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    Process for preparing fluorine-containing polymer and method of forming fine pattern using same
    1.
    发明申请
    Process for preparing fluorine-containing polymer and method of forming fine pattern using same 失效
    制备含氟聚合物的方法和使用其形成精细图案的方法

    公开(公告)号：US20050049374A1

    公开(公告)日：2005-03-03

    申请号：US10914203

    申请日：2004-08-10

    申请人： Takayuki Araki ,  Tetsuhiro Kodani ,  Takuji Ishikawa

    发明人： Takayuki Araki ,  Tetsuhiro Kodani ,  Takuji Ishikawa

    IPC分类号： C08F12/20 ,  G03F7/004 ,  G03F7/039

    CPC分类号： C08F12/20 ,  G03F7/0046 ,  G03F7/0395

    摘要： There is provided a method of forming a fine pattern by using a practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can undergo resolution of a fine pattern. The method comprises (I) a step for preparing a fluorine-containing polymer (A) having OH group which has a structural unit derived from a fluorine-containing norbornene derivative having OH group, (II) a step for preparing a fluorine-containing polymer (B) having a protective group by reacting a compound represented by X—CH2OR, wherein X is Cl, Br or I; R is a hydrocarbon group having 1 to 30 carbon atoms in which a part or the whole of hydrogen atoms may be substituted with fluorine atoms, with the above-mentioned fluorine-containing polymer (A) having OH group in the presence of a base, (III) a step for preparing a resist composition comprising (a) the above-mentioned fluorine-containing polymer (B) having a protective group, (b) a photoacid generator and (c) a solvent, (IV) a step for forming a resist film comprising the above-mentioned resist composition on a substrate or on a given layer on the substrate, (V) a step for exposing by selectively irradiating a given area of the resist film with energy rays, and (VI) a step for subjecting the exposed resist film to developing to selectively remove the exposed portion of the resist film, thus forming a fine pattern.

    摘要翻译： 提供了通过使用对具有短波长的曝光光如F2激光具有高透明度的可行的含氟聚合物来形成精细图案的方法，并且可以经历精细图案的分辨率。 该方法包括：（I）具有OH基的含氟聚合物（A）的制备步骤，其具有衍生自具有OH基的含氟降冰片烯衍生物的结构单元，（II）制备含氟聚合物的步骤 （B）通过使由X-CH 2 OR表示的化合物，其中X是Cl，Br或I的化合物具有保护基; R是具有1至30个碳原子的烃基，其中一部分或全部氢原子可以被氟原子取代，上述含碱基的含氟聚合物（A）具有OH基团， （III）制备抗蚀剂组合物的步骤，包括（a）具有保护基的上述含氟聚合物（B），（b）光致酸产生剂和（c）溶剂，（IV）形成步骤 在基板上或基板上的给定层上包含上述抗蚀剂组合物的抗蚀剂膜，（V）通过用能量射线选择性地照射抗蚀剂膜的给定区域来曝光的步骤，以及（VI） 使曝光的抗蚀剂膜显影以选择性地除去抗蚀剂膜的暴露部分，从而形成精细图案。

    Process for preparing fluorine-containing polymer and method of forming fine pattern using same
    2.
    发明授权
    Process for preparing fluorine-containing polymer and method of forming fine pattern using same 失效
    制备含氟聚合物的方法和使用其形成精细图案的方法

    公开(公告)号：US07163982B2

    公开(公告)日：2007-01-16

    申请号：US10914203

    申请日：2004-08-10

    申请人： Takayuki Araki ,  Tetsuhiro Kodani ,  Takuji Ishikawa

    发明人： Takayuki Araki ,  Tetsuhiro Kodani ,  Takuji Ishikawa

    IPC分类号： C08F8/32

    CPC分类号： C08F12/20 ,  G03F7/0046 ,  G03F7/0395

    摘要： There is provided a method of forming a fine pattern by using a practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can undergo resolution of a fine pattern. The method comprises (I) a step for preparing a fluorine-containing polymer (A) having OH group which has a structural unit derived from a fluorine-containing norbornene derivative having OH group, (II) a step for preparing a fluorine-containing polymer (B) having a protective group by reacting a compound represented by X—CH2OR, wherein X is Cl, Br or I; R is a hydrocarbon group having 1 to 30 carbon atoms in which a part or the whole of hydrogen atoms may be substituted with fluorine atoms, with the above-mentioned fluorine-containing polymer (A) having OH group in the presence of a base, (III) a step for preparing a resist composition comprising (a) the above-mentioned fluorine-containing polymer (B) having a protective group, (b) a photoacid generator and (c) a solvent, (IV) a step for forming a resist film comprising the above-mentioned resist composition on a substrate or on a given layer on the substrate, (V) a step for exposing by selectively irradiating a given area of the resist film with energy rays, and (VI) a step for subjecting the exposed resist film to developing to selectively remove the exposed portion of the resist film, thus forming a fine pattern.

    摘要翻译： 提供了通过使用对具有短波长的曝光光如F 2激光具有高透明度的可行的含氟聚合物来形成精细图案的方法，并且可以经历精细图案的分辨 。 该方法包括：（I）具有OH基的含氟聚合物（A）的制备步骤，其具有衍生自具有OH基的含氟降冰片烯衍生物的结构单元，（II）制备含氟聚合物的步骤 （B）通过使由X-CH 2 OR表示的化合物与其中X为Cl，Br或I的化合物反应而具有保护基; R是具有1至30个碳原子的烃基，其中一部分或全部氢原子可以被氟原子取代，上述含碱基的含氟聚合物（A）具有OH基团， （III）制备抗蚀剂组合物的步骤，包括（a）具有保护基的上述含氟聚合物（B），（b）光致酸产生剂和（c）溶剂，（IV）形成步骤 在基板上或基板上的给定层上包含上述抗蚀剂组合物的抗蚀剂膜，（V）通过用能量射线选择性地照射抗蚀剂膜的给定区域来曝光的步骤，以及（VI） 使曝光的抗蚀剂膜显影以选择性地除去抗蚀剂膜的暴露部分，从而形成精细图案。

    Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
    4.
    发明申请
    Novel fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same 审中-公开
    具有酸反应性基团的新型含氟聚合物和由其制备的化学放大型光致抗蚀剂组合物

    公开(公告)号：US20050287471A1

    公开(公告)日：2005-12-29

    申请号：US11033954

    申请日：2005-01-13

    申请人： Takayuki Araki ,  Meiten Koh ,  Yoshito Tanaka ,  Takuji Ishikawa ,  Hirokazu Aoyama ,  Tetsuo Shimizu

    发明人： Takayuki Araki ,  Meiten Koh ,  Yoshito Tanaka ,  Takuji Ishikawa ,  Hirokazu Aoyama ,  Tetsuo Shimizu

    IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G03C1/76

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/108

    摘要： There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom. The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: -(M1)-(M2)-(A)-, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.

    摘要翻译： 提供了一种具有酸反应性基团的新型含氟聚合物，其具有对真空紫外区域（157nm）中的能量射线（放射线）的高透明性，并且还提供了含氟基础聚合物 由聚合物制备并适用于由其获得的光致抗蚀剂和化学放大型抗蚀剂组合物。 聚合物的数均分子量为1,000〜1,000,000，由下式表示： - （M1） - （M2） - （A） - ，其中M1是具有酸不稳定性或酸可降解官能团的结构单元 M2是含氟丙烯酸酯的结构单元，A是来自其它可共聚单体的结构单元，M1 / M2的摩尔比为1〜99/99〜1，聚合物的含量为1〜99％ 结构单元M1的摩尔数，结构单元M2的1〜99摩尔％和结构单元A1的0〜98摩尔％。 含氟基础聚合物的材料包括具有酸反应性基团的含氟聚合物如上述聚合物，并且适用于光致抗蚀剂，化学放大型抗蚀剂组合物由那些聚合物和材料获得。

    Process for preparing fluorine-containing polymer and photoresist composition
    5.
    发明申请
    Process for preparing fluorine-containing polymer and photoresist composition 审中-公开
    制备含氟聚合物和光致抗蚀剂组合物的方法

    公开(公告)号：US20050191578A1

    公开(公告)日：2005-09-01

    申请号：US11104554

    申请日：2005-04-13

    申请人： Takayuki Araki ,  Takuji Ishikawa ,  Meiten Koh ,  Minoru Toriumi

    发明人： Takayuki Araki ,  Takuji Ishikawa ,  Meiten Koh ,  Minoru Toriumi

    IPC分类号： C08F4/34 ,  C08F8/00 ,  C08F214/18 ,  G03C1/492 ,  G03F7/004 ,  G03F7/039

    CPC分类号： C08F214/18 ,  C08F8/00 ,  C08F2800/20 ,  G03C1/492 ,  G03F7/0046 ,  G03F7/0392 ,  C08F214/26

    摘要： There is provided a process for preparing a fluorine-containing polymer for resist which is excellent in transparency in a vacuum ultraviolet region, comprises a structural unit derived from a fluorine-containing ethylenic monomer and/or a structural unit derived from a monomer which can provide an aliphatic ring structure in the polymer trunk chain and may have a fluorine atom, and has an acid-reactive group Y1 reacting with an acid or a group Y2 which can be converted to the acid-reactive group Y1, in which the fluorine-containing ethylenic monomer and/or the monomer which can provide an aliphatic ring structure in the polymer trunk chain are subjected to radical polymerization by using an organic peroxide represented by the formula (1): wherein R50 and R51 are the same or different and each is a hydrocarbon group having 1 to 30 carbon atoms which may have ether bond (an atom at an end of bond is not oxygen atom); p1 and p2 are the same or different and each is 0 or 1; p3 is 1 or 2, and also there is provided a photoresist composition comprising the obtained polymer. The fluorine-containing polymer is excellent in transparency in a vacuum ultraviolet region, and can form an ultra fine pattern as a polymer for a photoresist, particularly for a F2 resist.

    摘要翻译： 提供了一种制备真空紫外线区域的透明度优异的抗蚀剂用含氟聚合物的方法，包括衍生自含氟乙烯性单体的结构单元和/或衍生自单体的结构单元，其可以提供 聚合物主链中的脂族环结构，并且可以具有氟原子，并且具有与酸或Y 2的基团反应的酸反应性基团Y 1，其可以是 转化为酸反应性基团Y 1，其中可以在聚合物主链中提供脂族环结构的含氟乙烯性单体和/或单体通过使用 由式（1）表示的有机过氧化物：其中R 50和R 51相同或不同，并且各自为具有1至30个碳原子的烃基，其可以 具有醚键（键的末端的原子不是氧原子）; p1和p2相同或不同，分别为0或1; p3为1或2，并且还提供包含所得聚合物的光致抗蚀剂组合物。 含氟聚合物在真空紫外区域的透明度优异，并且可以形成作为光致抗蚀剂的聚合物的超细图案，特别是用于F2抗蚀剂。

    Method of forming fine pattern
    6.
    发明申请
    Method of forming fine pattern 审中-公开
    形成精细图案的方法

    公开(公告)号：US20050181304A1

    公开(公告)日：2005-08-18

    申请号：US11057832

    申请日：2005-02-15

    申请人： Takayuki Araki ,  Tsuneo Yamashita ,  Takuji Ishikawa ,  Tomohiro Yoshida ,  Takuya Hagiwara ,  Takamitsu Furukawa

    发明人： Takayuki Araki ,  Tsuneo Yamashita ,  Takuji Ishikawa ,  Tomohiro Yoshida ,  Takuya Hagiwara ,  Takamitsu Furukawa

    IPC分类号： C08F214/18 ,  C08F232/08 ,  G03C1/492 ,  G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0046 ,  G03F7/0395 ,  G03F7/0397

    摘要： There is provided a method of forming a fine pattern by using a highly practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can improve dry etching resistance without remarkably lowering transparency. The method comprises (I) a step for preparing a resist composition comprising (a) a fluorine-containing polymer having protective group, (b) a photoacid generator and (c) a solvent; (II) a step for forming a resist film comprising the above-mentioned resist composition on a substrate or on a given layer on the substrate; (III) a step for exposing by selectively irradiating given areas of the resist film with energy ray, and (IV) a step for subjecting the exposed resist film to developing treatment and selectively removing the exposed portions of the resist film to form a fine pattern, in which the fluorine-containing polymer (a) having protective group is a fluorine-containing polymer comprising a structural unit (M2-1A) derived from a norbornene derivative having OH group and a structural unit (M2-1B) derived from a norbornene derivative having a saturated hydrocarbon group containing bicyclo saturated hydrocarbon structure as a protective group.

    摘要翻译： 提供了一种通过使用对具有短波长的诸如F 2激光的曝光光具有高透明度的高度实用的含氟聚合物形成精细图案的方法，并且可以提高无干蚀刻电阻，而无需 显着降低透明度。 该方法包括（I）制备抗蚀剂组合物的步骤，其包含（a）具有保护基的含氟聚合物，（b）光致酸产生剂和（c）溶剂; （II）在衬底上或衬底上的给定层上形成包含上述抗蚀剂组合物的抗蚀剂膜的步骤; （III）通过用能量射线选择性地照射抗蚀剂膜的给定区域进行曝光的步骤，以及（IV）对曝光的抗蚀剂膜进行显影处理并选择性地除去抗蚀剂膜的曝光部分以形成精细图案的步骤 其中，具有保护基的含氟聚合物（a）为含有衍生自具有OH基的降冰片烯衍生物的结构单元（M2-1A）和来自降冰片烯的结构单元（M2-1B）的含氟聚合物 具有含有双环饱和烃结构的饱和烃基作为保护基的衍生物。

    Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
    10.
    发明授权
    Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same 有权
    具有酸反应性基团的含氟聚合物和由其制备的化学放大型光致抗蚀剂组合物

    公开(公告)号：US06908724B2

    公开(公告)日：2005-06-21

    申请号：US10262893

    申请日：2002-10-03

    申请人： Takayuki Araki ,  Meiten Koh ,  Yoshito Tanaka ,  Takuji Ishikawa ,  Hirokazu Aoyama ,  Tetsuo Shimizu

    发明人： Takayuki Araki ,  Meiten Koh ,  Yoshito Tanaka ,  Takuji Ishikawa ,  Hirokazu Aoyama ,  Tetsuo Shimizu

    IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0758 ,  Y10S430/106 ,  Y10S430/108

    摘要： There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: —(M1)—(M2)—(A)—, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99% by mole of the structural unit M1, from 1 to 99% by mole of the structural unit M2 and from 0 to 98% by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.

    摘要翻译： 提供了一种具有酸反应性基团的新型含氟聚合物，其具有对真空紫外区域（157nm）中的能量射线（放射线）的高透明性，并且还提供了含氟基础聚合物 由聚合物制备并适用于由其获得的光致抗蚀剂和化学放大型抗蚀剂组合物。 聚合物的数均分子量为1,000〜1,000,000，由下式表示： - （M1） - （M2） - （A） - ，其中M1是具有酸不稳定性或酸可降解官能团的结构单元 M2是含氟丙烯酸酯的结构单元，A是来自其它可共聚单体的结构单元，M1 / M2的摩尔比为1〜99/99〜1，聚合物的含量为1〜99％ 结构单元M1的摩尔数，结构单元M2的1〜99摩尔％和结构单元A1的0〜98摩尔％。 含氟基础聚合物的材料包括具有酸反应性基团的含氟聚合物如上述聚合物，并且适用于光致抗蚀剂，化学放大型抗蚀剂组合物由那些聚合物和材料获得。