film capable of concentrating incident light in a wide angular range with high efficiency, a focusing element including the light-concentrating film, and a solar cell. The present invention is alight-concentrating film that is made of an organic material, and is characterized by having a multilevel gradation pattern.
摘要:
There is provided a method of forming a thin film of vinylidene fluoride homopolymer having crystal form I which is applicable to various substrates in relatively easy way (coating conditions, application method, etc.), a process for preparing a vinylidene fluoride homopolymer having crystal form I efficiently at high purity, and novel vinylidene fluoride homopolymers which can give a thin film being excellent in ferroelectricity. The method of forming a thin film of vinylidene fluoride homopolymer comprises (i) a step for preparing a green powder product of vinylidene fluoride homopolymer comprising crystal form I alone or as main component by subjecting vinylidene fluoride to radical polymerization in the presence of a bromine compound or iodine compound having 1 to 20 carbon atoms which contains at least one moiety represented by —CRf1Rf2X1, wherein X1 is iodine atom or bromine atom; Rf1 and Rf2 are the same or different and each is selected from fluorine atom or perfluoroalkyl groups having 1 to 5 carbon atoms and (ii) a step for forming a thin film on a substrate surface by using vinylidene fluoride homopolymer which comprises crystal form I alone or as main component and is obtained from the green powder product of vinylidene fluoride homopolymer comprising crystal form I alone or as main component.
摘要翻译:提供一种以相对容易的方式(涂布条件,涂布方法等)形成可以适用于各种基材的结晶形式I的偏二氟乙烯均聚物的薄膜的方法,制备具有结晶形式的偏二氟乙烯均聚物 我高效率地得到高纯度的新型偏二氟乙烯均聚物,可以得到铁电性优异的薄膜。 形成偏氟乙烯均聚物薄膜的方法包括(i)通过在溴化合物的存在下使偏二氟乙烯进行自由基聚合,制备单晶或单体晶形的偏二氟乙烯均聚物的生粉产物的步骤 或含有至少一个由-CR f 1 R f 2 X 1表示的部分的碳原子数为1〜20的碘化合物,其中X1为碘原子或溴原子; Rf1和Rf2相同或不同,分别选自具有1〜5个碳原子的氟原子或全氟烷基,(ii)通过使用仅含有晶型I的偏二氟乙烯均聚物在基板表面上形成薄膜的步骤 或作为主要成分,并且由包含单晶晶体I或主要成分的偏二氟乙烯均聚物的绿色粉末产品获得。
摘要:
There is provided a fluorine-containing polymer solid electrolyte which has an excellent ion-conducting property, is high in oxidation resistance, is stable electrochemically and thermally, has sufficient strength and is applicable to various electrochemical devices. The electrolyte comprises (A) a non-crystalline fluorine-containing polymer having, in a trunk chain and/or side chain of the polymer molecule, a structural unit D having five or more chained units derived from a fluorine-containing ether, (B) an electrolytic compound and (C) a solvent, and has an ionic conductivity of from 10−10 to 101 S/cm measured at 25° C. by an alternating current complex impedance method. The electrolyte is useful for various electrochemical devices.
摘要:
A method for designing a semiconductor device and a semiconductor device of the present invention permits the achievement of a predetermined pattern area ratio while power supply lines are reinforced by connecting a dummy metal line, which is formed in an unoccupied region of a wiring layer for the purpose of achieving the predetermined area ratio, at its two or more points with a power supply line for VDD or VSS.
摘要:
There is provided an ionic liquid type functional material which is useful for a lubricant, acid-removing agent, various ionic liquid materials, electrolyte for solar cell and actuator material. The ionic liquid type functional material contains an aromatic compound which has a fluorine-containing ether chain and is represented by the formula (1): [Ra-DmRy (1)wherein -D- is a fluoroether unit represented by the formula (1-1): O—Rn or R—On (1-1) in which R is at least one selected from divalent fluorine-containing alkylene groups having 1 to 5 carbon atoms in which at least one of hydrogen atoms is replaced by fluorine atom; n is an integer of from 1 to 20; when m is not less than 2, two or more of D may be the same or different; Ra is a monovalent organic group which has 1 to 20 carbon atoms and does not contain D; when m is not less than 2, two or more of Ra may be the same or different; m is an integer of from 1 to 4; Ry is a mono-, di-, tri- or tetra-valent organic group having 2 to 30 carbon atoms which has at least one selected from a basic functional group Y1 and/or a salt Y2 of the basic functional group and contains an aromatic ring structure, provided that a unit of —O—O— is not contained in the formulae (1) and (1-1).
摘要:
There are provided a novel norbornene derivative which is a material for a chemically amplifying type photoresist for F2 laser, possesses excellent transparency and improved dry etching resistivity and has a fluorine-containing ketone unit or fluorine-containing tertiary alcohol unit directly bonded to the norbornene backbone; a fluorine-containing polymer obtained by using the norbornene derivative as a copolymerizable monomer; and a chemically amplifying type photoresist composition comprising the fluorine-containing polymer, a photoacid generator and a solvent.
摘要:
There is provided a method of forming a fine pattern by using a practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can undergo resolution of a fine pattern. The method comprises (I) a step for preparing a fluorine-containing polymer (A) having OH group which has a structural unit derived from a fluorine-containing norbornene derivative having OH group, (II) a step for preparing a fluorine-containing polymer (B) having a protective group by reacting a compound represented by X—CH2OR, wherein X is Cl, Br or I; R is a hydrocarbon group having 1 to 30 carbon atoms in which a part or the whole of hydrogen atoms may be substituted with fluorine atoms, with the above-mentioned fluorine-containing polymer (A) having OH group in the presence of a base, (III) a step for preparing a resist composition comprising (a) the above-mentioned fluorine-containing polymer (B) having a protective group, (b) a photoacid generator and (c) a solvent, (IV) a step for forming a resist film comprising the above-mentioned resist composition on a substrate or on a given layer on the substrate, (V) a step for exposing by selectively irradiating a given area of the resist film with energy rays, and (VI) a step for subjecting the exposed resist film to developing to selectively remove the exposed portion of the resist film, thus forming a fine pattern.